Yasuo Kobayashi

Person

Yamanashi-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,171,014
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Hideomi Hane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus, method of cleaning film forming apparatus,...
- Patent number 10,626,496
- Issue date Apr 21, 2020
- Tokyo Electron Limited
- Takayuki Karakawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method, film forming apparatus, and storage medium
- Patent number 10,438,791
- Issue date Oct 8, 2019
- Tokyo Electron Limited
- Hideomi Hane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Placing bed structure, treating apparatus using the structure, and...
- Patent number 10,388,557
- Issue date Aug 20, 2019
- Tokyo Electron Limited
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Placing bed structure, treating apparatus using the structure, and...
- Patent number 9,177,846
- Issue date Nov 3, 2015
- Tokyo Electron Limited
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treatment for a fluorocarbon film
- Patent number 8,765,605
- Issue date Jul 1, 2014
- Tokyo Electron Limited
- Masahiro Horigome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method
- Patent number 8,398,813
- Issue date Mar 19, 2013
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,017,197
- Issue date Sep 13, 2011
- Tokyo Electron Limited
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 7,897,205
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Takatoshi Kameshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of semiconductor device and film deposition sy...
- Patent number 7,803,705
- Issue date Sep 28, 2010
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate for electronic device capable of suppressing fluorine ato...
- Patent number 7,776,736
- Issue date Aug 17, 2010
- Tokyo Electron Limited
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, method for manufacturing semiconductor device...
- Patent number 7,704,893
- Issue date Apr 27, 2010
- Tokyo Eectron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,521,324
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for surface treatment
- Patent number 7,146,744
- Issue date Dec 12, 2006
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for surface treatment
- Patent number 7,094,703
- Issue date Aug 22, 2006
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and apparatus for removing oxide film
- Patent number 6,776,874
- Issue date Aug 17, 2004
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and apparatus for removing oxide film
- Patent number 6,706,334
- Issue date Mar 16, 2004
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a titanium film and a barrier film on a surface o...
- Patent number 6,537,621
- Issue date Mar 25, 2003
- Tokyo Electron Limited
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment system
- Patent number 6,322,662
- Issue date Nov 27, 2001
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD-Ti film forming method
- Patent number 6,197,674
- Issue date Mar 6, 2001
- Tokyo Electron Limited
- Hideki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a titanium film and a barrier metal film on a sur...
- Patent number 6,051,281
- Issue date Apr 18, 2000
- Tokyo Electron Limited
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process method and apparatus
- Patent number 5,851,600
- Issue date Dec 22, 1998
- Tokyo Electron, Ltd.
- Yasuhiro Horiike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 5,698,036
- Issue date Dec 16, 1997
- Tokyo Electron Limited
- Nobuo Ishii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering apparatus and sputtering gun for use in the same
- Patent number 5,334,302
- Issue date Aug 2, 1994
- Tokyo Electron Limited
- Kenichi Kubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Film Forming Method, Film Forming Apparatus, and Storage Medium
- Publication number 20180366315
- Publication date Dec 20, 2018
- TOKYO ELECTRON LIMITED
- Hideomi Hane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, METHOD OF CLEANING FILM FORMING APPARATUS,...
- Publication number 20180355479
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Takayuki KARAKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180358235
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Hideomi HANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING BED STRUCTURE, TREATING APPARATUS USING THE STRUCTURE, AND...
- Publication number 20160020135
- Publication date Jan 21, 2016
- TOKYO ELECTRON LIMITED
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROV...
- Publication number 20150255258
- Publication date Sep 10, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150155141
- Publication date Jun 4, 2015
- TOKYO ELECTRON LIMITED
- Yasuo KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERLAYER INSULATING LAYER FORMING METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20130130513
- Publication date May 23, 2013
- TOKYO ELECTRON LIMITED
- Kotaro Miyatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT FOR A FLUOROCARBON FILM
- Publication number 20110318919
- Publication date Dec 29, 2011
- Tokyo Electron Limited
- Masahiro Horigome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING BED STRUCTURE, TREATING APPARATUS USING THE STRUCTURE, AND...
- Publication number 20100264115
- Publication date Oct 21, 2010
- TOKYO ELECTRON LIMITED
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMORPHOUS CARBON FILM, SEMICONDUCTOR DEVICE, FILM FORMING METHOD, F...
- Publication number 20100032838
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Yoshiyuki Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20090061092
- Publication date Mar 5, 2009
- Tokyo Electron Limited
- Takatoshi Kameshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Method and Film Forming Apparatus
- Publication number 20080311313
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Manufacturing Method Of Semiconductor Device And Film Deposition Sy...
- Publication number 20080254641
- Publication date Oct 16, 2008
- Tokyo Electron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing apparatus and processing method
- Publication number 20080113104
- Publication date May 15, 2008
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing apparatus and processing method
- Publication number 20080067147
- Publication date Mar 20, 2008
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Assisted Deposition Method and System for Carrying Out the Same
- Publication number 20070259131
- Publication date Nov 8, 2007
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE FOR ELECTRONIC DEVICE AND METHOD FOR PROCESSING SAME
- Publication number 20070228527
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20070077737
- Publication date Apr 5, 2007
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20070052042
- Publication date Mar 8, 2007
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of substrate processing and apparatus for substrate processing
- Publication number 20070032073
- Publication date Feb 8, 2007
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, method for manufacturing semiconductor device...
- Publication number 20060264059
- Publication date Nov 23, 2006
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma film-forming method and plasma film-forming apparatus
- Publication number 20060251828
- Publication date Nov 9, 2006
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for forming film, method for manufacturing semiconductor dev...
- Publication number 20060223306
- Publication date Oct 5, 2006
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing apparatus and processing method
- Publication number 20050150455
- Publication date Jul 14, 2005
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for surface treatment
- Publication number 20040194340
- Publication date Oct 7, 2004
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for surface treatment
- Publication number 20040175944
- Publication date Sep 9, 2004
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing apparatus and processing system
- Publication number 20020062790
- Publication date May 30, 2002
- Kyoko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing method and apparatus for removing oxide film
- Publication number 20010015261
- Publication date Aug 23, 2001
- TOKYO ELECTRO LIMITED
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Yasuo Kobayashi

Person

Patents Grantslast 30 patents

Substrate processing method and substrate processing apparatus

Film forming apparatus, method of cleaning film forming apparatus,...

Film forming method, film forming apparatus, and storage medium

Placing bed structure, treating apparatus using the structure, and...

Placing bed structure, treating apparatus using the structure, and...

Surface treatment for a fluorocarbon film

Processing apparatus and processing method

Plasma processing method and plasma processing apparatus

Film forming method and film forming apparatus

Manufacturing method of semiconductor device and film deposition sy...

Substrate for electronic device capable of suppressing fluorine ato...

Semiconductor device, method for manufacturing semiconductor device...

Semiconductor device and method for manufacturing the same

Method and apparatus for surface treatment

Method and apparatus for surface treatment

Processing method and apparatus for removing oxide film

Processing method and apparatus for removing oxide film

Method of forming a titanium film and a barrier film on a surface o...

Plasma treatment system

CVD-Ti film forming method

Method of forming a titanium film and a barrier metal film on a sur...

Plasma process method and apparatus

Plasma processing apparatus

Magnetron sputtering apparatus and sputtering gun for use in the same

Patents Applicationslast 30 patents

Film Forming Method, Film Forming Apparatus, and Storage Medium

FILM FORMING APPARATUS, METHOD OF CLEANING FILM FORMING APPARATUS,...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLACING BED STRUCTURE, TREATING APPARATUS USING THE STRUCTURE, AND...

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROV...

PLASMA PROCESSING APPARATUS

INTERLAYER INSULATING LAYER FORMING METHOD AND SEMICONDUCTOR DEVICE

SURFACE TREATMENT FOR A FLUOROCARBON FILM

PLACING BED STRUCTURE, TREATING APPARATUS USING THE STRUCTURE, AND...

AMORPHOUS CARBON FILM, SEMICONDUCTOR DEVICE, FILM FORMING METHOD, F...

FILM FORMING METHOD AND FILM FORMING APPARATUS

Film Forming Method and Film Forming Apparatus

Manufacturing Method Of Semiconductor Device And Film Deposition Sy...

Processing apparatus and processing method

Processing apparatus and processing method

Plasma-Assisted Deposition Method and System for Carrying Out the Same

SUBSTRATE FOR ELECTRONIC DEVICE AND METHOD FOR PROCESSING SAME

Plasma processing method and plasma processing apparatus

Semiconductor device and method for manufacturing the same

Method of substrate processing and apparatus for substrate processing

Semiconductor device, method for manufacturing semiconductor device...

Plasma film-forming method and plasma film-forming apparatus

Method for forming film, method for manufacturing semiconductor dev...

Processing apparatus and processing method

Method and apparatus for surface treatment

Method and apparatus for surface treatment

Processing apparatus and processing system

Processing method and apparatus for removing oxide film