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Xiaoye ZHAO
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Mountain View, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Method for defect reduction in magnetic write head fabrication
Patent number
8,828,248
Issue date
Sep 9, 2014
HGST Netherlands B.V.
Guomin Mao
G11 - INFORMATION STORAGE
Information
Patent Grant
Plasma reactor apparatus with multiple gas injection zones having t...
Patent number
8,231,799
Issue date
Jul 31, 2012
Applied Materials, Inc.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods to avoid unstable plasma states during a process transition
Patent number
8,048,806
Issue date
Nov 1, 2011
Applied Materials, Inc.
Michael C. Kutney
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chamber recovery after opening barrier over copper
Patent number
7,575,007
Issue date
Aug 18, 2009
Applied Materials, Inc.
Hairong Tang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etch process with separately fed carbon-lean and carbon-rich...
Patent number
7,541,292
Issue date
Jun 2, 2009
Applied Materials, Inc.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etch process using polymerizing etch gases across a wafer su...
Patent number
7,540,971
Issue date
Jun 2, 2009
Applied Materials, Inc.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming a low-K dual damascene interconnect structure
Patent number
7,435,685
Issue date
Oct 14, 2008
Applied Materials, Inc.
Gerardo A. Delgadino
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etch process using polymerizing etch gases with different et...
Patent number
7,431,859
Issue date
Oct 7, 2008
Applied Materials, Inc.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of fabricating a dual damascene interconnect structure
Patent number
7,413,990
Issue date
Aug 19, 2008
Applied Materials, Inc.
Yan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Selective etch process of a sacrificial light absorbing material (S...
Patent number
7,309,448
Issue date
Dec 18, 2007
Applied Materials, Inc.
Hee Yeop Chae
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Selective etch process of a sacrificial light absorbing material (S...
Patent number
7,300,597
Issue date
Nov 27, 2007
Applied Materials, Inc.
Hee Yeop Chae
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Selective etching of carbon-doped low-k dielectrics
Patent number
7,256,134
Issue date
Aug 14, 2007
Applied Materials, Inc.
Yunsang Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
Patent number
7,186,943
Issue date
Mar 6, 2007
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming a low-K dual damascene interconnect structure
Patent number
7,132,369
Issue date
Nov 7, 2006
Applied Materials, Inc.
Gerardo A. Delgadino
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
Patent number
7,132,618
Issue date
Nov 7, 2006
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of fabricating a dual damascene interconnect structure
Patent number
7,115,517
Issue date
Oct 3, 2006
Applied Materials, Inc.
Yan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with overhead RF electrode tuned to the plasma with...
Patent number
7,030,335
Issue date
Apr 18, 2006
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for modifying dielectric characteristics of dielectric layers
Patent number
6,921,727
Issue date
Jul 26, 2005
Applied Materials, Inc.
Kang-Lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Merie plasma reactor with overhead RF electrode tuned to the plasma...
Patent number
6,894,245
Issue date
May 17, 2005
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Gas distribution plate electrode for a plasma receptor
Patent number
6,677,712
Issue date
Jan 13, 2004
Applied Materials Inc.
Dan Katz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Gas distribution plate electrode for a plasma reactor
Patent number
6,586,886
Issue date
Jul 1, 2003
Applied Materials, Inc.
Dan Katz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Post-etch treatment of plasma-etched feature surfaces to prevent co...
Patent number
6,153,530
Issue date
Nov 28, 2000
Applied Materials, Inc.
Yan Ye
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
METHOD FOR DEFECT REDUCTION IN MAGNETIC WRITE HEAD FABRICATION
Publication number
20140217060
Publication date
Aug 7, 2014
HGST NETHERLANDS B.V.
Guomin MAO
G11 - INFORMATION STORAGE
Information
Patent Application
PROCESS KIT HAVING REDUCED EROSION SENSITIVITY
Publication number
20100101729
Publication date
Apr 29, 2010
Applied Materials, Inc.
JONG MUN KIM
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HARDMASK OPEN PROCESS WITH ENHANCED CD SPACE SHRINK AND REDUCTION
Publication number
20090191711
Publication date
Jul 30, 2009
Ying Rui
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF FORMING A LOW-K DUAL DAMASCENE INTERCONNECT STRUCTURE
Publication number
20080145998
Publication date
Jun 19, 2008
Applied Materials, Inc.
GERARDO A. DELGADINO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Chamber recovery after opening barrier over copper
Publication number
20080050922
Publication date
Feb 28, 2008
Applied Materials, Inc.
Hairong Tang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etch process using polymerizing etch gases across a wafer su...
Publication number
20070251917
Publication date
Nov 1, 2007
APPLIED MATERIALS, INC.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etch process using polymerizing etch gases and an inert dilu...
Publication number
20070254483
Publication date
Nov 1, 2007
APPLIED MATERIALS, INC.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor apparatus with multiple gas injection zones having t...
Publication number
20070251642
Publication date
Nov 1, 2007
APPLIED MATERIALS, INC.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etch process using polymerizing etch gases with different et...
Publication number
20070251918
Publication date
Nov 1, 2007
APPLIED MATERIALS, INC.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etch process with separately fed carbon-lean and carbon-rich...
Publication number
20070254486
Publication date
Nov 1, 2007
APPLIED MATERIALS, INC.
Kallol Bera
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods to avoid unstable plasma states during a process transition
Publication number
20070066064
Publication date
Mar 22, 2007
Applied Materials, Inc.
Michael C. Kutney
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method to reduce plasma-induced charging damage
Publication number
20070048882
Publication date
Mar 1, 2007
APPLIED MATERIALS, INC.
Michael C. Kutney
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SELECTIVE ETCH PROCESS OF A SACRIFICIAL LIGHT ABSORBING MATERIAL (S...
Publication number
20070020944
Publication date
Jan 25, 2007
Applied Materials, Inc.
Hee Yeop Chae
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF FABRICATING A DUAL DAMASCENE INTERCONNECT STRUCTURE
Publication number
20060216926
Publication date
Sep 28, 2006
Applied Materials, Inc.
Yan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Merie plasma reactor with overhead RF electrode tuned to the plasma...
Publication number
20050236377
Publication date
Oct 27, 2005
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Selective etch process of a sacrificial light absorbing material (S...
Publication number
20050029229
Publication date
Feb 10, 2005
APPLIED MATERIALS, INC.
Hee Yeop Chae
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Selective etching of carbon-doped low-k dielectrics
Publication number
20050026430
Publication date
Feb 3, 2005
APPLIED MATERIALS, INC.
Yunsang Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Merie plasma reactor with overhead RF electrode tuned to the plasma...
Publication number
20040211759
Publication date
Oct 28, 2004
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of fabricating a dual damascene interconnect structure
Publication number
20040198062
Publication date
Oct 7, 2004
APPLIED MATERIALS, INC.
Yan Ye
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for modifying dielectric characteristics of dielectric layers
Publication number
20040180556
Publication date
Sep 16, 2004
APPLIED MATERIALS, INC.
Kang-Lie Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of forming a low-K dual damascene interconnect structure
Publication number
20040157453
Publication date
Aug 12, 2004
APPLIED MATERIALS, INC.
Gerardo A. Delgadino
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dielectric etching with reduced striation
Publication number
20030228768
Publication date
Dec 11, 2003
APPLIED MATERIALS, INC.
Heeyeop Chae
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GAS DISTRIBUTION PLATE ELECTRODE FOR A PLASMA REACTOR
Publication number
20030201723
Publication date
Oct 30, 2003
APPLIED MATERIALS, INC.
Dan Katz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
Publication number
20030136766
Publication date
Jul 24, 2003
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GAS DISTRIBUTION PLATE ELECTRODE FOR A PLASMA REACTOR
Publication number
20030111961
Publication date
Jun 19, 2003
APPLIED MATERIALS, INC.
Dan Katz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with overhead RF electrode tuned to the plasma with...
Publication number
20020108933
Publication date
Aug 15, 2002
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS