Yoshiyuki Takata

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,998,656
- Issue date Aug 16, 2011
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified posi...
- Patent number 7,862,980
- Issue date Jan 4, 2011
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist composition
- Patent number 7,803,513
- Issue date Sep 28, 2010
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified resist composition
- Patent number 7,575,850
- Issue date Aug 18, 2009
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified resist composition
- Patent number 7,572,570
- Issue date Aug 11, 2009
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified resist composition
- Patent number 7,566,522
- Issue date Jul 28, 2009
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 7,262,321
- Issue date Aug 28, 2007
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical amplification type resist composition
- Patent number 7,220,532
- Issue date May 22, 2007
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification type positive resist composition and a resin...
- Patent number 7,175,963
- Issue date Feb 13, 2007
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,132,218
- Issue date Nov 7, 2006
- Sumitomo Chemical Company, Limited
- Kouji Toishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplifying type positive resist composition
- Patent number 6,835,527
- Issue date Dec 28, 2004
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 6,815,140
- Issue date Nov 9, 2004
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 6,579,659
- Issue date Jun 17, 2003
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 6,537,726
- Issue date Mar 25, 2003
- Sumitomo Chemical Company, Limited
- Junji Nakanishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 6,495,306
- Issue date Dec 17, 2002
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 6,495,307
- Issue date Dec 17, 2002
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 6,475,699
- Issue date Nov 5, 2002
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist compositions comprising a hydroxyphenyl ketone
- Patent number 6,274,287
- Issue date Aug 14, 2001
- Sumitomo Chemical Company, Limited
- Hiroshi Moriuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyhydroxy compound and a positive photoresist containing the same
- Patent number 5,807,656
- Issue date Sep 15, 1998
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST PROCESSING METHOD
- Publication number 20100279226
- Publication date Nov 4, 2010
- Mitsuhiro Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20100035180
- Publication date Feb 11, 2010
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20080274426
- Publication date Nov 6, 2008
- Sumitomo Chemical Company, Limited
- Yusuke FUJI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified resist composition
- Publication number 20080248423
- Publication date Oct 9, 2008
- Sumitomo Chemical Company, Limited
- Satoshi YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20080220369
- Publication date Sep 11, 2008
- Sumitomo Chemical Company, Limited
- Satoshi YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20080193874
- Publication date Aug 14, 2008
- Sumitomo Chemical Company, Limited
- Yoshiyuki TAKATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified resist composition
- Publication number 20080166660
- Publication date Jul 10, 2008
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified posi...
- Publication number 20080081293
- Publication date Apr 3, 2008
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20070100096
- Publication date May 3, 2007
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20050214676
- Publication date Sep 29, 2005
- Sumitomo Chemical Company, Limited
- Kouji Toishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition and a resin...
- Publication number 20050100819
- Publication date May 12, 2005
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition
- Publication number 20050031984
- Publication date Feb 10, 2005
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type resist composition
- Publication number 20040053171
- Publication date Mar 18, 2004
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20030180659
- Publication date Sep 25, 2003
- Yoshiyuki Takata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition
- Publication number 20030068573
- Publication date Apr 10, 2003
- Yoshiyuki Takata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplifying type positive resist composition
- Publication number 20030039918
- Publication date Feb 27, 2003
- Yoshiyuki Takata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE RESIST COMPOSITION
- Publication number 20020006574
- Publication date Jan 17, 2002
- YASUNORI UETANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20010046641
- Publication date Nov 29, 2001
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20010044070
- Publication date Nov 22, 2001
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Chemically amplified positive resist compositon
- Publication number 20010039080
- Publication date Nov 8, 2001
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive resist composition
- Publication number 20010026905
- Publication date Oct 4, 2001
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20010016298
- Publication date Aug 23, 2001
- Junji Nakanishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20010014428
- Publication date Aug 16, 2001
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Yoshiyuki Takata

Person

Patents Grantslast 30 patents

Chemically amplified positive resist composition

Salt suitable for an acid generator and a chemically amplified posi...

Chemically amplified resist composition

Chemically amplified resist composition

Chemically amplified resist composition

Chemically amplified resist composition

Salt suitable for an acid generator and a chemically amplified resi...

Chemical amplification type resist composition

Chemical amplification type positive resist composition and a resin...

Chemically amplified positive resist composition

Chemical amplifying type positive resist composition

Positive resist composition

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Positive resist compositions comprising a hydroxyphenyl ketone

Polyhydroxy compound and a positive photoresist containing the same

Patents Applicationslast 30 patents

RESIST PROCESSING METHOD

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

CHEMICALLY AMPLIFIED RESIST COMPOSITION

Chemically amplified resist composition

CHEMICALLY AMPLIFIED RESIST COMPOSITION

CHEMICALLY AMPLIFIED RESIST COMPOSITION

Chemically amplified resist composition

Salt suitable for an acid generator and a chemically amplified posi...

Salt suitable for an acid generator and a chemically amplified resi...

Chemically amplified positive resist composition

Chemical amplification type positive resist composition and a resin...

Chemical amplification type positive resist composition

Chemical amplification type resist composition

Resist composition

Chemical amplification type positive resist composition

Chemical amplifying type positive resist composition

POSITIVE RESIST COMPOSITION

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Chemically amplified positive resist compositon

Positive resist composition

Chemically amplified positive resist composition

Chemically amplified positive resist composition