Ying Wu

Person

Dublin, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Etching isolation features and dense features within a substrate
- Patent number 12,119,232
- Issue date Oct 15, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level parameter and frequency pulsing with a low angular spread
- Patent number 12,068,131
- Issue date Aug 20, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization of RF generators
- Patent number 12,046,450
- Issue date Jul 23, 2024
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 11,915,912
- Issue date Feb 27, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for reverse pulsing
- Patent number 11,798,785
- Issue date Oct 24, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct frequency tuning for matchless plasma source in substrate pr...
- Patent number 11,728,137
- Issue date Aug 15, 2023
- Lam Research Corporation
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
- Patent number 11,728,136
- Issue date Aug 15, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 11,569,067
- Issue date Jan 31, 2023
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level parameter and frequency pulsing with a low angular spread
- Patent number 11,462,390
- Issue date Oct 4, 2022
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for a matchless plasma source
- Patent number 11,437,219
- Issue date Sep 6, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching isolation features and dense features within a substrate
- Patent number 11,398,387
- Issue date Jul 26, 2022
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
- Patent number 11,342,159
- Issue date May 24, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 11,049,693
- Issue date Jun 29, 2021
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 11,049,726
- Issue date Jun 29, 2021
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monoenergetic ion generation for controlled etch
- Patent number 11,011,351
- Issue date May 18, 2021
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 10,943,789
- Issue date Mar 9, 2021
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Auxiliary circuit in RF matching network for frequency tuning assis...
- Patent number 10,879,044
- Issue date Dec 29, 2020
- Lam Research Corporation
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level pulsing of DC and RF signals
- Patent number 10,755,896
- Issue date Aug 25, 2020
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for applying frequency and match tuning in a no...
- Patent number 10,679,825
- Issue date Jun 9, 2020
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for a matchless plasma source
- Patent number 10,672,590
- Issue date Jun 2, 2020
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level pulsing of DC and RF signals
- Patent number 10,580,618
- Issue date Mar 3, 2020
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level parameter and frequency pulsing with a low angular spread
- Patent number 10,573,494
- Issue date Feb 25, 2020
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Powered grid for plasma chamber
- Patent number 10,431,434
- Issue date Oct 1, 2019
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 10,395,894
- Issue date Aug 27, 2019
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency and match tuning in one state and frequency tuning in the...
- Patent number 10,340,915
- Issue date Jul 2, 2019
- Lam Research Corporation
- Ying Wu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Multi-level pulsing of DC and RF signals
- Patent number 10,304,660
- Issue date May 28, 2019
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Near-substrate supplemental plasma density generation with low bias...
- Patent number 10,242,845
- Issue date Mar 26, 2019
- Lam Research Corporation
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-level parameter and frequency pulsing with a low angular spread
- Patent number 10,224,183
- Issue date Mar 5, 2019
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for plasma etching using bi-modal process gas c...
- Patent number 10,177,003
- Issue date Jan 8, 2019
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency and match tuning in one state and frequency tuning in the...
- Patent number 10,009,028
- Issue date Jun 26, 2018
- Lam Research Corporation
- Ying Wu
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
SYNCHRONIZATION OF RF GENERATORS
- Publication number 20240331976
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...
- Publication number 20240162005
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REVERSE PULSING
- Publication number 20240030000
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20230360883
- Publication date Nov 9, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Analyzing and Intelligently Collecting Sens...
- Publication number 20230282465
- Publication date Sep 7, 2023
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF RF GENERATORS
- Publication number 20230274913
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF RF PULSING SCHEMES AND OF SENSOR DATA COLLECTION
- Publication number 20230230805
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DATA COMPRESSION IN A PLASMA TOOL
- Publication number 20230207267
- Publication date Jun 29, 2023
- LAM RESEARCH CORPORATION
- John Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Controlling Radiofrequency Pulse-Initiation...
- Publication number 20230154728
- Publication date May 18, 2023
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...
- Publication number 20230124201
- Publication date Apr 20, 2023
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LEVEL PARAMETER AND FREQUENCY PULSING WITH A LOW ANGULAR SPREAD
- Publication number 20230005718
- Publication date Jan 5, 2023
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING ISOLATION FEATURES AND DENSE FEATURES WITHIN A SUBSTRATE
- Publication number 20220319856
- Publication date Oct 6, 2022
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20220254608
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS
- Publication number 20220216038
- Publication date Jul 7, 2022
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Automated Frequency Tuning of Radiofrequency...
- Publication number 20220189738
- Publication date Jun 16, 2022
- LAM RESEARCH CORPORATION
- Mathew Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING ISOLATION FEATURES AND DENSE FEATURES WITHIN A SUBSTRATE
- Publication number 20210358757
- Publication date Nov 18, 2021
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...
- Publication number 20210313149
- Publication date Oct 7, 2021
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT FREQUENCY TUNING FOR MATCHLESS PLASMA SOURCE IN SUBSTRATE PR...
- Publication number 20210210314
- Publication date Jul 8, 2021
- LAM RESEARCH CORPORATION
- Yuhou WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Advanced Ion Control for Etching Processes
- Publication number 20210193474
- Publication date Jun 24, 2021
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20200335305
- Publication date Oct 22, 2020
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Frequency Tuning for a Matchless Plasma Source
- Publication number 20200286713
- Publication date Sep 10, 2020
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LEVEL PARAMETER AND FREQUENCY PULSING WITH A LOW ANGULAR SPREAD
- Publication number 20200176222
- Publication date Jun 4, 2020
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LEVEL PULSING OF DC AND RF SIGNALS
- Publication number 20200168438
- Publication date May 28, 2020
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOENERGETIC ION GENERATION FOR CONTROLLED ETCH
- Publication number 20200020510
- Publication date Jan 16, 2020
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...
- Publication number 20190362942
- Publication date Nov 28, 2019
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LEVEL PARAMETER AND FREQUENCY PULSING WITH A LOW ANGULAR SPREAD
- Publication number 20190295820
- Publication date Sep 26, 2019
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LEVEL PULSING OF DC AND RF SIGNALS
- Publication number 20190295821
- Publication date Sep 26, 2019
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Frequency Tuning for a Matchless Plasma Source
- Publication number 20190287764
- Publication date Sep 19, 2019
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Applying Frequency and Match Tuning in a No...
- Publication number 20190148114
- Publication date May 16, 2019
- LAM RESEARCH CORPORATION
- Ying Wu
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...
- Publication number 20190066979
- Publication date Feb 28, 2019
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Etching isolation features and dense features within a substrate

Multi-level parameter and frequency pulsing with a low angular spread

Synchronization of RF generators

Systems and methods for achieving peak ion energy enhancement with...

Systems for reverse pulsing

Direct frequency tuning for matchless plasma source in substrate pr...

RF pulsing within pulsing for semiconductor RF plasma processing

Systems and methods for achieving peak ion energy enhancement with...

Multi-level parameter and frequency pulsing with a low angular spread

Frequency tuning for a matchless plasma source

Etching isolation features and dense features within a substrate

RF pulsing within pulsing for semiconductor RF plasma processing

Systems and methods for achieving peak ion energy enhancement with...

Methods and systems for advanced ion control for etching processes

Monoenergetic ion generation for controlled etch

Methods and systems for advanced ion control for etching processes

Auxiliary circuit in RF matching network for frequency tuning assis...

Multi-level pulsing of DC and RF signals

Systems and methods for applying frequency and match tuning in a no...

Frequency tuning for a matchless plasma source

Multi-level pulsing of DC and RF signals

Multi-level parameter and frequency pulsing with a low angular spread

Powered grid for plasma chamber

Systems and methods for achieving peak ion energy enhancement with...

Frequency and match tuning in one state and frequency tuning in the...

Multi-level pulsing of DC and RF signals

Near-substrate supplemental plasma density generation with low bias...

Multi-level parameter and frequency pulsing with a low angular spread

Methods and systems for plasma etching using bi-modal process gas c...

Frequency and match tuning in one state and frequency tuning in the...

Patents Applicationslast 30 patents

SYNCHRONIZATION OF RF GENERATORS

SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...

SYSTEMS AND METHODS FOR REVERSE PULSING

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

Systems and Methods for Analyzing and Intelligently Collecting Sens...

SYNCHRONIZATION OF RF GENERATORS

SYNCHRONIZATION OF RF PULSING SCHEMES AND OF SENSOR DATA COLLECTION

SENSOR DATA COMPRESSION IN A PLASMA TOOL

Methods and Systems for Controlling Radiofrequency Pulse-Initiation...

SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...

MULTI-LEVEL PARAMETER AND FREQUENCY PULSING WITH A LOW ANGULAR SPREAD

ETCHING ISOLATION FEATURES AND DENSE FEATURES WITHIN A SUBSTRATE

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS

Method and System for Automated Frequency Tuning of Radiofrequency...

ETCHING ISOLATION FEATURES AND DENSE FEATURES WITHIN A SUBSTRATE

SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...

DIRECT FREQUENCY TUNING FOR MATCHLESS PLASMA SOURCE IN SUBSTRATE PR...

Methods and Systems for Advanced Ion Control for Etching Processes

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

Frequency Tuning for a Matchless Plasma Source

MULTI-LEVEL PARAMETER AND FREQUENCY PULSING WITH A LOW ANGULAR SPREAD

MULTI-LEVEL PULSING OF DC AND RF SIGNALS

MONOENERGETIC ION GENERATION FOR CONTROLLED ETCH

SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...

MULTI-LEVEL PARAMETER AND FREQUENCY PULSING WITH A LOW ANGULAR SPREAD

MULTI-LEVEL PULSING OF DC AND RF SIGNALS

Frequency Tuning for a Matchless Plasma Source

Systems and Methods for Applying Frequency and Match Tuning in a No...

SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...