Yuhou WANG

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 12,193,138
- Issue date Jan 7, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct frequency tuning for matchless plasma source in substrate pr...
- Patent number 11,728,137
- Issue date Aug 15, 2023
- Lam Research Corporation
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
- Patent number 11,728,136
- Issue date Aug 15, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 11,716,805
- Issue date Aug 1, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for a matchless plasma source
- Patent number 11,437,219
- Issue date Sep 6, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
- Patent number 11,342,159
- Issue date May 24, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 11,224,116
- Issue date Jan 11, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image based plasma sheath profile detection on plasma processing tools
- Patent number 10,957,521
- Issue date Mar 23, 2021
- Lam Research Corporation
- Yuhou Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Auxiliary circuit in RF matching network for frequency tuning assis...
- Patent number 10,879,044
- Issue date Dec 29, 2020
- Lam Research Corporation
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for a matchless plasma source
- Patent number 10,672,590
- Issue date Jun 2, 2020
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 10,638,593
- Issue date Apr 28, 2020
- Lam Research Corporation
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 10,264,663
- Issue date Apr 16, 2019
- Lam Research Corporation
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Reference Box for Direct-Drive Radiofrequency Power Supply
- Publication number 20240404804
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Junction System for Direct-Drive Radiofrequency Power Supply
- Publication number 20240396372
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Enclosure Including Spectral Reflectometry System for Pla...
- Publication number 20240395519
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20230360883
- Publication date Nov 9, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20230354502
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Protection System for Switches in Direct Drive Circuits of Substrat...
- Publication number 20230245873
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PULSING FREQUENCIES AND DUTY CYCLES OF PARAMETERS OF RF...
- Publication number 20230223236
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC WINDOW FOR SUBSTRATE PROCESSING CHAMBER
- Publication number 20230126058
- Publication date Apr 27, 2023
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20220254608
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE
- Publication number 20220199365
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LOCATION DETECTION AND ADJUSTMENT
- Publication number 20220126454
- Publication date Apr 28, 2022
- LAM RESEARCH CORPORATION
- Michael John Martin
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20220117074
- Publication date Apr 14, 2022
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT FREQUENCY TUNING FOR MATCHLESS PLASMA SOURCE IN SUBSTRATE PR...
- Publication number 20210210314
- Publication date Jul 8, 2021
- LAM RESEARCH CORPORATION
- Yuhou WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20200335305
- Publication date Oct 22, 2020
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Frequency Tuning for a Matchless Plasma Source
- Publication number 20200286713
- Publication date Sep 10, 2020
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20200253034
- Publication date Aug 6, 2020
- LAM RESEARCH CORPORATION
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
IMAGE BASED PLASMA SHEATH PROFILE DETECTION ON PLASMA PROCESSING TOOLS
- Publication number 20190371581
- Publication date Dec 5, 2019
- LAM RESEARCH CORPORATION
- Yuhou Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Frequency Tuning for a Matchless Plasma Source
- Publication number 20190287764
- Publication date Sep 19, 2019
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20190215942
- Publication date Jul 11, 2019
- LAM RESEARCH CORPORATION
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Matchless Plasma Source for Semiconductor Wafer Fabrication
- Publication number 20190116656
- Publication date Apr 18, 2019
- LAM RESEARCH CORPORATION
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
AUXILIARY CIRCUIT IN RF MATCHING NETWORK FOR FREQUENCY TUNING ASSIS...
- Publication number 20180294566
- Publication date Oct 11, 2018
- LAM RESEARCH CORPORATION
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detection System for Tunable/Replaceable Edge Coupling Ring
- Publication number 20170263478
- Publication date Sep 14, 2017
- LAM RESEARCH CORPORATION
- Jon McCHESNEY
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Matchless plasma source for semiconductor wafer fabrication

Dual-frequency, direct-drive inductively coupled plasma source

Direct frequency tuning for matchless plasma source in substrate pr...

RF pulsing within pulsing for semiconductor RF plasma processing

Matchless plasma source for semiconductor wafer fabrication

Frequency tuning for a matchless plasma source

RF pulsing within pulsing for semiconductor RF plasma processing

Matchless plasma source for semiconductor wafer fabrication

Image based plasma sheath profile detection on plasma processing tools

Auxiliary circuit in RF matching network for frequency tuning assis...

Frequency tuning for a matchless plasma source

Matchless plasma source for semiconductor wafer fabrication

Matchless plasma source for semiconductor wafer fabrication

Patents Applicationslast 30 patents

Reference Box for Direct-Drive Radiofrequency Power Supply

Junction System for Direct-Drive Radiofrequency Power Supply

Metrology Enclosure Including Spectral Reflectometry System for Pla...

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

Protection System for Switches in Direct Drive Circuits of Substrat...

CONTROL OF PULSING FREQUENCIES AND DUTY CYCLES OF PARAMETERS OF RF...

DIELECTRIC WINDOW FOR SUBSTRATE PROCESSING CHAMBER

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE

SUBSTRATE LOCATION DETECTION AND ADJUSTMENT

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

DIRECT FREQUENCY TUNING FOR MATCHLESS PLASMA SOURCE IN SUBSTRATE PR...

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

Frequency Tuning for a Matchless Plasma Source

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

IMAGE BASED PLASMA SHEATH PROFILE DETECTION ON PLASMA PROCESSING TOOLS

Frequency Tuning for a Matchless Plasma Source

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

Matchless Plasma Source for Semiconductor Wafer Fabrication

AUXILIARY CIRCUIT IN RF MATCHING NETWORK FOR FREQUENCY TUNING ASSIS...

Detection System for Tunable/Replaceable Edge Coupling Ring