Yasutomo Kawanishi

Person

Minami-ashigara, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition containing novel sulfonium compound, pattern-for...
- Patent number 8,110,333
- Issue date Feb 7, 2012
- FUJIFILM Corporation
- Sou Kamimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for electron beam, X-ray, or EUV, and pattern-fo...
- Patent number 8,084,183
- Issue date Dec 27, 2011
- FUJIFILM Corporation
- Katsuhiro Yamashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium compound, photosensitive composition containing the compo...
- Patent number 8,021,819
- Issue date Sep 20, 2011
- FUJIFILM Corporation
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition, compound for use in the photosensitive...
- Patent number 7,851,130
- Issue date Dec 14, 2010
- FUJIFILM Corporation
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition and pattern-forming method using the same
- Patent number 7,807,329
- Issue date Oct 5, 2010
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 7,718,344
- Issue date May 18, 2010
- FUJIFILM Corporation
- Sou Kamimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern formation method using the...
- Patent number 7,615,330
- Issue date Nov 10, 2009
- FUJIFILM Corporation
- Sou Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, compound for use in the resist composition and...
- Patent number 7,541,131
- Issue date Jun 2, 2009
- FUJIFILM Corporation
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silver halide photographic light-sensitive material
- Patent number 7,179,586
- Issue date Feb 20, 2007
- Fuji Photo Film Co., Ltd.
- Takanori Hioki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic light-sensitive materials and method for...
- Patent number 6,818,374
- Issue date Nov 16, 2004
- Fuji Photo Film Co., Ltd.
- Tokuju Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FO...
- Publication number 20090047598
- Publication date Feb 19, 2009
- FUJIFILM CORPORATION
- Katsuhiro YAMASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FOR...
- Publication number 20090042124
- Publication date Feb 12, 2009
- FUJIFILM CORPORATION
- Sou KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080085468
- Publication date Apr 10, 2008
- FUJIFILM CORPORATION
- Sou KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE...
- Publication number 20080081288
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive resist composition and pattern formation method using the...
- Publication number 20070224540
- Publication date Sep 27, 2007
- FUJIFILM Corporation
- Sou Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sulfonium salt, curable composition, ink composition, inkjet record...
- Publication number 20070197677
- Publication date Aug 23, 2007
- FUJIFILM CORPORATION
- Tomotaka Tsuchimura
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel sulfonium compound, photosensitive composition containing the...
- Publication number 20070184384
- Publication date Aug 9, 2007
- FUJIFILM Corporation
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive resist composition and pattern forming method using the same
- Publication number 20070072117
- Publication date Mar 29, 2007
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive composition and pattern-forming method using the same
- Publication number 20060210919
- Publication date Sep 21, 2006
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition, compound for use in the resist composition and...
- Publication number 20060194147
- Publication date Aug 31, 2006
- Fuji Photo Film Co., Ltd.
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Silver halide photographic light-sensitive material
- Publication number 20040259043
- Publication date Dec 23, 2004
- Fuji Photo Film Co., Ltd.
- Takanori Hioki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silver halide photographic light-sensitive materials and method for...
- Publication number 20030235792
- Publication date Dec 25, 2003
- Tokuju Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yasutomo Kawanishi

Person

Patents Grantslast 30 patents

Resist composition containing novel sulfonium compound, pattern-for...

Resist composition for electron beam, X-ray, or EUV, and pattern-fo...

Sulfonium compound, photosensitive composition containing the compo...

Photosensitive composition, compound for use in the photosensitive...

Photosensitive composition and pattern-forming method using the same

Resist composition and pattern forming method using the same

Positive resist composition and pattern formation method using the...

Resist composition, compound for use in the resist composition and...

Silver halide photographic light-sensitive material

Silver halide photographic light-sensitive materials and method for...

Patents Applicationslast 30 patents

RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FO...

RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FOR...

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE...

Positive resist composition and pattern formation method using the...

Sulfonium salt, curable composition, ink composition, inkjet record...

Novel sulfonium compound, photosensitive composition containing the...

Positive resist composition and pattern forming method using the same

Photosensitive composition and pattern-forming method using the same

Resist composition, compound for use in the resist composition and...

Silver halide photographic light-sensitive material

Silver halide photographic light-sensitive materials and method for...