Yasumasa KAWABE

Person

Fujinomiya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method, etching method and method for producing cap...
- Patent number 10,289,001
- Issue date May 14, 2019
- FUJIFILM Corporation
- Hideaki Ito
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Photosensitive resin composition, cured product and method for prod...
- Patent number 10,133,175
- Issue date Nov 20, 2018
- Fujifilm Corporation
- Daisuke Kashiwagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive transfer material, pattern formation method, and etc...
- Patent number 9,810,984
- Issue date Nov 7, 2017
- FUJIFILM Corporation
- Hideaki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, cured product and method for prod...
- Patent number 9,599,901
- Issue date Mar 21, 2017
- FUJIFILM Corporation
- Daisuke Kashiwagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin pattern, method for producing the pattern, method for produci...
- Patent number 8,728,716
- Issue date May 20, 2014
- FUJIFILM Corporation
- Takeshi Andou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 7,255,971
- Issue date Aug 14, 2007
- FUJIFILM Corporation
- Toru Fujimori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive composition
- Patent number 7,214,465
- Issue date May 8, 2007
- FUJIFILM Corporation
- Hajime Nakao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive resin composition
- Patent number 6,846,610
- Issue date Jan 25, 2005
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive resin composition
- Patent number 6,806,022
- Issue date Oct 19, 2004
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition
- Patent number 6,743,562
- Issue date Jun 1, 2004
- Fuji Photo Film Co., Ltd.
- Mokoto Momota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive composition
- Patent number 6,699,635
- Issue date Mar 2, 2004
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 6,692,897
- Issue date Feb 17, 2004
- Fuji Photo Film Co., Ltd.
- Toru Fujimori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,596,458
- Issue date Jul 22, 2003
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition
- Patent number 6,376,152
- Issue date Apr 23, 2002
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin
- Patent number 6,159,656
- Issue date Dec 12, 2000
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photoresist composition
- Patent number 5,948,587
- Issue date Sep 7, 1999
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photoresist composition
- Patent number 5,709,977
- Issue date Jan 20, 1998
- Fuji Photo Film Co., Ltd.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resin composition sensitive to ultraviolet rays
- Patent number 5,707,776
- Issue date Jan 13, 1998
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist compositions comprising an alkali-solu...
- Patent number 5,674,657
- Issue date Oct 7, 1997
- Olin Microelectronic Chemicals, Inc.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photoresist composition
- Patent number 5,652,081
- Issue date Jul 29, 1997
- Fuji Photo Film Co., Ltd.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 5,629,128
- Issue date May 13, 1997
- Fuji Photo Film Co., Ltd.
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition containing quinonediazide esterifi...
- Patent number 5,620,828
- Issue date Apr 15, 1997
- Fuji Photo Film Co., Ltd.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 5,609,982
- Issue date Mar 11, 1997
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photoresist composition comprising a novolak resin ma...
- Patent number 5,576,139
- Issue date Nov 19, 1996
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive working photoresist composition
- Patent number 5,554,481
- Issue date Sep 10, 1996
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition
- Patent number 5,534,382
- Issue date Jul 9, 1996
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Postive photoresist composition
- Patent number 5,529,881
- Issue date Jun 25, 1996
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for synthesizing quinonediazide ester utilizing base catalyst
- Patent number 5,523,396
- Issue date Jun 4, 1996
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist composition comprising a novolak resin having...
- Patent number 5,494,773
- Issue date Feb 27, 1996
- Fuji Photo Film Co., Ltd.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photoresist composition containing naphthoquinone...
- Patent number 5,429,905
- Issue date Jul 4, 1995
- Fuji Photo Film Co., Ltd.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD, ETCHING METHOD AND METHOD FOR PRODUCING CAP...
- Publication number 20170199458
- Publication date Jul 13, 2017
- FUJIFILM CORPORATION
- Hideaki ITO
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PROD...
- Publication number 20160327865
- Publication date Nov 10, 2016
- FUJIFILM CORPORATION
- Daisuke KASHIWAGI
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PROD...
- Publication number 20160320529
- Publication date Nov 3, 2016
- FUJIFILM CORPORATION
- Daisuke KASHIWAGI
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETC...
- Publication number 20150219993
- Publication date Aug 6, 2015
- FUJIFILM CORPORATION
- Hideaki ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN PATTERN, METHOD FOR PRODUCING THE PATTERN, METHOD FOR PRODUCI...
- Publication number 20120231396
- Publication date Sep 13, 2012
- FUJIFILM CORPORATION
- Takeshi ANDOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photosensitive composition
- Publication number 20030224285
- Publication date Dec 4, 2003
- Fuji Photo Film Co., Ltd.
- Hajime Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photosensitive resin composition
- Publication number 20030138727
- Publication date Jul 24, 2003
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20030134225
- Publication date Jul 17, 2003
- Fuji Photo Film Co., Ltd.
- Toru Fujimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20020172886
- Publication date Nov 21, 2002
- Fuji Photo Film Co., Ltd.
- Makoto Momota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive resist composition
- Publication number 20020155383
- Publication date Oct 24, 2002
- Fuji Photo Film Co., Ltd.
- Toru Fujimori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive photoresist composition
- Publication number 20010021479
- Publication date Sep 13, 2001
- Yasumasa Kawabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Yasumasa KAWABE

Person

Patents Grantslast 30 patents

Pattern forming method, etching method and method for producing cap...

Photosensitive resin composition, cured product and method for prod...

Photosensitive transfer material, pattern formation method, and etc...

Photosensitive resin composition, cured product and method for prod...

Resin pattern, method for producing the pattern, method for produci...

Positive resist composition

Positive photosensitive composition

Positive photosensitive resin composition

Positive photosensitive resin composition

Positive photoresist composition

Positive photosensitive composition

Positive resist composition

Positive-working photoresist composition

Positive photoresist composition

Positive photosensitive resin

Positive working photoresist composition

Positive working photoresist composition

Positive resin composition sensitive to ultraviolet rays

Positive-working photoresist compositions comprising an alkali-solu...

Positive working photoresist composition

Positive photoresist composition

Positive photoresist composition containing quinonediazide esterifi...

Positive-working photoresist composition

Positive type photoresist composition comprising a novolak resin ma...

Positive working photoresist composition

Positive photoresist composition

Postive photoresist composition

Process for synthesizing quinonediazide ester utilizing base catalyst

Positive photoresist composition comprising a novolak resin having...

Positive working photoresist composition containing naphthoquinone...

Patents Applicationslast 30 patents

PATTERN FORMING METHOD, ETCHING METHOD AND METHOD FOR PRODUCING CAP...

PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PROD...

PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PROD...

PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETC...

RESIN PATTERN, METHOD FOR PRODUCING THE PATTERN, METHOD FOR PRODUCI...

Positive photosensitive composition

Positive photosensitive resin composition

Positive resist composition

Positive photoresist composition

Positive resist composition

Positive photoresist composition