Yuen-Kui (Jerry) Wong

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 6,440,866
- Issue date Aug 27, 2002
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 6,218,312
- Issue date Apr 17, 2001
- Applied Materials Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry-etching of indium and tin oxides
- Patent number 6,036,876
- Issue date Mar 14, 2000
- Applied Komatsu Technology, Inc.
- Jie Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 6,036,877
- Issue date Mar 14, 2000
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tapered dielectric etch in semiconductor devices
- Patent number 5,895,937
- Issue date Apr 20, 1999
- Applied Komatsu Technology, Inc.
- Yuh-Jia (Jim) Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tapered profile etching method
- Patent number 5,893,757
- Issue date Apr 13, 1999
- Applied Komatsu Technology, Inc.
- Yuh-Jia Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch of indium and tin oxides with C2H5I gas
- Patent number 5,843,277
- Issue date Dec 1, 1998
- Applied Komatsu Technology, Inc.
- Haruhiro Harry Goto
- G02 - OPTICS
Information Patent Grant
Tapered dielectric etch in semiconductor devices
- Patent number 5,728,608
- Issue date Mar 17, 1998
- Applied Komatsu Technology, Inc.
- Yuh-Jia (Jim) Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-rate dry-etch of indium and tin oxides by hydrogen and halogen...
- Patent number 5,607,602
- Issue date Mar 4, 1997
- Applied Komatsu Technology, Inc.
- Yuh-Jia Su
- H01 - BASIC ELECTRIC ELEMENTS

Yuen-Kui (Jerry) Wong

Person

Patents Grantslast 30 patents

Plasma reactor with heated source of a polymer-hardening precursor...

Plasma reactor with heated source of a polymer-hardening precursor...

Dry-etching of indium and tin oxides

Plasma reactor with heated source of a polymer-hardening precursor...

Tapered dielectric etch in semiconductor devices

Tapered profile etching method

Dry-etch of indium and tin oxides with C2H5I gas

Tapered dielectric etch in semiconductor devices

High-rate dry-etch of indium and tin oxides by hydrogen and halogen...