Xiaolin Chen

Person

San Ramon, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metal oxide directional removal
- Patent number 12,272,563
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal deposition and etch in high aspect-ratio features
- Patent number 12,087,595
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal of transition metal nitride materials
- Patent number 11,984,325
- Issue date May 14, 2024
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal of ruthenium-containing materials
- Patent number 11,798,813
- Issue date Oct 24, 2023
- Applied Materials, Inc.
- Baiwei Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for nitride-containing film removal
- Patent number 11,728,177
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal etch in high aspect-ratio features
- Patent number 11,631,589
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for aluminum-containing film removal
- Patent number 11,062,921
- Issue date Jul 13, 2021
- Applied Materials, Inc.
- Zhenjiang Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment and deposition for reduced outgassing
- Patent number 9,404,178
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low cost flowable dielectric films
- Patent number 8,889,566
- Issue date Nov 18, 2014
- Applied Materials, Inc.
- Amit Chatterjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric film growth with radicals produced using flexible nitrog...
- Patent number 8,629,067
- Issue date Jan 14, 2014
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal layers by radical-component CVD
- Patent number 8,563,445
- Issue date Oct 22, 2013
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polysilicon films by HDP-CVD
- Patent number 8,450,191
- Issue date May 28, 2013
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition-plasma cure cycle process to enhance film quality of sil...
- Patent number 7,902,080
- Issue date Mar 8, 2011
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,799,698
- Issue date Sep 21, 2010
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post deposition plasma treatment to increase tensile stress of HDP-...
- Patent number 7,745,351
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,691,753
- Issue date Apr 6, 2010
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post deposition plasma treatment to increase tensile stress of HDP-...
- Patent number 7,465,680
- Issue date Dec 16, 2008
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HDP-CVD seasoning process for high power HDP-CVD gapfil to improve...
- Patent number 7,109,114
- Issue date Sep 19, 2006
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,081,414
- Issue date Jul 25, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
HDP-CVD dep/etch/dep process for improved deposition into high aspe...
- Patent number 6,908,862
- Issue date Jun 21, 2005
- Applied Materials, Inc.
- Dongqing Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METAL OXIDE DIRECTIONAL REMOVAL
- Publication number 20250183053
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SELECTIVE METAL-CONTAINING HARDMASK REMOVAL
- Publication number 20250087494
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR TITANIUM-CONTAINING FILM REMOVAL
- Publication number 20240258116
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGHLY CONFORMAL METAL ETCH IN HIGH ASPECT RATIO SEMICONDUCTOR FEAT...
- Publication number 20230386830
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Xiaolin C. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL DEPOSITION AND ETCH IN HIGH ASPECT-RATIO FEATURES
- Publication number 20230290647
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE DIRECTIONAL REMOVAL
- Publication number 20230015080
- Publication date Jan 19, 2023
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE REMOVAL OF TRANSITION METAL NITRIDE MATERIALS
- Publication number 20230010978
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL ETCH IN HIGH ASPECT-RATIO FEATURES
- Publication number 20220359214
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE REMOVAL OF RUTHENIUM-CONTAINING MATERIALS
- Publication number 20220344172
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR NITRIDE-CONTAINING FILM REMOVAL
- Publication number 20220254648
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW COST FLOWABLE DIELECTRIC FILMS
- Publication number 20140073144
- Publication date Mar 13, 2014
- Amit Chatterjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT AND DEPOSITION FOR REDUCED OUTGASSING
- Publication number 20130149462
- Publication date Jun 13, 2013
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TWO-STAGE OZONE CURE FOR DIELECTRIC FILMS
- Publication number 20120238108
- Publication date Sep 20, 2012
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLYSILICON FILMS BY HDP-CVD
- Publication number 20120190178
- Publication date Jul 26, 2012
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADICAL STEAM CVD
- Publication number 20120177846
- Publication date Jul 12, 2012
- Applied Materials, Inc.
- DongQing Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL LAYERS BY RADICAL-COMPONENT CVD
- Publication number 20110217851
- Publication date Sep 8, 2011
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELECTRIC FILM GROWTH WITH RADICALS PRODUCED USING FLEXIBLE NITROG...
- Publication number 20110159703
- Publication date Jun 30, 2011
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST DEPOSITION PLASMA TREATMENT TO INCREASE TENSILE STRESS OF HDP-...
- Publication number 20090035918
- Publication date Feb 5, 2009
- Applies Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL DEPOSITION-PLASMA CURE CYCLE PROCESS TO ENHANCE FILM QUALITY...
- Publication number 20070281448
- Publication date Dec 6, 2007
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Post deposition plasma treatment to increase tensile stress of HDP-...
- Publication number 20070054504
- Publication date Mar 8, 2007
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...
- Publication number 20060286764
- Publication date Dec 21, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...
- Publication number 20060228886
- Publication date Oct 12, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HDP-CVD SEASONING PROCESS FOR HIGH POWER HDP-CVD GAPFIL TO IMPROVE...
- Publication number 20060219169
- Publication date Oct 5, 2006
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HDP-CVD seasoning process for high power HDP-CVD gapfil to improve...
- Publication number 20050250340
- Publication date Nov 10, 2005
- APPLIED MATERIALS, INC., A Delaware corporation
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gap-fill techniques
- Publication number 20050136684
- Publication date Jun 23, 2005
- Applied Materials, Inc.
- Kevin Mikio Mukai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
[DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM G...
- Publication number 20040251236
- Publication date Dec 16, 2004
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HDP-CVD dep/etch/dep process for improved deposition into high aspe...
- Publication number 20030207580
- Publication date Nov 6, 2003
- Applied Materials, Inc.
- Dongqing Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Xiaolin Chen

Person

Patents Grantslast 30 patents

Metal oxide directional removal

Metal deposition and etch in high aspect-ratio features

Selective removal of transition metal nitride materials

Selective removal of ruthenium-containing materials

Systems and methods for nitride-containing film removal

Metal etch in high aspect-ratio features

Systems and methods for aluminum-containing film removal

Surface treatment and deposition for reduced outgassing

Low cost flowable dielectric films

Dielectric film growth with radicals produced using flexible nitrog...

Conformal layers by radical-component CVD

Polysilicon films by HDP-CVD

Deposition-plasma cure cycle process to enhance film quality of sil...

Deposition-selective etch-deposition process for dielectric film ga...

Post deposition plasma treatment to increase tensile stress of HDP-...

Deposition-selective etch-deposition process for dielectric film ga...

Post deposition plasma treatment to increase tensile stress of HDP-...

HDP-CVD seasoning process for high power HDP-CVD gapfil to improve...

Deposition-selective etch-deposition process for dielectric film ga...

HDP-CVD dep/etch/dep process for improved deposition into high aspe...

Patents Applicationslast 30 patents

METAL OXIDE DIRECTIONAL REMOVAL

SYSTEMS AND METHODS FOR SELECTIVE METAL-CONTAINING HARDMASK REMOVAL

SYSTEMS AND METHODS FOR TITANIUM-CONTAINING FILM REMOVAL

HIGHLY CONFORMAL METAL ETCH IN HIGH ASPECT RATIO SEMICONDUCTOR FEAT...

METAL DEPOSITION AND ETCH IN HIGH ASPECT-RATIO FEATURES

METAL OXIDE DIRECTIONAL REMOVAL

SELECTIVE REMOVAL OF TRANSITION METAL NITRIDE MATERIALS

METAL ETCH IN HIGH ASPECT-RATIO FEATURES

SELECTIVE REMOVAL OF RUTHENIUM-CONTAINING MATERIALS

SYSTEMS AND METHODS FOR NITRIDE-CONTAINING FILM REMOVAL

LOW COST FLOWABLE DIELECTRIC FILMS

SURFACE TREATMENT AND DEPOSITION FOR REDUCED OUTGASSING

TWO-STAGE OZONE CURE FOR DIELECTRIC FILMS

POLYSILICON FILMS BY HDP-CVD

RADICAL STEAM CVD

CONFORMAL LAYERS BY RADICAL-COMPONENT CVD

DIELECTRIC FILM GROWTH WITH RADICALS PRODUCED USING FLEXIBLE NITROG...

POST DEPOSITION PLASMA TREATMENT TO INCREASE TENSILE STRESS OF HDP-...

NOVEL DEPOSITION-PLASMA CURE CYCLE PROCESS TO ENHANCE FILM QUALITY...

Post deposition plasma treatment to increase tensile stress of HDP-...

DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...

DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...

HDP-CVD SEASONING PROCESS FOR HIGH POWER HDP-CVD GAPFIL TO IMPROVE...

HDP-CVD seasoning process for high power HDP-CVD gapfil to improve...

Gap-fill techniques

[DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM G...

HDP-CVD dep/etch/dep process for improved deposition into high aspe...