Yalin Xiong

Person

Union City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer inspection using difference images
- Patent number 11,270,430
- Issue date Mar 8, 2022
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Block-to-block reticle inspection
- Patent number 10,539,512
- Issue date Jan 21, 2020
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Grant
Monitoring changes in photomask defectivity
- Patent number 9,892,503
- Issue date Feb 13, 2018
- KLA-Tencor Corporation
- Chun Guan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Delta die and delta database inspection
- Patent number 9,778,205
- Issue date Oct 3, 2017
- KLA-Tencor Corporation
- Carl E. Hess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated multi-pass inspection
- Patent number 9,778,207
- Issue date Oct 3, 2017
- KLA-Tencor Corp.
- Weston L. Sousa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block-to-block reticle inspection
- Patent number 9,766,185
- Issue date Sep 19, 2017
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Monitoring changes in photomask defectivity
- Patent number 9,518,935
- Issue date Dec 13, 2016
- KLA-Tencor Corporation
- Chun Guan
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting a reflective lithographic mask...
- Patent number 8,785,082
- Issue date Jul 22, 2014
- KLA-Tencor Corporation
- Yalin Xiong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer plane detection of lithographically significant contamination...
- Patent number 8,611,637
- Issue date Dec 17, 2013
- KLA-Tencor Corporation
- Ruifang Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for classifying defects detected on a reticle
- Patent number 8,204,297
- Issue date Jun 19, 2012
- KLA-Tencor Corp.
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Grant
Methods for simulating reticle layout data, inspecting reticle layo...
- Patent number 8,151,220
- Issue date Apr 3, 2012
- KLA-Tencor Technologies Corp.
- Carl Hess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection of thin line for selective sensitivity during reticle ins...
- Patent number 8,090,189
- Issue date Jan 3, 2012
- KLA-Tencor Corporation
- Vinayak Dattatreya Phalke
- G01 - MEASURING TESTING
Information Patent Grant
Photomask inspection and verification by lithography image reconstr...
- Patent number 7,995,832
- Issue date Aug 9, 2011
- KLA-Tencor Corporation
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Grant
Method for detection of oversized sub-resolution assist features
- Patent number 7,995,199
- Issue date Aug 9, 2011
- KLA-Tencor Corporation
- Carl E. Hess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Feature identification for metrological analysis
- Patent number 7,932,004
- Issue date Apr 26, 2011
- KLA-Tencor Corporation
- Yalin Xiong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for detecting lithographically significant defects on reticles
- Patent number 7,873,204
- Issue date Jan 18, 2011
- KLA-Tencor Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for detecting and classifying defects on a reticle
- Patent number 7,738,093
- Issue date Jun 15, 2010
- KLA-Tencor Corp.
- David Alles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-implemented methods for detecting defects in reticle desig...
- Patent number 7,646,906
- Issue date Jan 12, 2010
- KLA-Tencor Technologies Corp.
- Zain K. Saidin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and methods for providing selective defect sensitivity
- Patent number 7,440,093
- Issue date Oct 21, 2008
- KLA-Tencor Technologies Corporation
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for providing selective defect sensitivity
- Patent number 7,271,891
- Issue date Sep 18, 2007
- KLA-Tencor Technologies Corporation
- Yalin Xiong
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
WAFER INSPECTION USING DIFFERENCE IMAGES
- Publication number 20180342051
- Publication date Nov 29, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION OF PHOTOMASKS BY COMPARING TWO PHOTOMASKS
- Publication number 20180238816
- Publication date Aug 23, 2018
- KLA-Tencor Corporation
- Weston L. Sousa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Block-to-Block Reticle Inspection
- Publication number 20180003647
- Publication date Jan 4, 2018
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
INTEGRATED MULTI-PASS INSPECTION
- Publication number 20170256043
- Publication date Sep 7, 2017
- KLA-Tencor Corporation
- Weston L. Sousa
- G01 - MEASURING TESTING
Information Patent Application
MONITORING CHANGES IN PHOTOMASK DEFECTIVITY
- Publication number 20170053395
- Publication date Feb 23, 2017
- KLA-Tencor Corporation
- Chun Guan
- G01 - MEASURING TESTING
Information Patent Application
Integrated Multi-Pass Inspection
- Publication number 20160093040
- Publication date Mar 31, 2016
- KLA-Tencor Corporation
- Weston L. Sousa
- G01 - MEASURING TESTING
Information Patent Application
METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR GENERATING HIGH DEN...
- Publication number 20150310160
- Publication date Oct 29, 2015
- KLA-Tencor Corporation
- Frank LASKE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DELTA DIE AND DELTA DATABASE INSPECTION
- Publication number 20150276617
- Publication date Oct 1, 2015
- KLA-Tencor Corporation
- Carl E. Hess
- G01 - MEASURING TESTING
Information Patent Application
Block-to-Block Reticle Inspection
- Publication number 20150078650
- Publication date Mar 19, 2015
- KLA-Tencor Corporation
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
MONITORING CHANGES IN PHOTOMASK DEFECTIVITY
- Publication number 20150029498
- Publication date Jan 29, 2015
- KLA-Tencor Corporation
- Chun Guan
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR INSPECTING A REFLECTIVE LITHOGRAPHIC MASK...
- Publication number 20120238096
- Publication date Sep 20, 2012
- KLA-Tencor Corporation
- Yalin Xiong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer Plane Detection of Lithographically Significant Contamination...
- Publication number 20110299758
- Publication date Dec 8, 2011
- KLA-Tencor Corporation
- Ruifang Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Detection of Oversized Sub-Resolution Assist Features
- Publication number 20090310136
- Publication date Dec 17, 2009
- KLA-Tencor Corporation
- Carl E. Hess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE
- Publication number 20080304056
- Publication date Dec 11, 2008
- David Alles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES
- Publication number 20080170773
- Publication date Jul 17, 2008
- KLA-Tencor Technologies Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INSPECTION AND VERIFICATION BY LITHOGRAPHY IMAGE RECONSTR...
- Publication number 20080170774
- Publication date Jul 17, 2008
- KLA-Tencor Technologies Corporation
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Application
Computer-implemented methods for detecting defects in reticle desig...
- Publication number 20060236294
- Publication date Oct 19, 2006
- Zain K. Saidin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods for simulating reticle layout data, inspecting reticle layo...
- Publication number 20060051682
- Publication date Mar 9, 2006
- Carl Hess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yalin Xiong

Person

Patents Grantslast 30 patents

Wafer inspection using difference images

Block-to-block reticle inspection

Monitoring changes in photomask defectivity

Delta die and delta database inspection

Integrated multi-pass inspection

Block-to-block reticle inspection

Monitoring changes in photomask defectivity

Method and apparatus for inspecting a reflective lithographic mask...

Wafer plane detection of lithographically significant contamination...

Methods and systems for classifying defects detected on a reticle

Methods for simulating reticle layout data, inspecting reticle layo...

Detection of thin line for selective sensitivity during reticle ins...

Photomask inspection and verification by lithography image reconstr...

Method for detection of oversized sub-resolution assist features

Feature identification for metrological analysis

Method for detecting lithographically significant defects on reticles

Methods for detecting and classifying defects on a reticle

Computer-implemented methods for detecting defects in reticle desig...

Apparatus and methods for providing selective defect sensitivity

Apparatus and methods for providing selective defect sensitivity

Patents Applicationslast 30 patents

WAFER INSPECTION USING DIFFERENCE IMAGES

INSPECTION OF PHOTOMASKS BY COMPARING TWO PHOTOMASKS

Block-to-Block Reticle Inspection

INTEGRATED MULTI-PASS INSPECTION

MONITORING CHANGES IN PHOTOMASK DEFECTIVITY

Integrated Multi-Pass Inspection

METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR GENERATING HIGH DEN...

DELTA DIE AND DELTA DATABASE INSPECTION

Block-to-Block Reticle Inspection

MONITORING CHANGES IN PHOTOMASK DEFECTIVITY

METHOD AND APPARATUS FOR INSPECTING A REFLECTIVE LITHOGRAPHIC MASK...

Wafer Plane Detection of Lithographically Significant Contamination...

Method for Detection of Oversized Sub-Resolution Assist Features

METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE

METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES

PHOTOMASK INSPECTION AND VERIFICATION BY LITHOGRAPHY IMAGE RECONSTR...

Computer-implemented methods for detecting defects in reticle desig...

Methods for simulating reticle layout data, inspecting reticle layo...