Yi Guo

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing composition and method of polishing a substrate having en...
- Patent number 12,024,652
- Issue date Jul 2, 2024
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing composition containing composite sili...
- Patent number 11,718,769
- Issue date Aug 8, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Neutral to alkaline chemical mechanical polishing compositions and...
- Patent number 11,591,495
- Issue date Feb 28, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of enhancing the removal rate of polysilicon
- Patent number 11,472,984
- Issue date Oct 18, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing composition containing composite sili...
- Patent number 11,384,254
- Issue date Jul 12, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective chemical mechanical polishing cobalt, zirconium...
- Patent number 11,292,938
- Issue date Apr 5, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Murali Ganth Theivanayagam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition and method of polishing a substrate having en...
- Patent number 11,274,230
- Issue date Mar 15, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical mechanical polishing compositions having stabilized abrasi...
- Patent number 11,198,797
- Issue date Dec 14, 2021
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Neutral to alkaline chemical mechanical polishing compositions and...
- Patent number 10,995,238
- Issue date May 4, 2021
- Rohm and Haas Electronic Materials CMP Holdings
- Yi Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Acid polishing composition and method of polishing a substrate havi...
- Patent number 10,781,343
- Issue date Sep 22, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition and method of polishing a substrate having en...
- Patent number 10,683,439
- Issue date Jun 16, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- B24 - GRINDING POLISHING
Information Patent Grant
Aqueous silica slurry and amine carboxylic acid compositions select...
- Patent number 10,584,265
- Issue date Mar 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 10,569,384
- Issue date Feb 25, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Aqueous low abrasive silica slurry and amine carboxylic acid compos...
- Patent number 10,508,221
- Issue date Dec 17, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 10,464,188
- Issue date Nov 5, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Low-abrasive CMP slurry compositions with tunable selectivity
- Patent number 10,119,048
- Issue date Nov 6, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous compositions of stabilized aminosilane group containing sil...
- Patent number 9,803,108
- Issue date Oct 31, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- B24 - GRINDING POLISHING
Information Patent Grant
Aqueous compositions of low abrasive silica particles
- Patent number 9,783,702
- Issue date Oct 10, 2017
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Yi Guo
- B24 - GRINDING POLISHING
Information Patent Grant
Method of polishing semiconductor substrate
- Patent number 9,534,148
- Issue date Jan 3, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method
- Patent number 9,484,212
- Issue date Nov 1, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method of polishing semiconductor substrate
- Patent number 9,293,339
- Issue date Mar 22, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing composition and method for polishing...
- Patent number 9,275,899
- Issue date Mar 1, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Low defect chemical mechanical polishing composition
- Patent number 9,012,327
- Issue date Apr 21, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for chemical mechanical polishing tungsten
- Patent number 8,865,013
- Issue date Oct 21, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing composition and method for polishing...
- Patent number 8,790,160
- Issue date Jul 29, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Jaeseok Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Stabilized, concentratable chemical mechanical polishing compositio...
- Patent number 8,568,610
- Issue date Oct 29, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Zhendong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry composition having tunable dielectric polishing selectivity...
- Patent number 8,513,126
- Issue date Aug 20, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Zhendong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of polishing a substrate comprising polysilicon and at least...
- Patent number 8,496,843
- Issue date Jul 30, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of polishing a substrate comprising polysilicon, silicon oxi...
- Patent number 8,491,808
- Issue date Jul 23, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of polishing a substrate comprising polysilicon and at least...
- Patent number 8,492,277
- Issue date Jul 23, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR PREVENTING...
- Publication number 20250019567
- Publication date Jan 16, 2025
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF ENHANCING THE REMOVAL RATE OF POLYSILICON
- Publication number 20230099954
- Publication date Mar 30, 2023
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVING EN...
- Publication number 20230083732
- Publication date Mar 16, 2023
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVING EN...
- Publication number 20220348788
- Publication date Nov 3, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION CONTAINING COMPOSITE SILI...
- Publication number 20220177729
- Publication date Jun 9, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION CONTAINING COMPOSITE SILI...
- Publication number 20210324236
- Publication date Oct 21, 2021
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND...
- Publication number 20210163787
- Publication date Jun 3, 2021
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVE CHEMICAL MECHANICAL POLISHING COBALT, ZIRCONIUM...
- Publication number 20210071034
- Publication date Mar 11, 2021
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Murali Ganth Theivanayagam
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITIONS HAVING STABILIZED ABRASI...
- Publication number 20200239737
- Publication date Jul 30, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACID POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVI...
- Publication number 20200239734
- Publication date Jul 30, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND...
- Publication number 20200010726
- Publication date Jan 9, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVING EN...
- Publication number 20190284435
- Publication date Sep 19, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- B24 - GRINDING POLISHING
Information Patent Application
AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS SELECT...
- Publication number 20190092972
- Publication date Mar 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS LOW ABRASIVE SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOS...
- Publication number 20190092970
- Publication date Mar 28, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING COMPOSITION COMPRISING POSITIVE AND NEGATIVE SILICA P...
- Publication number 20180094166
- Publication date Apr 5, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR POLISHING...
- Publication number 20150380295
- Publication date Dec 31, 2015
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LOW DEFECT CHEMICAL MECHANICAL POLISHING COMPOSITION
- Publication number 20150079788
- Publication date Mar 19, 2015
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method Of Polishing A Substrate
- Publication number 20130109181
- Publication date May 2, 2013
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method Of Polishing Using Tunable Polishing Formulation
- Publication number 20130109182
- Publication date May 2, 2013
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for chemical mechanical polishing tungsten
- Publication number 20130045598
- Publication date Feb 21, 2013
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing Composition and Method For Polishing...
- Publication number 20120276819
- Publication date Nov 1, 2012
- Jaeseok Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing Composition and Method For Polishing...
- Publication number 20120276742
- Publication date Nov 1, 2012
- Jaeseok Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Stabilized Chemical Mechanical Polishing Composition and Method of...
- Publication number 20120258598
- Publication date Oct 11, 2012
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Stabilized, Concentratable Chemical Mechanical Polishing Compositio...
- Publication number 20120070989
- Publication date Mar 22, 2012
- Zhendong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Slurry Composition Having Tunable Dielectric Polishing Selectivity...
- Publication number 20120070990
- Publication date Mar 22, 2012
- Zhendong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Stabilized Chemical Mechanical Polishing Composition And Method Of...
- Publication number 20110306211
- Publication date Dec 15, 2011
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of chemical mechanical polishing a substrate with polishing...
- Publication number 20110244685
- Publication date Oct 6, 2011
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of polishing a substrate comprising polysilicon and at least...
- Publication number 20110230049
- Publication date Sep 22, 2011
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of polishing a substrate comprising polysilicon, silicon oxi...
- Publication number 20110230048
- Publication date Sep 22, 2011
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF POLISHING A SUBSTRATE COMPRISING POLYSILICON AND AT LEAST...
- Publication number 20110230050
- Publication date Sep 22, 2011
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Polishing composition and method of polishing a substrate having en...

Chemical mechanical polishing composition containing composite sili...

Neutral to alkaline chemical mechanical polishing compositions and...

Method of enhancing the removal rate of polysilicon

Chemical mechanical polishing composition containing composite sili...

Method of selective chemical mechanical polishing cobalt, zirconium...

Polishing composition and method of polishing a substrate having en...

Chemical mechanical polishing compositions having stabilized abrasi...

Neutral to alkaline chemical mechanical polishing compositions and...

Acid polishing composition and method of polishing a substrate havi...

Polishing composition and method of polishing a substrate having en...

Aqueous silica slurry and amine carboxylic acid compositions select...

Chemical mechanical polishing pad and polishing method

Aqueous low abrasive silica slurry and amine carboxylic acid compos...

Chemical mechanical polishing pad and polishing method

Low-abrasive CMP slurry compositions with tunable selectivity

Aqueous compositions of stabilized aminosilane group containing sil...

Aqueous compositions of low abrasive silica particles

Method of polishing semiconductor substrate

Chemical mechanical polishing method

Method of polishing semiconductor substrate

Chemical mechanical polishing composition and method for polishing...

Low defect chemical mechanical polishing composition

Method for chemical mechanical polishing tungsten

Chemical mechanical polishing composition and method for polishing...

Stabilized, concentratable chemical mechanical polishing compositio...

Slurry composition having tunable dielectric polishing selectivity...

Method of polishing a substrate comprising polysilicon and at least...

Method of polishing a substrate comprising polysilicon, silicon oxi...

Method of polishing a substrate comprising polysilicon and at least...

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR PREVENTING...

METHOD OF ENHANCING THE REMOVAL RATE OF POLYSILICON

POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVING EN...

POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVING EN...

CHEMICAL MECHANICAL POLISHING COMPOSITION CONTAINING COMPOSITE SILI...

CHEMICAL MECHANICAL POLISHING COMPOSITION CONTAINING COMPOSITE SILI...

NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND...

METHOD OF SELECTIVE CHEMICAL MECHANICAL POLISHING COBALT, ZIRCONIUM...

CHEMICAL MECHANICAL POLISHING COMPOSITIONS HAVING STABILIZED ABRASI...

ACID POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVI...

NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND...

POLISHING COMPOSITION AND METHOD OF POLISHING A SUBSTRATE HAVING EN...

AQUEOUS SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS SELECT...

AQUEOUS LOW ABRASIVE SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOS...

CMP POLISHING COMPOSITION COMPRISING POSITIVE AND NEGATIVE SILICA P...

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR POLISHING...

LOW DEFECT CHEMICAL MECHANICAL POLISHING COMPOSITION

Method Of Polishing A Substrate

Method Of Polishing Using Tunable Polishing Formulation

Method for chemical mechanical polishing tungsten

Chemical Mechanical Polishing Composition and Method For Polishing...

Chemical Mechanical Polishing Composition and Method For Polishing...

Stabilized Chemical Mechanical Polishing Composition and Method of...

Stabilized, Concentratable Chemical Mechanical Polishing Compositio...

Slurry Composition Having Tunable Dielectric Polishing Selectivity...

Stabilized Chemical Mechanical Polishing Composition And Method Of...

Method of chemical mechanical polishing a substrate with polishing...

Method of polishing a substrate comprising polysilicon and at least...

Method of polishing a substrate comprising polysilicon, silicon oxi...

METHOD OF POLISHING A SUBSTRATE COMPRISING POLYSILICON AND AT LEAST...