Yuichiro Yamazaki

Person

Yokkaichi-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 9,368,314
- Issue date Jun 14, 2016
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,803,103
- Issue date Aug 12, 2014
- Ebara Corporation
- Mamoru Nakasuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern inspection apparatus and pattern inspection method
- Patent number 8,649,591
- Issue date Feb 11, 2014
- Kabushiki Kaisha Toshiba
- Makoto Kaneko
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,368,031
- Issue date Feb 5, 2013
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Mapping-projection-type electron beam apparatus for inspecting samp...
- Patent number 8,124,933
- Issue date Feb 28, 2012
- Ebara Corporation
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus
- Patent number 8,067,732
- Issue date Nov 29, 2011
- Ebara Corporation
- Mamoru Nakasuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,053,726
- Issue date Nov 8, 2011
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Projection electron beam apparatus and defect inspection system usi...
- Patent number 8,035,082
- Issue date Oct 11, 2011
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- G01 - MEASURING TESTING
Information Patent Grant
Pattern matching method, program and semiconductor device manufactu...
- Patent number 8,036,445
- Issue date Oct 11, 2011
- Kabushiki Kaisha Toshiba
- Atsushi Onishi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Structure inspection method, pattern formation method, process cond...
- Patent number 7,903,264
- Issue date Mar 8, 2011
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus and an aberration correction optical apparatus
- Patent number 7,863,580
- Issue date Jan 4, 2011
- Ebara Corporation
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,847,250
- Issue date Dec 7, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask pattern inspection method, exposure condition verification met...
- Patent number 7,674,570
- Issue date Mar 9, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate inspection method, method of manufacturing semiconductor...
- Patent number 7,645,988
- Issue date Jan 12, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and sem...
- Patent number 7,608,821
- Issue date Oct 27, 2009
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mapping-projection-type electron beam apparatus for inspecting samp...
- Patent number 7,592,586
- Issue date Sep 22, 2009
- Ebara Corporation
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam inspection system and inspection method and method of...
- Patent number 7,569,838
- Issue date Aug 4, 2009
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection method, manufacturing method of semiconductor...
- Patent number 7,504,625
- Issue date Mar 17, 2009
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure inspection method, pattern formation method, process cond...
- Patent number 7,483,155
- Issue date Jan 27, 2009
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G01 - MEASURING TESTING
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,462,829
- Issue date Dec 9, 2008
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detecting apparatus and device manufacturing method
- Patent number 7,449,691
- Issue date Nov 11, 2008
- Ebara Corporation
- Masahiro Hatakeyama
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 7,411,191
- Issue date Aug 12, 2008
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus with detailed observation function and samp...
- Patent number 7,352,195
- Issue date Apr 1, 2008
- Ebara Corporation
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam inspection system and inspection method and method of...
- Patent number 7,351,969
- Issue date Apr 1, 2008
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 7,241,993
- Issue date Jul 10, 2007
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,211,796
- Issue date May 1, 2007
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus with detailed observation function and samp...
- Patent number 7,212,017
- Issue date May 1, 2007
- Ebara Corporation
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Defect inspection apparatus, program, and manufacturing method of s...
- Patent number 7,148,479
- Issue date Dec 12, 2006
- Kabushiki Kaisha Toshiba
- Atsushi Onishi
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus and device manufacturing method using same
- Patent number 7,098,457
- Issue date Aug 29, 2006
- Ebara Corporation
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method, method...
- Patent number 7,081,756
- Issue date Jul 25, 2006
- Kabushiki Kaisha Toshiba
- Hiroyuki Hayashi
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20140319346
- Publication date Oct 30, 2014
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
DEFECT INSPECTION APPARATUS, DEFECT INSPECTION METHOD AND NON-TRANS...
- Publication number 20140061461
- Publication date Mar 6, 2014
- Hiroyuki HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20140034831
- Publication date Feb 6, 2014
- KABUSHIKI KAISHA TOSHIBA
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION APPARATUS AND METHOD
- Publication number 20130063721
- Publication date Mar 14, 2013
- Kabushiki Kaisha Toshiba
- Takayoshi FUJII
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD
- Publication number 20120242985
- Publication date Sep 27, 2012
- Kabushiki Kaisha Toshiba
- Mitsutoshi WATABIKI
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD
- Publication number 20120243770
- Publication date Sep 27, 2012
- Kabushiki Kaisha Toshiba
- Makoto Kaneko
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD
- Publication number 20120242995
- Publication date Sep 27, 2012
- Kabushiki Kaisha Toshiba
- Yusaku KONNO
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20120032079
- Publication date Feb 9, 2012
- KABUSHIKI KAISHA TOSHIBA
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION ELECTRON BEAM APPARATUS AND DEFECT INSPECTION SYSTEM USI...
- Publication number 20100096550
- Publication date Apr 22, 2010
- Kabushiki Kaisha Toshiba
- Yuichiro YAMAZAKI
- G01 - MEASURING TESTING
Information Patent Application
MAPPING-PROJECTION-TYPE ELECTRON BEAM APPARATUS FOR INSPECTING SAMP...
- Publication number 20100019149
- Publication date Jan 28, 2010
- EBARA CORPORATION
- Kenji WATANABE
- G01 - MEASURING TESTING
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20090072139
- Publication date Mar 19, 2009
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20090032708
- Publication date Feb 5, 2009
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
STRUCTURE INSPECTION METHOD, PATTERN FORMATION METHOD, PROCESS COND...
- Publication number 20090002722
- Publication date Jan 1, 2009
- Kabushiki Kaisha Toshiba
- KEI HAYASAKI
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection system and inspection method and method of...
- Publication number 20080173814
- Publication date Jul 24, 2008
- EBARA CORPORATION
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect inspection method, defect inspection apparatus, and semicond...
- Publication number 20080013824
- Publication date Jan 17, 2008
- Shinji Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20070235644
- Publication date Oct 11, 2007
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus with detailed observation function and samp...
- Publication number 20070200569
- Publication date Aug 30, 2007
- EBARA CORPORATION
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Substrate inspection apparatus, substrate inspection method and sem...
- Publication number 20070194232
- Publication date Aug 23, 2007
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20070187600
- Publication date Aug 16, 2007
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask pattern inspection method, exposure condition verification met...
- Publication number 20070009811
- Publication date Jan 11, 2007
- Ichirota Nagahama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate inspection method, manufacturing method of semiconductor...
- Publication number 20060243907
- Publication date Nov 2, 2006
- Yuichiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mapping-projection-type electron beam apparatus for inspecting samp...
- Publication number 20060237646
- Publication date Oct 26, 2006
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Detecting apparatus and device manufacturing method
- Publication number 20060219909
- Publication date Oct 5, 2006
- EBARA CORPORATION
- Masahiro Hatakeyama
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection system and inspection method and method of...
- Publication number 20060118719
- Publication date Jun 8, 2006
- EBARA CORPORATION
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern matching method, program and semiconductor device manufactu...
- Publication number 20060110042
- Publication date May 25, 2006
- Atsushi Onishi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Substrate inspection method, method of manufacturing semiconductor...
- Publication number 20050263701
- Publication date Dec 1, 2005
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect inspection apparatus, program, and manufacturing method of s...
- Publication number 20050230618
- Publication date Oct 20, 2005
- Atsushi Onishi
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus and device manufacturing method using same
- Publication number 20050205783
- Publication date Sep 22, 2005
- EBARA CORPORATION
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam apparatus with detailed observation function and samp...
- Publication number 20050199807
- Publication date Sep 15, 2005
- EBARA CORPORATION
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Structure inspection method, pattern formation method, process cond...
- Publication number 20050168758
- Publication date Aug 4, 2005
- Kei Hayasaki
- G01 - MEASURING TESTING

Yuichiro Yamazaki

Person

Patents Grantslast 30 patents

Inspection system by charged particle beam and method of manufactur...

Inspection system by charged particle beam and method of manufactur...

Pattern inspection apparatus and pattern inspection method

Inspection system by charged particle beam and method of manufactur...

Mapping-projection-type electron beam apparatus for inspecting samp...

Electron beam apparatus

Inspection system by charged particle beam and method of manufactur...

Projection electron beam apparatus and defect inspection system usi...

Pattern matching method, program and semiconductor device manufactu...

Structure inspection method, pattern formation method, process cond...

Electron beam apparatus and an aberration correction optical apparatus

Substrate inspection apparatus, substrate inspection method and met...

Mask pattern inspection method, exposure condition verification met...

Substrate inspection method, method of manufacturing semiconductor...

Substrate inspection apparatus, substrate inspection method and sem...

Mapping-projection-type electron beam apparatus for inspecting samp...

Electron beam inspection system and inspection method and method of...

Substrate inspection method, manufacturing method of semiconductor...

Structure inspection method, pattern formation method, process cond...

Substrate inspection apparatus, substrate inspection method and met...

Detecting apparatus and device manufacturing method

Inspection system by charged particle beam and method of manufactur...

Electron beam apparatus with detailed observation function and samp...

Electron beam inspection system and inspection method and method of...

Inspection system by charged particle beam and method of manufactur...

Substrate inspection apparatus, substrate inspection method and met...

Electron beam apparatus with detailed observation function and samp...

Defect inspection apparatus, program, and manufacturing method of s...

Electron beam apparatus and device manufacturing method using same

Substrate inspection apparatus, substrate inspection method, method...

Patents Applicationslast 30 patents

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

DEFECT INSPECTION APPARATUS, DEFECT INSPECTION METHOD AND NON-TRANS...

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

PATTERN INSPECTION APPARATUS AND METHOD

PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD

PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD

PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

PROJECTION ELECTRON BEAM APPARATUS AND DEFECT INSPECTION SYSTEM USI...

MAPPING-PROJECTION-TYPE ELECTRON BEAM APPARATUS FOR INSPECTING SAMP...

Substrate inspection apparatus, substrate inspection method and met...

Inspection system by charged particle beam and method of manufactur...

STRUCTURE INSPECTION METHOD, PATTERN FORMATION METHOD, PROCESS COND...

Electron beam inspection system and inspection method and method of...

Defect inspection method, defect inspection apparatus, and semicond...

Inspection system by charged particle beam and method of manufactur...

Electron beam apparatus with detailed observation function and samp...

Substrate inspection apparatus, substrate inspection method and sem...

Substrate inspection apparatus, substrate inspection method and met...

Mask pattern inspection method, exposure condition verification met...

Substrate inspection method, manufacturing method of semiconductor...

Mapping-projection-type electron beam apparatus for inspecting samp...

Detecting apparatus and device manufacturing method

Electron beam inspection system and inspection method and method of...

Pattern matching method, program and semiconductor device manufactu...

Substrate inspection method, method of manufacturing semiconductor...

Defect inspection apparatus, program, and manufacturing method of s...

Electron beam apparatus and device manufacturing method using same

Electron beam apparatus with detailed observation function and samp...

Structure inspection method, pattern formation method, process cond...