Wolfgang Zahn

Person

Eltville-Erbach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Light-sensitive component for use in photoresists
- Patent number 8,012,664
- Issue date Sep 6, 2011
- AZ Electronic Materials USA Corp.
- Wolfgang Zahn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sens...
- Patent number 5,563,018
- Issue date Oct 8, 1996
- Hoechst Aktiengesellschaft
- Gerhard Buhr
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfo...
- Patent number 5,413,899
- Issue date May 9, 1995
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition containing esterification product o...
- Patent number 5,358,823
- Issue date Oct 25, 1994
- Hoechst Aktiengesellschaft
- Wolfgang Zahn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition containing naphthoquinone diazide sulfonic acid mixed e...
- Patent number 5,306,595
- Issue date Apr 26, 1994
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive ester and process for its preparation
- Patent number 5,268,252
- Issue date Dec 7, 1993
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitiv...
- Patent number 5,162,190
- Issue date Nov 10, 1992
- Hoechst Aktiengesellschaft
- Wolfgang Zahn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working photosensitive mixture and recording material of h...
- Patent number 4,971,887
- Issue date Nov 20, 1990
- Hoechst Aktiengesellschaft
- Axel Schmitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use in...
- Patent number 4,774,171
- Issue date Sep 27, 1988
- Hoechst Aktiengesellschaft
- Wolfgang Zahn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Light-Sensitive Component for Use in Photoresists
- Publication number 20090253073
- Publication date Oct 8, 2009
- Wolfgang Zahn
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process for the preparation of a photoresist solution
- Publication number 20070020558
- Publication date Jan 25, 2007
- Wolfgang Zahn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Wolfgang Zahn

Person

Patents Grantslast 30 patents

Light-sensitive component for use in photoresists

(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sens...

Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfo...

Radiation-sensitive composition containing esterification product o...

Composition containing naphthoquinone diazide sulfonic acid mixed e...

Radiation-sensitive ester and process for its preparation

1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitiv...

Positive-working photosensitive mixture and recording material of h...

Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use in...

Patents Applicationslast 30 patents

Light-Sensitive Component for Use in Photoresists

Process for the preparation of a photoresist solution