Xingyue PENG

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of determining characteristic of patterning process based on...
- Patent number 12,092,963
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Xingyue Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining an electromagnetic field associated with a c...
- Patent number 11,899,374
- Issue date Feb 13, 2024
- ASML Netherlands B.V.
- Xingyue Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Binarization method and freeform mask optimization flow
- Patent number 10,990,003
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...
- Publication number 20240419086
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS, SOFTWARE, AND SYSTEMS FOR DETERMINATION OF CONSTANT-WIDTH...
- Publication number 20240353749
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING MASK RULE CHECK VIOLATIONS AND MASK DESIGN
- Publication number 20240241436
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTER...
- Publication number 20230333483
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES
- Publication number 20230205096
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS
- Publication number 20220334493
- Publication date Oct 20, 2022
- ASML NETHERLANDS B.V.
- Jingjing LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...
- Publication number 20220229374
- Publication date Jul 21, 2022
- ASML NETHERLANS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING AN ELECTROMAGNETIC FIELD ASSOCIATED WITH A C...
- Publication number 20210116816
- Publication date Apr 22, 2021
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BINARIZATION METHOD AND FREEFORM MASK OPTIMIZATION FLOW
- Publication number 20200363713
- Publication date Nov 19, 2020
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING

Xingyue PENG

Person

Patents Grantslast 30 patents

Method of determining characteristic of patterning process based on...

Method for determining an electromagnetic field associated with a c...

Binarization method and freeform mask optimization flow

Patents Applicationslast 30 patents

METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...

METHODS, SOFTWARE, AND SYSTEMS FOR DETERMINATION OF CONSTANT-WIDTH...

DETERMINING MASK RULE CHECK VIOLATIONS AND MASK DESIGN

OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTER...

ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES

METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS

METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...

METHOD FOR DETERMINING AN ELECTROMAGNETIC FIELD ASSOCIATED WITH A C...

BINARIZATION METHOD AND FREEFORM MASK OPTIMIZATION FLOW