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Yoshiki IGARASHI

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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    ETCHING METHOD AND ETCHING APPARATUS
    • Publication number 20230395400
    • Publication date Dec 7, 2023
    • TOKYO ELECTRON LIMITED
    • Yoshiki IGARASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD AND ETCHING APPARATUS
    • Publication number 20210358772
    • Publication date Nov 18, 2021
    • TOKYO ELECTRON LIMITED
    • Yoshiki IGARASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20180226264
    • Publication date Aug 9, 2018
    • TOKYO ELECTRON LIMITED
    • Wataru TAKAYAMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20170162399
    • Publication date Jun 8, 2017
    • TOKYO ELECTRON LIMITED
    • Wataru TAKAYAMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20160314986
    • Publication date Oct 27, 2016
    • TOKYO ELECTRON LIMITED
    • Sho TOMINAGA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING INSULATION FILM
    • Publication number 20150371830
    • Publication date Dec 24, 2015
    • TOKYO ELECTRON LIMITED
    • Akira TAKAHASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING ETCHING TARGET LAYER
    • Publication number 20150332932
    • Publication date Nov 19, 2015
    • TOKYO ELECTRON LIMITED
    • Shin HIROTSU
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20130213572
    • Publication date Aug 22, 2013
    • TOKYO ELECTRON LIMITED
    • Masanobu HONDA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF FORMING MASK PATTERN AND METHOD OF MANUFACTURING SEMICOND...
    • Publication number 20130023120
    • Publication date Jan 24, 2013
    • TOKYO ELECTRON LIMITED
    • Hidetami Yaegashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD AND STORAGE MEDIUM
    • Publication number 20120244709
    • Publication date Sep 27, 2012
    • TOKYO ELECTRON LIMITED
    • Yoshiki IGARASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20080233757
    • Publication date Sep 25, 2008
    • TOKYO ELECTRON LIMITED
    • Masanobu HONDA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM
    • Publication number 20070165355
    • Publication date Jul 19, 2007
    • TOKYO ELECTON LIMITED
    • Manabu Sato
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Etching method
    • Publication number 20050269294
    • Publication date Dec 8, 2005
    • TOKYO ELECTRON LIMITED
    • Yoshiki Igarashi
    • B08 - CLEANING
  • Information Patent Application

    Plasma ashing method
    • Publication number 20050106875
    • Publication date May 19, 2005
    • TOKYO ELECTRON LIMITED
    • Kazuhiro Kubota
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Method and apparatus for bilayer photoresist dry development
    • Publication number 20040185380
    • Publication date Sep 23, 2004
    • TOKYO ELECTRON LIMITED
    • Yoshiki Igarashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Oxide film etching method
    • Publication number 20040173573
    • Publication date Sep 9, 2004
    • TOKYO ELECTRON LIMITED
    • Yoshiki Igarashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Oxide film etching method
    • Publication number 20020055263
    • Publication date May 9, 2002
    • Yoshiki Igarashi
    • H01 - BASIC ELECTRIC ELEMENTS