Yasuhiro Takaki

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Liquid supply device and liquid supply method
- Patent number 11,626,298
- Issue date Apr 11, 2023
- Tokyo Electron Limited
- Yusuke Takamatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,158,525
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Yasuhiro Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 10,714,365
- Issue date Jul 14, 2020
- Tokyo Electron Limited
- Tetsurou Iriyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus and substrate liquid processi...
- Patent number 10,591,935
- Issue date Mar 17, 2020
- Tokyo Electron Limited
- Yasuhiro Takaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 10,573,539
- Issue date Feb 25, 2020
- Tokyo Electron Limited
- Hiroshi Komiya
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus and substrate liquid processi...
- Patent number 10,162,371
- Issue date Dec 25, 2018
- Tokyo Electron Limited
- Yasuhiro Takaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate liquid processing apparatus and substrate liquid processi...
- Patent number 9,716,020
- Issue date Jul 25, 2017
- Tokyo Electron Limited
- Yasuhiro Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and co...
- Patent number 8,748,780
- Issue date Jun 10, 2014
- Tokyo Electron Limited
- Shouken Moro
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Non-transitory storage medium for rinsing or developing sequence
- Patent number 8,398,320
- Issue date Mar 19, 2013
- Tokyo Electron Limited
- Yasuhiro Takaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinse treatment method and development process method
- Patent number 7,968,278
- Issue date Jun 28, 2011
- Tokyo Electron Limited
- Yasuhiro Takaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LIQUID SUPPLY DEVICE AND LIQUID SUPPLY METHOD
- Publication number 20210111043
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Yusuke TAKAMATSU
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20190079544
- Publication date Mar 14, 2019
- TOKYO ELECTRON LIMITED
- Yasuhiro Takaki
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20190067048
- Publication date Feb 28, 2019
- Tokyo Electron Limited
- Yasuhiro Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20180358240
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Hiroshi Komiya
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20180330974
- Publication date Nov 15, 2018
- Tokyo Electron Limited
- Tetsurou Iriyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20150131403
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Yasuhiro Takaki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20150107622
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Yasuhiro Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RINSING METHOD AND DEVELOPING METHOD
- Publication number 20110229120
- Publication date Sep 22, 2011
- TOKYO ELECTRON LIMITED
- Yasuhiro TAKAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinse Treatment Method and Development Process Method
- Publication number 20080274433
- Publication date Nov 6, 2008
- TOKYO ELECTRON LIMITED
- Yasuhiro Takaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus, substrate processing method, and co...
- Publication number 20080171131
- Publication date Jul 17, 2008
- TOKYO ELECTRON LIMITED
- Shouken Moro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yasuhiro Takaki

Person

Patents Grantslast 30 patents

Liquid supply device and liquid supply method

Substrate processing apparatus and substrate processing method

Liquid processing apparatus

Substrate liquid processing apparatus and substrate liquid processi...

Substrate liquid processing apparatus

Substrate liquid processing apparatus and substrate liquid processi...

Substrate liquid processing apparatus and substrate liquid processi...

Substrate processing apparatus, substrate processing method, and co...

Non-transitory storage medium for rinsing or developing sequence

Rinse treatment method and development process method

Patents Applicationslast 30 patents

LIQUID SUPPLY DEVICE AND LIQUID SUPPLY METHOD

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE LIQUID PROCESSING APPARATUS

LIQUID PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

RINSING METHOD AND DEVELOPING METHOD

Rinse Treatment Method and Development Process Method

Substrate processing apparatus, substrate processing method, and co...