Yoshifumi AMANO

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,176,224
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Kazuhiro Aiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,142,496
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,133,297
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yoshifumi Amano
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing apparatus
- Patent number 11,791,171
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Yoshifumi Amano
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Processing liquid ejection nozzle, nozzle arm, substrate processing...
- Patent number 11,776,824
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,437,252
- Issue date Sep 6, 2022
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component of a liquid discharge nozzle for semiconductor substrate...
- Patent number D934991
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Yoshifumi Amano
- D23 - Environmental heating and cooling
Information Patent Grant
Liquid discharge nozzle for semiconductor substrate processing appa...
- Patent number D930796
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Yoshifumi Amano
- D23 - Environmental heating and cooling
Information Patent Grant
Liquid discharge nozzle for semiconductor substrate processing appa...
- Patent number D929534
- Issue date Aug 31, 2021
- Tokyo Electron Limited
- Yoshifumi Amano
- D23 - Environmental heating and cooling
Information Patent Grant
Substrate processing system
- Patent number 11,069,546
- Issue date Jul 20, 2021
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system
- Patent number 11,018,035
- Issue date May 25, 2021
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, control method of substrate process...
- Patent number 11,011,436
- Issue date May 18, 2021
- Tokyo Electron Limited
- Yoshifumi Amano
- G05 - CONTROLLING REGULATING
Information Patent Grant
Measurement processing device, substrate processing system, measure...
- Patent number 10,713,772
- Issue date Jul 14, 2020
- Tokyo Electron Limited
- Yoshifumi Amano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,707,102
- Issue date Jul 7, 2020
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus
- Patent number 10,643,865
- Issue date May 5, 2020
- Tokyo Electron Limited
- Yoshifumi Amano
- A46 - BRUSHWARE
Information Patent Grant
Substrate processing apparatus and processing method of substrate p...
- Patent number 10,217,628
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Yoshifumi Amano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Management method of substrate processing apparatus and substrate p...
- Patent number 10,128,137
- Issue date Nov 13, 2018
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 10,046,372
- Issue date Aug 14, 2018
- Tokyo Electron Limited
- Kazuya Goda
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 9,895,711
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Jian Zhang
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,859,136
- Issue date Jan 2, 2018
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,818,626
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,793,142
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, method for controlling substrate proce...
- Patent number 9,782,807
- Issue date Oct 10, 2017
- Tokyo Electron Limited
- Yoshifumi Amano
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 9,623,434
- Issue date Apr 18, 2017
- Tokyo Electron Limited
- Yoshifumi Amano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 9,564,347
- Issue date Feb 7, 2017
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 9,536,761
- Issue date Jan 3, 2017
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and sto...
- Patent number 9,308,559
- Issue date Apr 12, 2016
- Tokyo Electron Limited
- Yoshifumi Amano
- B08 - CLEANING
Information Patent Grant
Substrate processing and positioning apparatus, substrate processin...
- Patent number 9,257,313
- Issue date Feb 9, 2016
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate positioning apparatus, substrate processing apparatus, su...
- Patent number 9,008,817
- Issue date Apr 14, 2015
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method and storage m...
- Patent number 8,887,741
- Issue date Nov 18, 2014
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240332041
- Publication date Oct 3, 2024
- Tokyo Electron Limited
- Kazuhiro AIURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240238848
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Takafumi KINOSHITA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20210257236
- Publication date Aug 19, 2021
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING LIQUID EJECTION NOZZLE, NOZZLE ARM, SUBSTRATE PROCESSING...
- Publication number 20210020463
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Yoshifumi AMANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200388511
- Publication date Dec 10, 2020
- TOKYO ELECTRON LIMITED
- Yoshifumi AMANO
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200365422
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200337118
- Publication date Oct 22, 2020
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200328095
- Publication date Oct 15, 2020
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20190043742
- Publication date Feb 7, 2019
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180108544
- Publication date Apr 19, 2018
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD OF SUBSTRATE P...
- Publication number 20170287703
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD OF SUBSTRATE PROCESS...
- Publication number 20170287704
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANAGEMENT METHOD OF SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE P...
- Publication number 20170287750
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS
- Publication number 20170278728
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- A46 - BRUSHWARE
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20170028450
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Kazuya Goda
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20160300734
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20160221046
- Publication date Aug 4, 2016
- TOKYO ELECTRON LIMITED
- Jian Zhang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MEASUREMENT PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, MEASURE...
- Publication number 20160148366
- Publication date May 26, 2016
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20160064256
- Publication date Mar 3, 2016
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, METHOD FOR CONTROLLING SUBSTRATE PROCE...
- Publication number 20150013722
- Publication date Jan 15, 2015
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140374022
- Publication date Dec 25, 2014
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140251539
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Tsuyoshi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140116478
- Publication date May 1, 2014
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140116480
- Publication date May 1, 2014
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20140053882
- Publication date Feb 27, 2014
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20130171831
- Publication date Jul 4, 2013
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...
- Publication number 20130152976
- Publication date Jun 20, 2013
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...
- Publication number 20130156948
- Publication date Jun 20, 2013
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Liquid Processing Apparatus, Liquid Processing Method and Storage M...
- Publication number 20120064256
- Publication date Mar 15, 2012
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIONING APPARATUS, A SUBSTRATE PROCESSING APPARATUS AND METHOD...
- Publication number 20110308067
- Publication date Dec 22, 2011
- TOKYO ELECTRON LIMITED
- Yoshifumi AMANO
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Yoshifumi AMANO

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus

Substrate processing apparatus

Processing liquid ejection nozzle, nozzle arm, substrate processing...

Substrate processing apparatus and substrate processing method

Component of a liquid discharge nozzle for semiconductor substrate...

Liquid discharge nozzle for semiconductor substrate processing appa...

Liquid discharge nozzle for semiconductor substrate processing appa...

Substrate processing system

Substrate processing system

Substrate processing apparatus, control method of substrate process...

Measurement processing device, substrate processing system, measure...

Substrate processing apparatus and substrate processing method

Substrate cleaning apparatus

Substrate processing apparatus and processing method of substrate p...

Management method of substrate processing apparatus and substrate p...

Liquid processing apparatus

Substrate liquid processing apparatus, substrate liquid processing...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing system, method for controlling substrate proce...

Substrate processing apparatus

Liquid processing apparatus and liquid processing method

Substrate liquid processing apparatus

Substrate processing apparatus, substrate processing method and sto...

Substrate processing and positioning apparatus, substrate processin...

Substrate positioning apparatus, substrate processing apparatus, su...

Liquid processing apparatus, liquid processing method and storage m...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM

PROCESSING LIQUID EJECTION NOZZLE, NOZZLE ARM, SUBSTRATE PROCESSING...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD OF SUBSTRATE P...

SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD OF SUBSTRATE PROCESS...

MANAGEMENT METHOD OF SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE P...

SUBSTRATE CLEANING APPARATUS

LIQUID PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

MEASUREMENT PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, MEASURE...

SUBSTRATE LIQUID PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM, METHOD FOR CONTROLLING SUBSTRATE PROCE...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...

Liquid Processing Apparatus, Liquid Processing Method and Storage M...

POSITIONING APPARATUS, A SUBSTRATE PROCESSING APPARATUS AND METHOD...