Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition

Abstract

A photosensitive composition, which comprises a compound represented by formula (I):

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic drawing of a laboratory apparatus of two-beam interference exposure,

Claims

1. A photosensitive composition, which comprises a compound represented by formula (I):

2. The photosensitive composition according to claim 1, which further comprises a resin capable of decomposing by an action of an acid to increase solubility in an alkali developing solution.

3. The photosensitive composition according to claim 1, which further comprises: a resin soluble in an alkali developing solution; andan acid crosslinking agent capable of crosslinking with the resin soluble in an alkali developing solution by an action of an acid.

4. The photosensitive composition according to claim 1, which is exposed with X-ray, electron beam or EUV.

5. A pattern-forming method, which comprises: forming a photosensitive film with a photosensitive composition according to claim 1; and exposing and developing the photosensitive film.

6. A compound represented by formula (I):