Yoshihiro Tezuka

Person

Saitama-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Measurement tool and method for lithography masks
- Patent number 12,032,298
- Issue date Jul 9, 2024
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
Measurement tool and methods for EUV lithography masks
- Patent number 11,815,810
- Issue date Nov 14, 2023
- Intel Corporation
- Yoshihiro Tezuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detecting and characterizing mask blank defects using angular distr...
- Patent number 7,679,731
- Issue date Mar 16, 2010
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
Method and system of defect inspection for mask blank and method of...
- Patent number 7,630,068
- Issue date Dec 8, 2009
- Renesas Technology Corporation
- Toshihiko Tanaka
- G01 - MEASURING TESTING
Information Patent Grant
Mask blanks inspection tool
- Patent number 7,220,969
- Issue date May 22, 2007
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
Mask blanks inspection method and mask blank inspection tool
- Patent number 7,005,649
- Issue date Feb 28, 2006
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for photomask fabrication
- Patent number 6,979,408
- Issue date Dec 27, 2005
- Intel Corporation
- Yoshihiro Tezuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modulation of peripheral critical dimension on photomask with diffe...
- Patent number 6,210,843
- Issue date Apr 3, 2001
- Intel Corporation
- Fred T. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MEASUREMENT TOOL AND METHOD FOR LITHOGRAPHY MASKS
- Publication number 20220011679
- Publication date Jan 13, 2022
- Intel Corporation
- Yoshihiro TEZUKA
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT TOOL AND METHODS FOR EUV LITHOGRAPHY MASKS
- Publication number 20220004106
- Publication date Jan 6, 2022
- Intel Corporation
- Yoshihiro Tezuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system of defect inspection for mask blank and method of...
- Publication number 20070188743
- Publication date Aug 16, 2007
- Toshihiko Tanaka
- G01 - MEASURING TESTING
Information Patent Application
Detecting and characterizing mask blank defects using angular distr...
- Publication number 20070158636
- Publication date Jul 12, 2007
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Application
Mask blanks inspection tool
- Publication number 20060138338
- Publication date Jun 29, 2006
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Application
MASK BLANKS INSPECTION METHOD AND MASK BLANK INSPECTION TOOL
- Publication number 20060054836
- Publication date Mar 16, 2006
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for photomask fabrication
- Publication number 20060027325
- Publication date Feb 9, 2006
- Yoshihiro Tezuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for photomask fabrication
- Publication number 20040244912
- Publication date Dec 9, 2004
- Yoshihiro Tezuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yoshihiro Tezuka

Person

Patents Grantslast 30 patents

Measurement tool and method for lithography masks

Measurement tool and methods for EUV lithography masks

Detecting and characterizing mask blank defects using angular distr...

Method and system of defect inspection for mask blank and method of...

Mask blanks inspection tool

Mask blanks inspection method and mask blank inspection tool

Method and apparatus for photomask fabrication

Modulation of peripheral critical dimension on photomask with diffe...

Patents Applicationslast 30 patents

MEASUREMENT TOOL AND METHOD FOR LITHOGRAPHY MASKS

MEASUREMENT TOOL AND METHODS FOR EUV LITHOGRAPHY MASKS

Method and system of defect inspection for mask blank and method of...

Detecting and characterizing mask blank defects using angular distr...

Mask blanks inspection tool

MASK BLANKS INSPECTION METHOD AND MASK BLANK INSPECTION TOOL

Method and apparatus for photomask fabrication

Method and apparatus for photomask fabrication