Yih Neng Lin

Person

New Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Fin field-effect transistor devices and methods of forming the same
- Patent number 12,087,639
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming fin field-effect transistors
- Patent number 12,068,199
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 12,027,370
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air spacers around contact plugs and method forming same
- Patent number 12,015,071
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate stacks for semiconductor devices of different conductivity types
- Patent number 12,015,030
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a FinFET device including a step of recessing a su...
- Patent number 11,908,939
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia Tai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contact air gap formation
- Patent number 11,901,408
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kai-Hsuan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming fin field-effect transistors
- Patent number 11,670,552
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor devices and methods of forming the same
- Patent number 11,495,501
- Issue date Nov 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 11,462,408
- Issue date Oct 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air spacers around contact plugs and method forming same
- Patent number 11,355,616
- Issue date Jun 7, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single metal that performs N work function and P work function in a...
- Patent number 11,289,481
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Residue removal in metal gate cutting process
- Patent number 11,145,752
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Ning Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power mode management system, method for providing power mode param...
- Patent number 11,126,247
- Issue date Sep 21, 2021
- Giga-Byte Technology Co., Ltd.
- Ching-Hung Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
V-shape recess profile for embedded source/drain epitaxy
- Patent number 11,121,255
- Issue date Sep 14, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chii-Horng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device with fins of non-uniform width
- Patent number 11,094,825
- Issue date Aug 17, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia Tai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a non-volatile memory cell
- Patent number 11,004,505
- Issue date May 11, 2021
- eMemory Technology Inc.
- Yih-Lang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming fin field-effect transistors
- Patent number 10,991,627
- Issue date Apr 27, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming Fin field-effect transistors
- Patent number 10,957,600
- Issue date Mar 23, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contact air gap formation
- Patent number 10,923,565
- Issue date Feb 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kai-Hsuan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor devices and methods of forming the same
- Patent number 10,916,477
- Issue date Feb 9, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a non-volatile memory cell
- Patent number 10,916,302
- Issue date Feb 9, 2021
- eMemory Technology Inc.
- Yih-Lang Lin
- G11 - INFORMATION STORAGE
Information Patent Grant
V-shape recess profile for embedded source/drain epitaxy
- Patent number 10,763,366
- Issue date Sep 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chii-Horng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 10,665,457
- Issue date May 26, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device
- Patent number 10,658,509
- Issue date May 19, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia Tai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
V-shape recess profile for embedded source/drain epitaxy
- Patent number 10,651,309
- Issue date May 12, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chii-Horng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control voltage searching method for non-volatile memory
- Patent number 10,083,975
- Issue date Sep 25, 2018
- eMemory Technology Inc.
- Yih-Lang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming Fin field-effect transistors
- Patent number 10,083,872
- Issue date Sep 25, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
V-shape recess profile for embedded source/drain epitaxy
- Patent number 10,038,095
- Issue date Jul 31, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chii-Horng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Zener diode having a polysilicon layer for improved reverse surge c...
- Patent number 9,966,429
- Issue date May 8, 2018
- Vishay General Semiconductor LLC
- Shih-Kuan Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FIN FIELD-EFFECT TRANSISTOR DEVICES AND METHODS OF FORMING THE SAME
- Publication number 20240363431
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Fin Structures
- Publication number 20240363422
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240332420
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chieh CHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE W-SHAPED PROFILE FOR STRUCTURES
- Publication number 20240321739
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jih-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR SPACERS AROUND CONTACT PLUGS AND METHOD FORMING SAME
- Publication number 20240297235
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET DEVICE
- Publication number 20240194785
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia Tai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACT AIR GAP FORMATION
- Publication number 20240186372
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kai-Hsuan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARTIFICIAL INTELLIGENCE/MACHINE LEARNING BASED BIOINFORMATICS PLATF...
- Publication number 20240127949
- Publication date Apr 18, 2024
- YIH-SHIONG LIN
Information Patent Application
TUNABLE STRUCTURE PROFILE
- Publication number 20240120388
- Publication date Apr 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Wei Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240096630
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Wei Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20240096806
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHAO-HSUAN CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240072170
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Wei Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20240047581
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- SHAO-HUA HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20230402455
- Publication date Dec 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Yi TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Fin Field-Effect Transistors
- Publication number 20230260843
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Field-Effect Transistor Devices and Methods of Forming the Same
- Publication number 20220384271
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Forming An Integrated Circuit Priority Claim
- Publication number 20220375752
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yen HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Spacers Around Contact Plugs and Method Forming Same
- Publication number 20220310820
- Publication date Sep 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A SINGLE METAL THAT PERFORMS N WORK FUNCTION AND...
- Publication number 20220216205
- Publication date Jul 7, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Device
- Publication number 20210376141
- Publication date Dec 2, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia Tai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Fin Field-Effect Transistors
- Publication number 20210242088
- Publication date Aug 5, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Aligned Contact Air Gap Formation
- Publication number 20210183996
- Publication date Jun 17, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Kai-Hsuan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fin Field-Effect Transistor Devices and Methods of Forming the Same
- Publication number 20210159123
- Publication date May 27, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Spacers Around Contact Plugs and Method Forming Same
- Publication number 20210134973
- Publication date May 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Huang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A NON-VOLATILE MEMORY CELL
- Publication number 20210118496
- Publication date Apr 22, 2021
- EMEMORY TECHNOLOGY INC.
- Yih-Lang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Residue Removal in Metal Gate Cutting Process
- Publication number 20210083072
- Publication date Mar 18, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chieh-Ning Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Device
- Publication number 20200279945
- Publication date Sep 3, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia Tai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
V-Shape Recess Profile for Embedded Source/Drain Epitaxy
- Publication number 20200273993
- Publication date Aug 27, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chii-Horng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER MODE MANAGEMENT SYSTEM, METHOD FOR PROVIDING POWER MODE PARAM...
- Publication number 20200209939
- Publication date Jul 2, 2020
- GIGA-BYTE TECHNOLOGY CO., LTD.
- Ching-Hung Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR OPERATING A NON-VOLATILE MEMORY CELL
- Publication number 20200160925
- Publication date May 21, 2020
- EMEMORY TECHNOLOGY INC.
- Yih-Lang Lin
- G11 - INFORMATION STORAGE

Yih Neng Lin

Person

Patents Grantslast 30 patents

Fin field-effect transistor devices and methods of forming the same

Methods for forming fin field-effect transistors

Method of forming an integrated circuit using a patterned mask layer

Air spacers around contact plugs and method forming same

Gate stacks for semiconductor devices of different conductivity types

Method of making a FinFET device including a step of recessing a su...

Self-aligned contact air gap formation

Methods for forming fin field-effect transistors

Fin field-effect transistor devices and methods of forming the same

Method of forming an integrated circuit using a patterned mask layer

Air spacers around contact plugs and method forming same

Single metal that performs N work function and P work function in a...

Residue removal in metal gate cutting process

Power mode management system, method for providing power mode param...

V-shape recess profile for embedded source/drain epitaxy

FinFET device with fins of non-uniform width

Method for operating a non-volatile memory cell

Methods for forming fin field-effect transistors

Methods for forming Fin field-effect transistors

Self-aligned contact air gap formation

Fin field-effect transistor devices and methods of forming the same

Method for operating a non-volatile memory cell

V-shape recess profile for embedded source/drain epitaxy

Method of forming an integrated circuit using a patterned mask layer

FinFET device

V-shape recess profile for embedded source/drain epitaxy

Control voltage searching method for non-volatile memory

Methods for forming Fin field-effect transistors

V-shape recess profile for embedded source/drain epitaxy

Zener diode having a polysilicon layer for improved reverse surge c...

Patents Applicationslast 30 patents

FIN FIELD-EFFECT TRANSISTOR DEVICES AND METHODS OF FORMING THE SAME

Semiconductor Fin Structures

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

TUNABLE W-SHAPED PROFILE FOR STRUCTURES

AIR SPACERS AROUND CONTACT PLUGS AND METHOD FORMING SAME

FINFET DEVICE

SELF-ALIGNED CONTACT AIR GAP FORMATION

ARTIFICIAL INTELLIGENCE/MACHINE LEARNING BASED BIOINFORMATICS PLATF...

TUNABLE STRUCTURE PROFILE

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME

Methods for Forming Fin Field-Effect Transistors

Fin Field-Effect Transistor Devices and Methods of Forming the Same

Method Of Forming An Integrated Circuit Priority Claim

Air Spacers Around Contact Plugs and Method Forming Same

METHOD OF FORMING A SINGLE METAL THAT PERFORMS N WORK FUNCTION AND...

FinFET Device

Methods for Forming Fin Field-Effect Transistors

Self-Aligned Contact Air Gap Formation

Fin Field-Effect Transistor Devices and Methods of Forming the Same

Air Spacers Around Contact Plugs and Method Forming Same

METHOD FOR OPERATING A NON-VOLATILE MEMORY CELL

Residue Removal in Metal Gate Cutting Process

FinFET Device

V-Shape Recess Profile for Embedded Source/Drain Epitaxy

POWER MODE MANAGEMENT SYSTEM, METHOD FOR PROVIDING POWER MODE PARAM...

METHOD FOR OPERATING A NON-VOLATILE MEMORY CELL