Yoshitomo Nakagawa

Person

Mihama-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask defect repair apparatus and mask defect repair method
- Patent number 11,906,899
- Issue date Feb 20, 2024
- Hitachi High-Tech Science Corporation
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam processing apparatus
- Patent number 11,721,517
- Issue date Aug 8, 2023
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat transfer system for an inductively coupled plasma device
- Patent number 9,820,370
- Issue date Nov 14, 2017
- Hitachi High-Tech Science Corporation
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilized ICP emission spectrometer and method of using
- Patent number 9,726,611
- Issue date Aug 8, 2017
- Hitachi High-Tech Science Corporation
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite focused ion beam device, process observation method using...
- Patent number 8,274,063
- Issue date Sep 25, 2012
- SII NanoTechnology Inc.
- Takashi Kaito
- G01 - MEASURING TESTING
Information Patent Grant
Focused ion beam apparatus
- Patent number 7,755,065
- Issue date Jul 13, 2010
- SII NanoTechnology Inc.
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion mass analyzing apparatus
- Patent number 6,031,379
- Issue date Feb 29, 2000
- Seiko Instruments, Inc.
- Shinichi Takada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma mass spectrometric and spectrochemical a...
- Patent number 6,002,129
- Issue date Dec 14, 1999
- Seiko Instruments Inc.
- Tetsumasa Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample introducing device for inductively coupled plasma analyzer
- Patent number 5,867,262
- Issue date Feb 2, 1999
- Seiko Instruments Inc.
- Toru Etoh
- G01 - MEASURING TESTING
Information Patent Grant
Plasma ion source mass analyzer
- Patent number 5,804,821
- Issue date Sep 8, 1998
- Seiko Instruments Inc.
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion source mass spectrometer
- Patent number 5,773,823
- Issue date Jun 30, 1998
- Seiko Instruments Inc.
- Tetsumasa Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion source mass analyzing apparatus
- Patent number 5,559,337
- Issue date Sep 24, 1996
- Seiko Instruments Inc.
- Tetsumasa Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma mass spectrometer
- Patent number 5,477,048
- Issue date Dec 19, 1995
- Seiko Instruments Inc.
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive plasma mass spectrometer
- Patent number 5,426,299
- Issue date Jun 20, 1995
- Seiko Instruments Inc.
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma mass spectrometry device
- Patent number 5,334,834
- Issue date Aug 2, 1994
- Seiko Instruments Inc.
- Tetsumasa Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming pattern films
- Patent number 5,071,671
- Issue date Dec 10, 1991
- Seiko Instruments Inc.
- Yoshitomo Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inductively coupled plasma mass spectrometry apparatus
- Patent number 4,999,492
- Issue date Mar 12, 1991
- Seiko Instruments, Inc.
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask-repairing device
- Patent number 4,930,439
- Issue date Jun 5, 1990
- Seiko Instruments Inc.
- Mitsuyoshi Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of correcting a pattern film
- Patent number 4,902,530
- Issue date Feb 20, 1990
- Seiko Instruments Inc.
- Anto Yasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for modifying patterned film
- Patent number 4,874,460
- Issue date Oct 17, 1989
- Seiko Instruments Inc.
- Yoshitomo Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming pattern film
- Patent number 4,874,632
- Issue date Oct 17, 1989
- Seiko Instruments, Inc.
- Yoshitomo Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for repairing a pattern film
- Patent number 4,851,097
- Issue date Jul 25, 1989
- Seiko Instruments Inc.
- Osamu Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FOCUSED ION BEAM PROCESSING APPARATUS
- Publication number 20210296080
- Publication date Sep 23, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK DEFECT REPAIR APPARATUS AND MASK DEFECT REPAIR METHOD
- Publication number 20200310246
- Publication date Oct 1, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshitomo NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Generating Device and Inductively Couple...
- Publication number 20160270201
- Publication date Sep 15, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshitomo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ICP Emission Spectrometer
- Publication number 20150276611
- Publication date Oct 1, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshitomo Nakagawa
- G01 - MEASURING TESTING
Information Patent Application
COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING...
- Publication number 20100288924
- Publication date Nov 18, 2010
- Takashi Kaito
- G01 - MEASURING TESTING

Yoshitomo Nakagawa

Person

Patents Grantslast 30 patents

Mask defect repair apparatus and mask defect repair method

Focused ion beam processing apparatus

Heat transfer system for an inductively coupled plasma device

Stabilized ICP emission spectrometer and method of using

Composite focused ion beam device, process observation method using...

Focused ion beam apparatus

Plasma ion mass analyzing apparatus

Inductively coupled plasma mass spectrometric and spectrochemical a...

Sample introducing device for inductively coupled plasma analyzer

Plasma ion source mass analyzer

Plasma ion source mass spectrometer

Plasma ion source mass analyzing apparatus

Inductively coupled plasma mass spectrometer

Inductive plasma mass spectrometer

Inductively coupled plasma mass spectrometry device

Process for forming pattern films

Inductively coupled plasma mass spectrometry apparatus

Mask-repairing device

Method of correcting a pattern film

Method and apparatus for modifying patterned film

Process for forming pattern film

Apparatus for repairing a pattern film

Patents Applicationslast 30 patents

FOCUSED ION BEAM PROCESSING APPARATUS

MASK DEFECT REPAIR APPARATUS AND MASK DEFECT REPAIR METHOD

Inductively Coupled Plasma Generating Device and Inductively Couple...

ICP Emission Spectrometer

COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING...