Yongjing LIN

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
P-type dipole for P-FET
- Patent number 11,996,455
- Issue date May 28, 2024
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dipole flow for transistor
- Patent number 11,888,045
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-type dipole for p-FET
- Patent number 11,658,218
- Issue date May 23, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner for V-NAND word line stack
- Patent number 11,476,267
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-type dipole for p-FET
- Patent number 11,289,579
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
On stack overlay improvement for 3D NAND
- Patent number 11,276,569
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dipole flow for transistor
- Patent number 11,245,022
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-doped nitride films for improved high-k reliability
- Patent number 11,171,047
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for gapfill in substrates
- Patent number 11,101,128
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for n-type metal oxide semiconductor (NMOS) m...
- Patent number 11,075,276
- Issue date Jul 27, 2021
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF REDUCING METAL GATE RESISTANCE FOR NEXT GENERATION NMOS D...
- Publication number 20240204061
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL TREATMENT FOR METAL GATE STACK
- Publication number 20240087899
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Zhihui Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PREVENTING METAL CONTAMINATION BY CERAMIC HEATER
- Publication number 20230313378
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Yongjing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF GROWING METAL-CONTAINING FILMS
- Publication number 20230295803
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Haoming Yan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
P-TYPE DIPOLE FOR P-FET
- Publication number 20230253466
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Distribution Apparatuses
- Publication number 20230193463
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Shashidhara Patel H B
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION
- Publication number 20230113514
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Shih Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER FOR V-NAND WORD LINE STACK
- Publication number 20230005945
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Jacqueline S. Wrench
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATER PEDESTAL WITH IMPROVED UNIFORMITY
- Publication number 20220367236
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
P-Type Dipole For P-FET
- Publication number 20220165854
- Publication date May 26, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DIPOLE FLOW FOR TRANSISTOR
- Publication number 20220115516
- Publication date Apr 14, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR GAS PHASE PARTICLE REDUCTION
- Publication number 20220064785
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Muhannad MUSTAFA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR GAPFILL IN SUBSTRATES
- Publication number 20210287900
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Yixiong YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PMOS High-K Metal Gates
- Publication number 20210134972
- Publication date May 6, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
P-Type Dipole For P-FET
- Publication number 20210098581
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorine-Doped Nitride Films for Improved High-K Reliability
- Publication number 20200411373
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DIPOLE FLOW FOR TRANSISTOR
- Publication number 20200373404
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER FOR V-NAND WORD LINE STACK
- Publication number 20200373318
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR N-TYPE METAL OXIDE SEMICONDUCTOR (NMOS) M...
- Publication number 20200111885
- Publication date Apr 9, 2020
- Applied Materials, Inc.
- YONGJING LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Depositing Metal Carbide Films
- Publication number 20200071825
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ON STACK OVERLAY IMPROVEMENT FOR 3D NAND
- Publication number 20200043723
- Publication date Feb 6, 2020
- Applied Materials, Inc.
- Yongjing LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CLAMPING AND DECLAMPING SUBSTRATES USING E...
- Publication number 20170162417
- Publication date Jun 8, 2017
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yongjing LIN

Person

Patents Grantslast 30 patents

P-type dipole for P-FET

Integrated dipole flow for transistor

P-type dipole for p-FET

Liner for V-NAND word line stack

P-type dipole for p-FET

On stack overlay improvement for 3D NAND

Integrated dipole flow for transistor

Fluorine-doped nitride films for improved high-k reliability

Methods for gapfill in substrates

Methods and apparatus for n-type metal oxide semiconductor (NMOS) m...

Patents Applicationslast 30 patents

METHOD OF REDUCING METAL GATE RESISTANCE FOR NEXT GENERATION NMOS D...

RADICAL TREATMENT FOR METAL GATE STACK

METHODS OF PREVENTING METAL CONTAMINATION BY CERAMIC HEATER

METHODS OF GROWING METAL-CONTAINING FILMS

P-TYPE DIPOLE FOR P-FET

Gas Distribution Apparatuses

METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION

LINER FOR V-NAND WORD LINE STACK

HEATER PEDESTAL WITH IMPROVED UNIFORMITY

P-Type Dipole For P-FET

INTEGRATED DIPOLE FLOW FOR TRANSISTOR

APPARATUS AND METHODS FOR GAS PHASE PARTICLE REDUCTION

METHODS FOR GAPFILL IN SUBSTRATES

PMOS High-K Metal Gates

P-Type Dipole For P-FET

Fluorine-Doped Nitride Films for Improved High-K Reliability

INTEGRATED DIPOLE FLOW FOR TRANSISTOR

LINER FOR V-NAND WORD LINE STACK

METHODS AND APPARATUS FOR N-TYPE METAL OXIDE SEMICONDUCTOR (NMOS) M...

Methods Of Depositing Metal Carbide Films

ON STACK OVERLAY IMPROVEMENT FOR 3D NAND

METHOD AND APPARATUS FOR CLAMPING AND DECLAMPING SUBSTRATES USING E...