Yoshifumi OGAWA

Person

Hikari, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Detecting method and detecting device of gas components and process...
- Patent number 11,835,465
- Issue date Dec 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Yoshifumi Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion shield plate base for semiconductor manufacturing apparatus
- Patent number D924824
- Issue date Jul 13, 2021
- HITACHI HIGH-TECH CORPORATION
- Yutaka Kouzuma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Vacuum processing apparatus
- Patent number 10,121,686
- Issue date Nov 6, 2018
- Hitachi High-Technologies Corporation
- Yoshifumi Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and operating method of the same
- Patent number 9,245,780
- Issue date Jan 26, 2016
- Hitachi High-Technologies Corporation
- Takahiro Shimomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,899,789
- Issue date May 31, 2005
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,676,805
- Issue date Jan 13, 2004
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,645,871
- Issue date Nov 11, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,170
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,171
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,544,379
- Issue date Apr 8, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,524,428
- Issue date Feb 25, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,336,991
- Issue date Jan 8, 2002
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,221,201
- Issue date Apr 24, 2001
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding system including an electrostatic chuck
- Patent number 6,048,434
- Issue date Apr 11, 2000
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,985,035
- Issue date Nov 16, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,961,774
- Issue date Oct 5, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,906,684
- Issue date May 25, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,792,304
- Issue date Aug 11, 1998
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing system
- Patent number 5,685,684
- Issue date Nov 11, 1997
- Hitachi, Ltd.
- Shigekazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator with mode restricting means
- Patent number 5,646,489
- Issue date Jul 8, 1997
- Hitachi, Ltd.
- Yutaka Kakehi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for generating plasma, and semiconductor proc...
- Patent number 5,433,789
- Issue date Jul 18, 1995
- Hitachi, Ltd.
- Yutaka Kakehi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treating method and apparatus therefor
- Patent number 4,664,767
- Issue date May 12, 1987
- Hitachi, Ltd.
- Katsuyoshi Kudo
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method and apparatus for monitoring etching
- Patent number 4,609,426
- Issue date Sep 2, 1986
- Hitachi, Ltd.
- Yoshifumi Ogawa
- G01 - MEASURING TESTING
Information Patent Grant
Microwave plasma etching apparatus
- Patent number 4,559,100
- Issue date Dec 17, 1985
- Hitachi, Ltd.
- Ken Ninomiya
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GAS SUPPLY CONTROL DEVICE
- Publication number 20240111313
- Publication date Apr 4, 2024
- Hitachi High-Tech Corporation
- Yoshifumi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY APPARATUS, VACUUM PROCESSING APPARATUS, AND GAS SUPPLY M...
- Publication number 20240055278
- Publication date Feb 15, 2024
- Hitachi High-Tech Corporation
- Yoshifumi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTING METHOD AND DETECTING DEVICE OF GAS COMPONENTS AND PROCESS...
- Publication number 20210231571
- Publication date Jul 29, 2021
- Hitachi High-Technologies Corporation
- Yoshifumi OGAWA
- G01 - MEASURING TESTING
Information Patent Application
FACILITY DEVICE
- Publication number 20190085544
- Publication date Mar 21, 2019
- Lixil Corporation
- Hiroto KUTSUZAWA
- E03 - WATER SUPPLY SEWERAGE
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20160379857
- Publication date Dec 29, 2016
- Hitachi High-Technologies Corporation
- Yoshifumi OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS AND OPERATING METHOD OF THE SAME
- Publication number 20130142595
- Publication date Jun 6, 2013
- Hitachi High-Technologies Corporation
- Takahiro SHIMOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20030192647
- Publication date Oct 16, 2003
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020108574
- Publication date Aug 15, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020104618
- Publication date Aug 8, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020096116
- Publication date Jul 25, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020046706
- Publication date Apr 25, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20010025608
- Publication date Oct 4, 2001
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20010009178
- Publication date Jul 26, 2001
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS

Yoshifumi OGAWA

Person

Patents Grantslast 30 patents

Detecting method and detecting device of gas components and process...

Ion shield plate base for semiconductor manufacturing apparatus

Vacuum processing apparatus

Vacuum processing apparatus and operating method of the same

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Substrate holding system including an electrostatic chuck

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Vacuum processing system

Plasma generator with mode restricting means

Methods and apparatus for generating plasma, and semiconductor proc...

Plasma treating method and apparatus therefor

Method and apparatus for monitoring etching

Microwave plasma etching apparatus

Patents Applicationslast 30 patents

GAS SUPPLY CONTROL DEVICE

GAS SUPPLY APPARATUS, VACUUM PROCESSING APPARATUS, AND GAS SUPPLY M...

DETECTING METHOD AND DETECTING DEVICE OF GAS COMPONENTS AND PROCESS...

FACILITY DEVICE

VACUUM PROCESSING APPARATUS

VACUUM PROCESSING APPARATUS AND OPERATING METHOD OF THE SAME

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system