Yoshika Sakai

Person

Atsugi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition
- Patent number 6,159,652
- Issue date Dec 12, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,955,240
- Issue date Sep 21, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 5,948,589
- Issue date Sep 7, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization positive-working photoresist composition
- Patent number 5,945,248
- Issue date Aug 31, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 5,908,730
- Issue date Jun 1, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 5,874,195
- Issue date Feb 23, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization positive-working photoresist composition
- Patent number 5,856,058
- Issue date Jan 5, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the production of polyhydroxstyrene
- Patent number 5,854,357
- Issue date Dec 29, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition and multilayered resist ma...
- Patent number 5,817,444
- Issue date Oct 6, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 5,770,343
- Issue date Jun 23, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition comprising a mixture of two polyhydroxy...
- Patent number 5,736,296
- Issue date Apr 7, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yoshika Sakai

Person

Patents Grantslast 30 patents

Positive resist composition

Positive resist composition

Positive-working photoresist composition

Chemical-sensitization positive-working photoresist composition

Chemical-sensitization photoresist composition

Positive-working photoresist composition

Chemical-sensitization positive-working photoresist composition

Process for the production of polyhydroxstyrene

Positive-working photoresist composition and multilayered resist ma...

Positive-working photoresist composition

Positive resist composition comprising a mixture of two polyhydroxy...