Yoshimi Shiramizu

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for analyzing metal element on surface of wafer
- Patent number 7,348,188
- Issue date Mar 25, 2008
- NEC Electronics Corporation
- Yoshimi Shiramizu
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for cleaning semiconductor device
- Patent number 6,726,886
- Issue date Apr 27, 2004
- NEC Electronics Corporation
- Yoshimi Shiramizu
- B08 - CLEANING
Information Patent Grant
Method of producing samples of semiconductor substrate with quantif...
- Patent number 6,323,136
- Issue date Nov 27, 2001
- NEC Corporation
- Yoshimi Shiramizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning semiconductor device
- Patent number 6,277,767
- Issue date Aug 21, 2001
- NEC Corporation
- Yoshimi Shiramizu
- B08 - CLEANING
Information Patent Grant
Method of analyzing substances existing in gas
- Patent number 6,248,997
- Issue date Jun 19, 2001
- NEC Corporation
- Yoshimi Shiramizu
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Cleaning method and system of semiconductor substrate and productio...
- Patent number 6,116,254
- Issue date Sep 12, 2000
- NEC Corporation
- Yoshimi Shiramizu
- B08 - CLEANING
Information Patent Grant
Generation of electrolytically active water and wet process of a se...
- Patent number 5,824,200
- Issue date Oct 20, 1998
- NEC Corporation
- Hiroshi Kitajima
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method for cleaning a semiconductor wafer with an improved cleaning...
- Patent number 5,814,157
- Issue date Sep 29, 1998
- NEC Corporation
- Tetsuo Mizuniwa
- B08 - CLEANING
Information Patent Grant
Method for producing electrolyzed water
- Patent number 5,762,779
- Issue date Jun 9, 1998
- NEC Corporation
- Yoshimi Shiramizu
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method for producing electrolyzed water
- Patent number 5,599,438
- Issue date Feb 4, 1997
- NEC Corporation
- Yoshimi Shiramizu
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Wet processing apparatus having individual reactivating feedback pa...
- Patent number 5,549,798
- Issue date Aug 27, 1996
- NEC Corporation
- Hiroshi Kitajima
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method for producing electrolyzed water
- Patent number 5,543,030
- Issue date Aug 6, 1996
- NEC Corporation
- Yoshimi Shiramizu
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Apparatus for analyzing organic substance and method for the same
- Patent number 5,522,918
- Issue date Jun 4, 1996
- NEC Corporation
- Yoshimi Shiramizu
- G01 - MEASURING TESTING
Information Patent Grant
Method of cleaning semiconductor substrate using an aqueous acid so...
- Patent number 5,509,970
- Issue date Apr 23, 1996
- NEC Corporation
- Yoshimi Shiramizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method for semiconductor substrate
- Patent number 5,472,513
- Issue date Dec 5, 1995
- NEC Corporation
- Yoshimi Shiramizu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Code conversion method and device for code conversion
- Publication number 20060149537
- Publication date Jul 6, 2006
- Yoshimi Shiramizu
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Application
Method for analyzing metal element on surface of wafer
- Publication number 20050196881
- Publication date Sep 8, 2005
- NEC Electronics Corporation
- Yoshimi Shiramizu
- G01 - MEASURING TESTING
Information Patent Application
Method of preparing analytical sample, method of analyzing substanc...
- Publication number 20050048659
- Publication date Mar 3, 2005
- NEC ELECTRONICS CORPORATION
- Yoshimi Shiramizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Retaining box, and a feeding apparatus of a semiconductor wafer, wh...
- Publication number 20020194995
- Publication date Dec 26, 2002
- Yoshimi Shiramizu
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method of and apparatus for cleaning semiconductor device
- Publication number 20020023670
- Publication date Feb 28, 2002
- NEC Corporation
- Yoshimi Shiramizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and device for manufacturing semiconductor devices including...
- Publication number 20020009899
- Publication date Jan 24, 2002
- NEC Corporation
- Yoshimi Shiramizu
- H01 - BASIC ELECTRIC ELEMENTS

Yoshimi Shiramizu

Person

Patents Grantslast 30 patents

Method for analyzing metal element on surface of wafer

Apparatus for cleaning semiconductor device

Method of producing samples of semiconductor substrate with quantif...

Method for cleaning semiconductor device

Method of analyzing substances existing in gas

Cleaning method and system of semiconductor substrate and productio...

Generation of electrolytically active water and wet process of a se...

Method for cleaning a semiconductor wafer with an improved cleaning...

Method for producing electrolyzed water

Method for producing electrolyzed water

Wet processing apparatus having individual reactivating feedback pa...

Method for producing electrolyzed water

Apparatus for analyzing organic substance and method for the same

Method of cleaning semiconductor substrate using an aqueous acid so...

Cleaning method for semiconductor substrate

Patents Applicationslast 30 patents

Code conversion method and device for code conversion

Method for analyzing metal element on surface of wafer

Method of preparing analytical sample, method of analyzing substanc...

Retaining box, and a feeding apparatus of a semiconductor wafer, wh...

Method of and apparatus for cleaning semiconductor device

Method and device for manufacturing semiconductor devices including...