Yasuaki SUZUKI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of plasma treatment using amplitude-modulated RF power
- Patent number 8,021,723
- Issue date Sep 20, 2011
- ASM Japan K.K.
- Yasushi Fukasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
DC bias voltage measurement circuit and plasma CVD apparatus compri...
- Patent number 7,514,934
- Issue date Apr 7, 2009
- ASM Japan K.K.
- Mitsutoshi Shuto
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
CATION EXCHANGE CHROMATOGRAPHY CARRIER FOR REFINING OF ANTIBODIES,...
- Publication number 20150266919
- Publication date Sep 24, 2015
- Takashi Ishihara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
IMPEDANCE MATCHING APPARATUS FOR PLASMA-ENHANCED REACTION REACTOR
- Publication number 20100085129
- Publication date Apr 8, 2010
- ASM JAPAN K.K.
- Mitsutoshi Shuto
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHOD OF PLASMA TREATMENT USING AMPLITUDE-MODULATED RF POWER
- Publication number 20090136683
- Publication date May 28, 2009
- ASM JAPAN K.K.
- Yasushi FUKASAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR MONITORING PLASMA-INDUCED DAMAGE USING DC...
- Publication number 20090056627
- Publication date Mar 5, 2009
- ASM JAPAN K.K.
- Mitsutoshi SHUTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CVD APPARATUS EQUIPPED WITH PLASMA BLOCKING INSULATION PLATE
- Publication number 20070266945
- Publication date Nov 22, 2007
- ASM JAPAN K.K.
- Mitsutoshi Shuto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DC bias voltage measurement circuit and plasma CVD apparatus compri...
- Publication number 20060063284
- Publication date Mar 23, 2006
- ASM JAPAN K.K.
- Mitsutoshi Shuto
- G01 - MEASURING TESTING
Information Patent Application
Semiconductor substrate supporting apparatus
- Publication number 20050037626
- Publication date Feb 17, 2005
- ASM JAPAN K.K./
- Mitsutoshi Shuto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yasuaki SUZUKI

Person

Patents Grantslast 30 patents

Method of plasma treatment using amplitude-modulated RF power

DC bias voltage measurement circuit and plasma CVD apparatus compri...

Patents Applicationslast 30 patents

CATION EXCHANGE CHROMATOGRAPHY CARRIER FOR REFINING OF ANTIBODIES,...

IMPEDANCE MATCHING APPARATUS FOR PLASMA-ENHANCED REACTION REACTOR

METHOD OF PLASMA TREATMENT USING AMPLITUDE-MODULATED RF POWER

METHOD AND APPARATUS FOR MONITORING PLASMA-INDUCED DAMAGE USING DC...

PLASMA CVD APPARATUS EQUIPPED WITH PLASMA BLOCKING INSULATION PLATE

DC bias voltage measurement circuit and plasma CVD apparatus compri...

Semiconductor substrate supporting apparatus