Younghee LEE

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective etch using deposition of a metalloid or metal containing...
- Patent number 12,341,021
- Issue date Jun 24, 2025
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch using a sacrificial mask
- Patent number 12,027,375
- Issue date Jul 2, 2024
- Lam Research Corporation
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of self assembled monolayer for enabling selective depos...
- Patent number 11,450,532
- Issue date Sep 20, 2022
- Lam Research Corporation
- Younghee Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER
- Publication number 20250218774
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST
- Publication number 20250060674
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Da LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...
- Publication number 20240192590
- Publication date Jun 13, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST
- Publication number 20240036474
- Publication date Feb 1, 2024
- LAM RESEARCH CORPORATION
- Daniel PETER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS
- Publication number 20230314946
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Eric Calvin Hansen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION
- Publication number 20230230811
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING...
- Publication number 20230118701
- Publication date Apr 20, 2023
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALLOY FILM ETCH
- Publication number 20230047486
- Publication date Feb 16, 2023
- LAM RESEARCH CORPORATION
- Younghee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST APPLICATION/EXPOSURE TREATMENTS TO IMPROVE DRY DEVELOPMENT PER...
- Publication number 20230031955
- Publication date Feb 2, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SELF ASSEMBLED MONOLAYER FOR ENABLING SELECTIVE DEPOS...
- Publication number 20220208555
- Publication date Jun 30, 2022
- LAM RESEARCH CORPORATION
- Younghee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH USING A SACRIFICIAL MASK
- Publication number 20220122848
- Publication date Apr 21, 2022
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVELY ETCHING FOR NANOWIRES
- Publication number 20210272814
- Publication date Sep 2, 2021
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS

Younghee LEE

Person

Patents Grantslast 30 patents

Selective etch using deposition of a metalloid or metal containing...

Selective etch using a sacrificial mask

Deposition of self assembled monolayer for enabling selective depos...

Patents Applicationslast 30 patents

HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER

ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST

APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...

CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST

METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS

SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION

SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING...

ALLOY FILM ETCH

POST APPLICATION/EXPOSURE TREATMENTS TO IMPROVE DRY DEVELOPMENT PER...

DEPOSITION OF SELF ASSEMBLED MONOLAYER FOR ENABLING SELECTIVE DEPOS...

SELECTIVE ETCH USING A SACRIFICIAL MASK

SELECTIVELY ETCHING FOR NANOWIRES