Wolf Naetar

Person

Wien, AT

People

Patents Grantslast 30 patents

Information Patent Grant
Method for irradiating a target using restricted placement grids
- Patent number 11,569,064
- Issue date Jan 31, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adapting the duration of exposure slots in multi-beam writers
- Patent number 11,099,482
- Issue date Aug 24, 2021
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-linear dose- and blur-dependent edge placement correction
- Patent number 10,651,010
- Issue date May 12, 2020
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dose-related feature reshaping in an exposure pattern to be exposed...
- Patent number 10,522,329
- Issue date Dec 31, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of Thermal Expansion in a Lithographic Device
- Publication number 20230296989
- Publication date Sep 21, 2023
- IMS Nanofabrication GmbH
- Matthias Liertzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Correction of Blur Variation in a Multi-Beam Writer
- Publication number 20210240074
- Publication date Aug 5, 2021
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adapting the Duration of Exposure Slots in Multi-Beam Writers
- Publication number 20200348597
- Publication date Nov 5, 2020
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Non-linear Dose- and Blur-Dependent Edge Placement Correction
- Publication number 20190214226
- Publication date Jul 11, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Irradiating a Target Using Restricted Placement Grids
- Publication number 20190088448
- Publication date Mar 21, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed...
- Publication number 20190066976
- Publication date Feb 28, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS

Wolf Naetar

Person

Patents Grantslast 30 patents

Method for irradiating a target using restricted placement grids

Adapting the duration of exposure slots in multi-beam writers

Non-linear dose- and blur-dependent edge placement correction

Dose-related feature reshaping in an exposure pattern to be exposed...

Patents Applicationslast 30 patents

Method for Determining Focal Properties in a Target Beam Field of a...

Correction of Thermal Expansion in a Lithographic Device

Correction of Blur Variation in a Multi-Beam Writer

Adapting the Duration of Exposure Slots in Multi-Beam Writers

Non-linear Dose- and Blur-Dependent Edge Placement Correction

Method for Irradiating a Target Using Restricted Placement Grids

Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed...