Yohei Uchida

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and mounting table thereof
- Patent number 12,293,937
- Issue date May 6, 2025
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, focus ring, support base, plasma processing ap...
- Patent number 12,046,457
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,984,300
- Issue date May 14, 2024
- Tokyo Electron Limited
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece placement apparatus and processing apparatus
- Patent number 11,942,357
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,825,589
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring
- Patent number D992614
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- D16 - Photography and optical equipment
Information Patent Grant
Focus ring
- Patent number D992615
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate support, plasma processing apparatus, and focus ring
- Patent number 11,600,471
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and mounting table thereof
- Patent number 11,501,995
- Issue date Nov 15, 2022
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,495,445
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece placement apparatus and processing apparatus
- Patent number 11,410,871
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,032,899
- Issue date Jun 8, 2021
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power feed structure and plasma processing apparatus
- Patent number 10,886,108
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,847,348
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply device and substrate processing apparatus
- Patent number 10,199,241
- Issue date Feb 5, 2019
- Tokyo Electron Limited
- Yohei Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply device and substrate processing apparatus
- Patent number 9,887,108
- Issue date Feb 6, 2018
- Tokyo Electron Limited
- Yohei Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mounting table structure and method of holding focus ring
- Patent number 9,209,060
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid control apparatus
- Patent number 9,169,558
- Issue date Oct 27, 2015
- Tokyo Electron Limited
- Jun Hirose
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas mixture supplying method and apparatus
- Patent number 8,770,214
- Issue date Jul 8, 2014
- Tokyo Electron Limited
- Yohei Uchida
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20250233008
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...
- Publication number 20240347322
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20230020793
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE PLACEMENT APPARATUS AND PROCESSING APPARATUS
- Publication number 20220336257
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...
- Publication number 20210366694
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING BASE, SUBSTRATE PROCESSING DEVICE, EDGE RING, AND EDGE RIN...
- Publication number 20210327688
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210267042
- Publication date Aug 26, 2021
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200373130
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20200219753
- Publication date Jul 9, 2020
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER FEED STRUCTURE AND PLASMA PROCESSING APPARATUS
- Publication number 20200194240
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200176226
- Publication date Jun 4, 2020
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND FOCUS RING
- Publication number 20200152428
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200107429
- Publication date Apr 2, 2020
- TOKYO ELECTRON LIMITED
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190371575
- Publication date Dec 5, 2019
- TOKYO ELECTRON LIMITED
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORKPIECE PLACEMENT APPARATUS AND PROCESSING APPARATUS
- Publication number 20190279894
- Publication date Sep 12, 2019
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180190519
- Publication date Jul 5, 2018
- TOKYO ELECTRON LIMITED
- Yohei Uchida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUS RING AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180182635
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY DEVICE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20150107772
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE STRUCTURE AND METHOD OF HOLDING FOCUS RING
- Publication number 20140146434
- Publication date May 29, 2014
- TOKYO ELECTRON LIMITED
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID CONTROL APPARATUS
- Publication number 20120031500
- Publication date Feb 9, 2012
- Jun Hirose
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS MIXTURE SUPPLYING METHOD AND APPARATUS
- Publication number 20100154908
- Publication date Jun 24, 2010
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- G05 - CONTROLLING REGULATING

Yohei Uchida

Person

Patents Grantslast 30 patents

Plasma processing apparatus and mounting table thereof

Electrostatic chuck, focus ring, support base, plasma processing ap...

Plasma processing apparatus

Workpiece placement apparatus and processing apparatus

Plasma processing apparatus and plasma processing method

Focus ring

Focus ring

Substrate support, plasma processing apparatus, and focus ring

Plasma processing apparatus and mounting table thereof

Plasma processing apparatus and plasma processing method

Workpiece placement apparatus and processing apparatus

Plasma processing apparatus and plasma processing method

Power feed structure and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Gas supply device and substrate processing apparatus

Gas supply device and substrate processing apparatus

Mounting table structure and method of holding focus ring

Fluid control apparatus

Gas mixture supplying method and apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

WORKPIECE PLACEMENT APPARATUS AND PROCESSING APPARATUS

ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...

MOUNTING BASE, SUBSTRATE PROCESSING DEVICE, EDGE RING, AND EDGE RIN...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

POWER FEED STRUCTURE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND FOCUS RING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

WORKPIECE PLACEMENT APPARATUS AND PROCESSING APPARATUS

GAS SUPPLY DEVICE AND SUBSTRATE PROCESSING APPARATUS

FOCUS RING AND SUBSTRATE PROCESSING APPARATUS

GAS SUPPLY DEVICE AND SUBSTRATE PROCESSING APPARATUS

MOUNTING TABLE STRUCTURE AND METHOD OF HOLDING FOCUS RING

FLUID CONTROL APPARATUS

GAS MIXTURE SUPPLYING METHOD AND APPARATUS