Yoshikuni Tateyama

Person

Hiratsuka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing method of organic film and method of...
- Patent number 8,685,857
- Issue date Apr 1, 2014
- Kabushiki Kaisha Toshiba
- Yukiteru Matsui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate holding mechanism, substrate polishing apparatus and subs...
- Patent number 8,292,694
- Issue date Oct 23, 2012
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Manufacturing method of a semiconductor device
- Patent number 8,174,125
- Issue date May 8, 2012
- Kabushiki Kaisha Toshiba
- Nobuyuki Kurashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 8,078,306
- Issue date Dec 13, 2011
- Ebara Corporation
- Hidetaka Nakao
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,985,685
- Issue date Jul 26, 2011
- Kabushiki Kaisha Toshiba
- Yukiteru Matsui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Post-CMP treating liquid and manufacturing method of semiconductor...
- Patent number 7,951,717
- Issue date May 31, 2011
- Kabushiki Kaisha Toshiba
- Nobuyuki Kurashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabricating method of nonvolatile semiconductor storage apparatus
- Patent number 7,888,139
- Issue date Feb 15, 2011
- Kabushiki Kaisha Toshiba
- Yukiteru Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding mechanism, substrate polishing apparatus and subs...
- Patent number 7,883,394
- Issue date Feb 8, 2011
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Manufacturing method of a semiconductor device
- Patent number 7,521,350
- Issue date Apr 21, 2009
- Kabushiki Kaisha Toshiba
- Nobuyuki Kurashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing method of organic film and method of...
- Patent number 7,452,819
- Issue date Nov 18, 2008
- Kabushiki Kaisha Toshiba
- Yukiteru Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding mechanism, substrate polishing apparatus and subs...
- Patent number 7,419,420
- Issue date Sep 2, 2008
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,144,804
- Issue date Dec 5, 2006
- Kabushiki Kaisha Toshiba
- Gaku Minamihaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device using chemical mechani...
- Patent number 7,101,801
- Issue date Sep 5, 2006
- Kabushiki Kaisha Toshiba
- Takatoshi Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device containing a dummy wire
- Patent number 7,042,099
- Issue date May 9, 2006
- Kabushiki Kaisha Toshiba
- Nobuyuki Kurashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making semiconductor device by polishing with intermediat...
- Patent number 6,984,582
- Issue date Jan 10, 2006
- Kabushiki Kaisha Toshiba
- Dai Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an improved construction in the interla...
- Patent number 6,858,936
- Issue date Feb 22, 2005
- Kabushiki Kaisha Toshiba
- Gaku Minamihaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus
- Patent number 6,835,116
- Issue date Dec 28, 2004
- Ebara Corporation
- Shozo Oguri
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 6,645,053
- Issue date Nov 11, 2003
- Ebara Corporation
- Norio Kimura
- B24 - GRINDING POLISHING
Information Patent Grant
CMP method and semiconductor manufacturing apparatus
- Patent number 6,561,876
- Issue date May 13, 2003
- Kabushiki Kaisha Toshiba
- Yoshikuni Tateyama
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing slurry and polishing method
- Patent number 6,338,744
- Issue date Jan 15, 2002
- Tokuyama Corporation
- Yoshikuni Tateyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing apparatus
- Patent number 6,036,582
- Issue date Mar 14, 2000
- Ebara Corporation
- Hideo Aizawa
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Polishing pad, polishing apparatus and polishing method
- Patent number 5,664,989
- Issue date Sep 9, 1997
- Kabushiki Kaisha Toshiba
- Rempei Nakata
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20200118859
- Publication date Apr 16, 2020
- KABUSHIKI KAISHA TOSHIBA
- Hiroshi SANDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECH...
- Publication number 20110250756
- Publication date Oct 13, 2011
- KABUSHIKI KAISHA TOSHIBA
- Kazuhito UCHIKURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POST-CMP TREATING LIQUID AND MANUFACTURING METHOD OF SEMICONDUCTOR...
- Publication number 20110195888
- Publication date Aug 11, 2011
- Nobuyuki KURASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE
- Publication number 20100193850
- Publication date Aug 5, 2010
- Kabushiki Kaisha Toshiba
- Yoshiaki ASAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATING METHOD OF NONVOLATILE SEMICONDUCTOR STORAGE APPARATUS
- Publication number 20100144062
- Publication date Jun 10, 2010
- Yukiteru MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBS...
- Publication number 20100062691
- Publication date Mar 11, 2010
- Tetsuji TOGAWA
- B24 - GRINDING POLISHING
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20090258493
- Publication date Oct 15, 2009
- Yukiteru MATSUI
- B24 - GRINDING POLISHING
Information Patent Application
MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE
- Publication number 20090184415
- Publication date Jul 23, 2009
- Kabushiki Kaisha Toshiba
- Nobuyuki Kurashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20090176372
- Publication date Jul 9, 2009
- Gaku MINAMIHABA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090156000
- Publication date Jun 18, 2009
- Yukiteru MATSUI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECH...
- Publication number 20090124172
- Publication date May 14, 2009
- JSR Corporation
- Kazuhito Uchikura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090124076
- Publication date May 14, 2009
- Yukiteru Matsui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing apparatus and polishing method
- Publication number 20090111358
- Publication date Apr 30, 2009
- EBARA CORPORATION
- Hidetaka Nakao
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing method of organic film and method of...
- Publication number 20090068841
- Publication date Mar 12, 2009
- Kabushiki Kaisha Toshiba
- Yukiteru Matsui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090068840
- Publication date Mar 12, 2009
- Gaku MINAMIHABA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBS...
- Publication number 20080318503
- Publication date Dec 25, 2008
- Tetsuji TOGAWA
- B24 - GRINDING POLISHING
Information Patent Application
POST-CMP TREATING LIQUID AND MANUFACTURING METHOD OF SEMICONDUCTOR...
- Publication number 20080216415
- Publication date Sep 11, 2008
- Nobuyuki KURASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF...
- Publication number 20080045016
- Publication date Feb 21, 2008
- JSR Corporation
- Michiaki Andou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aqueous dispersion for chemical mechanical polishing, kit for prepa...
- Publication number 20070049180
- Publication date Mar 1, 2007
- JSR Corporation
- Hirotaka Shida
- B24 - GRINDING POLISHING
Information Patent Application
Substrate holding mechanism, substrate polishing apparatus and subs...
- Publication number 20060205323
- Publication date Sep 14, 2006
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Application
Manufacturing method of a semiconductor device
- Publication number 20060151888
- Publication date Jul 13, 2006
- Kabushiki Kaisha Toshiba
- Nobuyuki Kurashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing pad and method of manufacturing semiconductor devices
- Publication number 20050227489
- Publication date Oct 13, 2005
- Gaku Minamihara
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050116348
- Publication date Jun 2, 2005
- Kabushiki Kaisha Toshiba
- Gaku Minamihaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing method of organic film and method of...
- Publication number 20040253822
- Publication date Dec 16, 2004
- Yukiteru Matsui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Semiconductor device manufacturing method
- Publication number 20040152318
- Publication date Aug 5, 2004
- Dai Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20040152316
- Publication date Aug 5, 2004
- Takatoshi Ono
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Semiconductor device and its manufacturing method
- Publication number 20040119164
- Publication date Jun 24, 2004
- Nobuyuki Kurashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing apparatus
- Publication number 20040072512
- Publication date Apr 15, 2004
- Norio Kimura
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040070077
- Publication date Apr 15, 2004
- Gaku Minamihaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing apparatus, polishing method and method of manufacturing s...
- Publication number 20040002292
- Publication date Jan 1, 2004
- Kabushiki Kaisha Toshiba
- Dai Fukushima
- B24 - GRINDING POLISHING

Yoshikuni Tateyama

Person

Patents Grantslast 30 patents

Chemical mechanical polishing method of organic film and method of...

Substrate holding mechanism, substrate polishing apparatus and subs...

Manufacturing method of a semiconductor device

Polishing apparatus and polishing method

Method of manufacturing semiconductor device

Post-CMP treating liquid and manufacturing method of semiconductor...

Fabricating method of nonvolatile semiconductor storage apparatus

Substrate holding mechanism, substrate polishing apparatus and subs...

Manufacturing method of a semiconductor device

Chemical mechanical polishing method of organic film and method of...

Substrate holding mechanism, substrate polishing apparatus and subs...

Semiconductor device and method of manufacturing the same

Method of manufacturing semiconductor device using chemical mechani...

Semiconductor device containing a dummy wire

Method of making semiconductor device by polishing with intermediat...

Semiconductor device having an improved construction in the interla...

Polishing apparatus

Polishing apparatus

CMP method and semiconductor manufacturing apparatus

Polishing slurry and polishing method

Polishing apparatus

Polishing pad, polishing apparatus and polishing method

Patents Applicationslast 30 patents

APPARATUS FOR PROCESSING SUBSTRATE

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECH...

POST-CMP TREATING LIQUID AND MANUFACTURING METHOD OF SEMICONDUCTOR...

SEMICONDUCTOR MEMORY DEVICE

FABRICATING METHOD OF NONVOLATILE SEMICONDUCTOR STORAGE APPARATUS

SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBS...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE

CHEMICAL MECHANICAL POLISHING SLURRY AND SEMICONDUCTOR DEVICE MANUF...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECH...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Polishing apparatus and polishing method

Chemical mechanical polishing method of organic film and method of...

POLISHING LIQUID AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBS...

POST-CMP TREATING LIQUID AND MANUFACTURING METHOD OF SEMICONDUCTOR...

CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF...

Aqueous dispersion for chemical mechanical polishing, kit for prepa...

Substrate holding mechanism, substrate polishing apparatus and subs...

Manufacturing method of a semiconductor device

Polishing pad and method of manufacturing semiconductor devices

Semiconductor device and method of manufacturing the same

Chemical mechanical polishing method of organic film and method of...

Semiconductor device manufacturing method

Method of manufacturing semiconductor device

Semiconductor device and its manufacturing method

Polishing apparatus

Semiconductor device and method of manufacturing the same

Polishing apparatus, polishing method and method of manufacturing s...