Yasuhiro Horiike

Person

Nishitokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chip using method and test chip
- Patent number 7,972,577
- Issue date Jul 5, 2011
- National Institute for Materials Science
- Yasuhiro Horiike
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Chip using method and test chip
- Patent number 7,691,328
- Issue date Apr 6, 2010
- National Institute for Materials Science
- Yasuhiro Horiike
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Cultured cell construct which contains spheroids of cultured animal...
- Patent number 7,691,369
- Issue date Apr 6, 2010
- Transparent Inc.
- Kazunori Kataoka
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Blood analysis apparatus and blood analysis method
- Patent number 7,678,577
- Issue date Mar 16, 2010
- National Institute for Materials Science
- Yasuhiro Horiike
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Blood analysis device and blood analysis method
- Patent number 7,582,259
- Issue date Sep 1, 2009
- Japan Science and Technology Agency
- Hiroki Ogawa
- G01 - MEASURING TESTING
Information Patent Grant
Cultured cell construct containing spheroids of cultured animal cel...
- Patent number 7,470,424
- Issue date Dec 30, 2008
- Transparent Inc.
- Kazunori Kataoka
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Wafer flattening process and storage medium
- Patent number 6,496,748
- Issue date Dec 17, 2002
- SpeedFam Co., Ltd.
- Michihiko Yanagisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer etching method
- Patent number 6,451,217
- Issue date Sep 17, 2002
- SpeedFam-IPEC Co., Ltd.
- Michihiko Yanagisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer flattening system
- Patent number 6,360,687
- Issue date Mar 26, 2002
- SpeedFam-IPEC Co., Ltd.
- Michihiko Yanagisawa
- B24 - GRINDING POLISHING
Information Patent Grant
Corrosion-resistant system and method for a plasma etching apparatus
- Patent number 6,316,369
- Issue date Nov 13, 2001
- Speedfam Co., Ltd
- Michihiko Yanagisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer flattening process and system
- Patent number 6,280,645
- Issue date Aug 28, 2001
- Yasuhiro Horiike and SpeedFam Co, Ltd.
- Michihiko Yanagisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined CMP and plasma etching wafer flattening system
- Patent number 6,254,718
- Issue date Jul 3, 2001
- SpeedFam Co., Ltd.
- Chikai Tanaka
- B24 - GRINDING POLISHING
Information Patent Grant
Plasma etching method and plasma etching system for carrying out th...
- Patent number 6,159,388
- Issue date Dec 12, 2000
- Speedfam Co., Ltd.
- Michihiko Yanagisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ECR plasma generator and an ECR system using the generator
- Patent number 6,155,200
- Issue date Dec 5, 2000
- Tokyo Electron Limited
- Yasuhiro Horiike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering method and a sputtering apparatus thereof
- Patent number 6,096,176
- Issue date Aug 1, 2000
- Tokyo Electron Limited
- Yasuhiro Horiike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process method and apparatus
- Patent number 5,851,600
- Issue date Dec 22, 1998
- Tokyo Electron, Ltd.
- Yasuhiro Horiike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment apparatus
- Patent number 5,487,785
- Issue date Jan 30, 1996
- Tokyo Electron Kabushiki Kaisha
- Yasuhiro Horiike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for processing surface of semiconductor layer
- Patent number 5,308,791
- Issue date May 3, 1994
- Tokyo Electron Limited
- Yasuhiro Horiike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming dielectric film for semiconductor devices
- Patent number 5,290,609
- Issue date Mar 1, 1994
- Tokyo Electron Limited
- Yasuhiro Horiike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomspheric plasma reaction method and apparatus therefor
- Patent number 5,185,132
- Issue date Feb 9, 1993
- Research Development Corporation of Japan
- Yasuhiro Horiike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phototreating method and apparatus therefor
- Patent number 5,112,645
- Issue date May 12, 1992
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of dry etching and apparatus for use in such method
- Patent number 4,878,995
- Issue date Nov 7, 1989
- Kabushiki Kaisha Toshiba
- Tsunetoshi Arikado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phototreating method and apparatus therefor
- Patent number 4,844,774
- Issue date Jul 4, 1989
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching apparatus
- Patent number 4,838,978
- Issue date Jun 13, 1989
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching process
- Patent number 4,786,361
- Issue date Nov 22, 1988
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-forming method
- Patent number 4,698,238
- Issue date Oct 6, 1987
- Kabushiki Kaisha Toshiba
- Nobuo Hayasaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry-etching method and apparatus therefor
- Patent number 4,668,337
- Issue date May 26, 1987
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phototreating apparatus
- Patent number 4,642,171
- Issue date Feb 10, 1987
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching apparatus and method using reactive gases
- Patent number 4,529,475
- Issue date Jul 16, 1985
- Kabushiki Kaisha Toshiba
- Haruo Okano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching apparatus using reactive ions
- Patent number 4,526,643
- Issue date Jul 2, 1985
- Tokyo Shibaura Denki Kabushiki Kaisha
- Haruo Okano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHIP USING METHOD AND TEST CHIP
- Publication number 20100158757
- Publication date Jun 24, 2010
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Yasuhiro Horiike
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Cultured cell construct which contains spheroids of cultured animal...
- Publication number 20090011504
- Publication date Jan 8, 2009
- Kazunori Kataoka
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
Blood Analysis Apparatus
- Publication number 20080138890
- Publication date Jun 12, 2008
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Yasuhiro Horiike
- G01 - MEASURING TESTING
Information Patent Application
Blood Analysis Apparatus and Blood Analysis Method
- Publication number 20080028821
- Publication date Feb 7, 2008
- Yasuhiro Horiike
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Blood analyzer and method of separating plasma
- Publication number 20060084174
- Publication date Apr 20, 2006
- Hiroki Ogawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Blood analysis device and blood analysis method
- Publication number 20060078873
- Publication date Apr 13, 2006
- Hiroki Ogawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Cultured cell construct containing spheroids of cultured animal cel...
- Publication number 20040197907
- Publication date Oct 7, 2004
- Kazunori Kataoka
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
Multi-step local dry etching method for SOI wafer
- Publication number 20040063329
- Publication date Apr 1, 2004
- SPEEDFAM Co., Ltd.
- Michihiko Yanagisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Blood analyzing method and apparatus
- Publication number 20030114785
- Publication date Jun 19, 2003
- Jun Kikuchi
- G01 - MEASURING TESTING
Information Patent Application
Local etching apparatus and local etching method
- Publication number 20020008082
- Publication date Jan 24, 2002
- SpeedFam Co., Ltd.
- Chikai Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCAL ETCHING APPARATUS AND LOCAL ETCHING METHOD
- Publication number 20010032705
- Publication date Oct 25, 2001
- TAKESHI SADOHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer flattening process and system
- Publication number 20010007275
- Publication date Jul 12, 2001
- SpeedFam Co., Ltd.
- Michihiko Yanagisawa
- H01 - BASIC ELECTRIC ELEMENTS

Yasuhiro Horiike

Person

Patents Grantslast 30 patents

Chip using method and test chip

Chip using method and test chip

Cultured cell construct which contains spheroids of cultured animal...

Blood analysis apparatus and blood analysis method

Blood analysis device and blood analysis method

Cultured cell construct containing spheroids of cultured animal cel...

Wafer flattening process and storage medium

Wafer etching method

Wafer flattening system

Corrosion-resistant system and method for a plasma etching apparatus

Wafer flattening process and system

Combined CMP and plasma etching wafer flattening system

Plasma etching method and plasma etching system for carrying out th...

ECR plasma generator and an ECR system using the generator

Sputtering method and a sputtering apparatus thereof

Plasma process method and apparatus

Plasma treatment apparatus

Method and apparatus for processing surface of semiconductor layer

Method of forming dielectric film for semiconductor devices

Atomspheric plasma reaction method and apparatus therefor

Phototreating method and apparatus therefor

Method of dry etching and apparatus for use in such method

Phototreating method and apparatus therefor

Dry etching apparatus

Dry etching process

Pattern-forming method

Dry-etching method and apparatus therefor

Phototreating apparatus

Dry etching apparatus and method using reactive gases

Dry etching apparatus using reactive ions

Patents Applicationslast 30 patents

CHIP USING METHOD AND TEST CHIP

Cultured cell construct which contains spheroids of cultured animal...

Blood Analysis Apparatus

Blood Analysis Apparatus and Blood Analysis Method

Blood analyzer and method of separating plasma

Blood analysis device and blood analysis method

Cultured cell construct containing spheroids of cultured animal cel...

Multi-step local dry etching method for SOI wafer

Blood analyzing method and apparatus

Local etching apparatus and local etching method

LOCAL ETCHING APPARATUS AND LOCAL ETCHING METHOD

Wafer flattening process and system