Xianzhi Tao

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Structure and material engineering methods for optoelectronic devic...
- Patent number 12,015,042
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Papo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD apparatus for improved film thickness non-uniformity and partic...
- Patent number 9,312,154
- Issue date Apr 12, 2016
- Applied Materials, Inc.
- Binh Tran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming high growth rate, low resistivity germanium film...
- Patent number 8,822,312
- Issue date Sep 2, 2014
- Applied Materials, Inc.
- Yi-Chiau Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming high growth rate, low resistivity germanium film...
- Patent number 8,759,201
- Issue date Jun 24, 2014
- Applied Materials, Inc.
- Yi-Chiau Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a controlled and uniform lightly phosphorous dope...
- Patent number 7,335,266
- Issue date Feb 26, 2008
- Applied Materials, Inc.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a controlled and uniform lightly phosphorous dope...
- Patent number 6,982,214
- Issue date Jan 3, 2006
- Applied Materials, Inc.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Emissivity-change-free pumping plate kit in a single wafer chamber
- Patent number 6,582,522
- Issue date Jun 24, 2003
- Applied Materials, Inc.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doped silicon deposition process in resistively heated single wafer...
- Patent number 6,559,039
- Issue date May 6, 2003
- Applied Materials, Inc.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a silicon nitride layer on a substrate
- Patent number 6,559,074
- Issue date May 6, 2003
- Applied Materials, Inc.
- Steven A. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD ruthenium seed for CVD ruthenium deposition
- Patent number 6,479,100
- Issue date Nov 12, 2002
- Applied Materials, Inc.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
STRUCTURE & MATERIAL ENGINEERING METHODS FOR OPTOELECTRONIC DEVICES...
- Publication number 20210265416
- Publication date Aug 26, 2021
- Applied Materials, Inc.
- Papo CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING HIGH GROWTH RATE, LOW RESISTIVITY GERMANIUM FILM...
- Publication number 20120306054
- Publication date Dec 6, 2012
- Applied Materials, Inc.
- Yi-Chiau Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING HIGH GROWTH RATE, LOW RESISTIVITY GERMANIUM FILM...
- Publication number 20120306055
- Publication date Dec 6, 2012
- Applied Materials, Inc.
- Yi-Chiau Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD APPARATUS FOR IMPROVED FILM THICKNESS NON-UNIFORMITY AND PARTIC...
- Publication number 20100294199
- Publication date Nov 25, 2010
- Applied Materials, Inc.
- BINH TRAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a controlled and uniform lightly phosphorous dope...
- Publication number 20040063301
- Publication date Apr 1, 2004
- APPLIED MATERIALS, INC.
- Li Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Seedless method of forming a silicon germanium layer on a gate diel...
- Publication number 20040009680
- Publication date Jan 15, 2004
- APPLIED MATERIALS, INC.
- Lee Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon deposition process in resistively heated single wafer chamber
- Publication number 20030207547
- Publication date Nov 6, 2003
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low thermal budget metal oxide deposition for capacitor structures
- Publication number 20020197793
- Publication date Dec 26, 2002
- Charles N Dornfest
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPED SILICON DEPOSITION PROCESS IN RESISTIVELY HEATED SINGLE WAFER...
- Publication number 20020173127
- Publication date Nov 21, 2002
- APPLIED MATERIALS, INC.
- Shulin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD RUTHENIUM SEED FOR CVD RUTHENIUM DEPOSITION
- Publication number 20020146513
- Publication date Oct 10, 2002
- APPLIED MATERIALS, INC.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Emissivity-change-free pumping plate kit in a single wafer chamber
- Publication number 20020137312
- Publication date Sep 26, 2002
- APPLIED MATERIALS, INC.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Xianzhi Tao

Person

Patents Grantslast 30 patents

Structure and material engineering methods for optoelectronic devic...

CVD apparatus for improved film thickness non-uniformity and partic...

Method of forming high growth rate, low resistivity germanium film...

Method of forming high growth rate, low resistivity germanium film...

Method of forming a controlled and uniform lightly phosphorous dope...

Method of forming a controlled and uniform lightly phosphorous dope...

Emissivity-change-free pumping plate kit in a single wafer chamber

Doped silicon deposition process in resistively heated single wafer...

Method of forming a silicon nitride layer on a substrate

CVD ruthenium seed for CVD ruthenium deposition

Patents Applicationslast 30 patents

STRUCTURE & MATERIAL ENGINEERING METHODS FOR OPTOELECTRONIC DEVICES...

METHOD OF FORMING HIGH GROWTH RATE, LOW RESISTIVITY GERMANIUM FILM...

METHOD OF FORMING HIGH GROWTH RATE, LOW RESISTIVITY GERMANIUM FILM...

CVD APPARATUS FOR IMPROVED FILM THICKNESS NON-UNIFORMITY AND PARTIC...

Method of forming a controlled and uniform lightly phosphorous dope...

Seedless method of forming a silicon germanium layer on a gate diel...

Silicon deposition process in resistively heated single wafer chamber

Low thermal budget metal oxide deposition for capacitor structures

DOPED SILICON DEPOSITION PROCESS IN RESISTIVELY HEATED SINGLE WAFER...

CVD RUTHENIUM SEED FOR CVD RUTHENIUM DEPOSITION

Emissivity-change-free pumping plate kit in a single wafer chamber