Yasunobu Onishi

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device manufacturing method to form resist pattern
- Patent number 7,968,272
- Issue date Jun 28, 2011
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and method of manufacturing semiconductor de...
- Patent number 7,794,922
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist pattern forming method and manufacturing method of semicondu...
- Patent number 7,687,227
- Issue date Mar 30, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for a predicting a pattern shape by using an actual measured...
- Patent number 7,319,944
- Issue date Jan 15, 2008
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, underlayer film forming composition, and me...
- Patent number 7,300,884
- Issue date Nov 27, 2007
- Kabushiki Kaisha Toshiba
- Yuriko Seino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern
- Patent number 7,198,886
- Issue date Apr 3, 2007
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and method for manufacturing semiconductor d...
- Patent number 7,026,099
- Issue date Apr 11, 2006
- Kabushiki Kaisha Toshiba
- Hirokazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a pattern and method of manufacturing semiconduc...
- Patent number 6,806,021
- Issue date Oct 19, 2004
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition having uniform concentration distributio...
- Patent number 6,703,181
- Issue date Mar 9, 2004
- Kabushiki Kaisha Toshiba
- Takao Hayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Manufacturing method of semiconductor device using mask pattern hav...
- Patent number 6,576,562
- Issue date Jun 10, 2003
- Kabushiki Kaisha Toshiba
- Junko Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a pattern
- Patent number 6,569,595
- Issue date May 27, 2003
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a pattern
- Patent number 6,420,271
- Issue date Jul 16, 2002
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern
- Patent number 6,270,948
- Issue date Aug 7, 2001
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a resist pattern
- Patent number 6,225,033
- Issue date May 1, 2001
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for underlying film and method of forming a pattern usi...
- Patent number 6,054,254
- Issue date Apr 25, 2000
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a pattern using polysilane
- Patent number 6,025,117
- Issue date Feb 15, 2000
- Kabushiki Kaisha Toshiba
- Yoshihiko Nakano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method utilizing first insulative and then conducti...
- Patent number 5,994,007
- Issue date Nov 30, 1999
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topography simulation method
- Patent number 5,889,678
- Issue date Mar 30, 1999
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern forming method including the formation of an acidic coating...
- Patent number RE35821
- Issue date Jun 9, 1998
- Kabushiki Kaisha Toshiba
- Hirokazu Niki
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
Resist composition for forming a pattern and method of forming a pa...
- Patent number 5,744,281
- Issue date Apr 28, 1998
- Kabushiki Kaisha Toshiba
- Hirokazu Niki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for forming a pattern comprising a pyridinium co...
- Patent number 5,658,706
- Issue date Aug 19, 1997
- Kabushiki Kaisha Toshiba
- Hirokazu Niki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist patterns
- Patent number 5,580,702
- Issue date Dec 3, 1996
- Kabushiki Kaisha Toshiba
- Rumiko Hayase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist for forming patterns comprising an acid generating compound...
- Patent number 5,403,695
- Issue date Apr 4, 1995
- Kabushiki Kaisha Toshiba
- Rumiko Hayase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method including the formation of an acidic coating...
- Patent number 5,326,675
- Issue date Jul 5, 1994
- Kabushiki Kaisha Toshiba
- Hirokazu Niki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation resist and pattern formation method
- Patent number 5,279,921
- Issue date Jan 18, 1994
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysilanes, polysiloxanes and silicone resist materials containing...
- Patent number 5,198,520
- Issue date Mar 30, 1993
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition
- Patent number 5,100,768
- Issue date Mar 31, 1992
- Kabushiki Kaisha Toshiba
- Hirokazu Niki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkali soluble phenol polymer photosensitive composition
- Patent number 5,091,282
- Issue date Feb 25, 1992
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition
- Patent number 5,063,134
- Issue date Nov 5, 1991
- Kabushiki Kaisha Toshiba
- Rumiko Horiguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
A silicone resist materials containing a polysiloxane and a photo-s...
- Patent number 5,017,453
- Issue date May 21, 1991
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...
- Publication number 20110229826
- Publication date Sep 22, 2011
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Forming Method and Method of Manufacturing Semiconductor De...
- Publication number 20110039214
- Publication date Feb 17, 2011
- Kabushiki Kaisha Toshiba
- Shinichi ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device manufacturing method to form resist pattern, a...
- Publication number 20070128554
- Publication date Jun 7, 2007
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming method and manufacturing method of semicondu...
- Publication number 20070042297
- Publication date Feb 22, 2007
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method of manufacturing semiconductor de...
- Publication number 20060263726
- Publication date Nov 23, 2006
- Shinichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming method and method of manufacturing semicondu...
- Publication number 20060194449
- Publication date Aug 31, 2006
- Tomoyuki Takeishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method of manufacturing semiconductor de...
- Publication number 20060127815
- Publication date Jun 15, 2006
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method, underlayer film forming composition, and me...
- Publication number 20060115990
- Publication date Jun 1, 2006
- Yuriko Seino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20060008746
- Publication date Jan 12, 2006
- Yasunobu Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming pattern
- Publication number 20050233255
- Publication date Oct 20, 2005
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method for manufacturing semiconductor d...
- Publication number 20050214695
- Publication date Sep 29, 2005
- Hirokazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a pattern and method of manufacturing semiconduc...
- Publication number 20050153245
- Publication date Jul 14, 2005
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method
- Publication number 20040265745
- Publication date Dec 30, 2004
- Koutaro Sho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Computer implemented method for development profile simulation, com...
- Publication number 20040236548
- Publication date Nov 25, 2004
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method for manufacturing semiconductor d...
- Publication number 20030215749
- Publication date Nov 20, 2003
- Hirokazu Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a pattern and method of manufacturing semiconduc...
- Publication number 20030064323
- Publication date Apr 3, 2003
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor device using mask pattern hav...
- Publication number 20020119612
- Publication date Aug 29, 2002
- Kabushiki Kaisha Toshiba
- Junko Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming pattern
- Publication number 20020061453
- Publication date May 23, 2002
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a pattern
- Publication number 20010034131
- Publication date Oct 25, 2001
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- H01 - BASIC ELECTRIC ELEMENTS

Yasunobu Onishi

Person

Patents Grantslast 30 patents

Semiconductor device manufacturing method to form resist pattern

Pattern forming method and method of manufacturing semiconductor de...

Resist pattern forming method and manufacturing method of semicondu...

Method for a predicting a pattern shape by using an actual measured...

Pattern forming method, underlayer film forming composition, and me...

Method for forming pattern

Pattern forming method and method for manufacturing semiconductor d...

Method for forming a pattern and method of manufacturing semiconduc...

Photosensitive composition having uniform concentration distributio...

Manufacturing method of semiconductor device using mask pattern hav...

Method of forming a pattern

Method of forming a pattern

Method of forming pattern

Method of forming a resist pattern

Composition for underlying film and method of forming a pattern usi...

Method of forming a pattern using polysilane

Pattern forming method utilizing first insulative and then conducti...

Topography simulation method

Pattern forming method including the formation of an acidic coating...

Resist composition for forming a pattern and method of forming a pa...

Resist composition for forming a pattern comprising a pyridinium co...

Method for forming resist patterns

Resist for forming patterns comprising an acid generating compound...

Pattern forming method including the formation of an acidic coating...

Pattern formation resist and pattern formation method

Polysilanes, polysiloxanes and silicone resist materials containing...

Photosensitive composition

Alkali soluble phenol polymer photosensitive composition

Photosensitive composition

A silicone resist materials containing a polysiloxane and a photo-s...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...

Pattern Forming Method and Method of Manufacturing Semiconductor De...

Semiconductor device manufacturing method to form resist pattern, a...

Resist pattern forming method and manufacturing method of semicondu...

Pattern forming method and method of manufacturing semiconductor de...

Resist pattern forming method and method of manufacturing semicondu...

Pattern forming method and method of manufacturing semiconductor de...

Pattern forming method, underlayer film forming composition, and me...

Method for manufacturing semiconductor device

Method for forming pattern

Pattern forming method and method for manufacturing semiconductor d...

Method for forming a pattern and method of manufacturing semiconduc...

Pattern forming method

Computer implemented method for development profile simulation, com...

Pattern forming method and method for manufacturing semiconductor d...

Method for forming a pattern and method of manufacturing semiconduc...

Manufacturing method of semiconductor device using mask pattern hav...

Method for forming pattern

Method of forming a pattern