Yuki Osada

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and control method
- Patent number 12,068,208
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Directional coupler for use in a substrate processing apparatus, wh...
- Patent number 11,569,558
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Isao Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electric field sensor, surface wave plasma source, and surface wave...
- Patent number 11,244,810
- Issue date Feb 8, 2022
- Tokyo Electron Limited
- Kiyoshi Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma probe device and plasma processing apparatus
- Patent number 11,164,730
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,152,269
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 10,971,413
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device with shower plate having protrusion for su...
- Patent number 10,557,200
- Issue date Feb 11, 2020
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Acquisition method for S-parameters in microwave introduction modul...
- Patent number 9,702,913
- Issue date Jul 11, 2017
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave radiation antenna, microwave plasma source and plasma pro...
- Patent number 9,548,187
- Issue date Jan 17, 2017
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuner, microwave plasma source and impedance matching method
- Patent number 9,520,273
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Yuki Osada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave emission mechanism, microwave plasma source and surface w...
- Patent number 9,520,272
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave introducing mechanism, microwave plasma source and microw...
- Patent number 9,281,154
- Issue date Mar 8, 2016
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electromagnetic-radiation power-supply mechanism for exciting a coa...
- Patent number 9,072,158
- Issue date Jun 30, 2015
- Tokyo Electron Limited
- Taro Ikeda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Surface wave plasma generating antenna and surface wave plasma proc...
- Patent number 8,945,342
- Issue date Feb 3, 2015
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tuner and microwave plasma source
- Patent number 8,308,898
- Issue date Nov 13, 2012
- Tokyo Electron Limited
- Shigeru Kasai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 8,163,128
- Issue date Apr 24, 2012
- Tokyo Electron Limited
- Shigeru Kasai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Magnetron control method, magnetron service life judgment method, m...
- Patent number 7,915,827
- Issue date Mar 29, 2011
- Tokyo Electron Limited
- Shigeru Kasai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 7,445,690
- Issue date Nov 4, 2008
- Tokyo Electron Limited
- Shigeru Kasai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Coaxial type impedance matching device and impedance detecting meth...
- Patent number 7,355,379
- Issue date Apr 8, 2008
- Tokyo Electron Limited
- Toshiaki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,226,524
- Issue date Jun 5, 2007
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coaxial type impedance matching device and impedance detecting meth...
- Patent number 7,176,634
- Issue date Feb 13, 2007
- Tokyo Electron Limited
- Toshiaki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coaxial type impedance matching device
- Patent number 6,856,211
- Issue date Feb 15, 2005
- Nagano Japan Radio Co., Ltd.
- Fumio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coaxial type impedance matching device and impedance detecting meth...
- Patent number 6,819,052
- Issue date Nov 16, 2004
- Nagano Japan Radio Co., Ltd.
- Toshiaki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Apparatus and Plasma Control Method
- Publication number 20240339304
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297020
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTOR AND PLASMA PROCESSING APPARATUS
- Publication number 20240297018
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20230033323
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20220005739
- Publication date Jan 6, 2022
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECTIONAL COUPLER, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE...
- Publication number 20210234248
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Isao TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRIC FIELD SENSOR, SURFACE WAVE PLASMA SOURCE, AND SURFACE WAVE...
- Publication number 20200365371
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Kiyoshi MORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROBE DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190074166
- Publication date Mar 7, 2019
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20180301388
- Publication date Oct 18, 2018
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20180301387
- Publication date Oct 18, 2018
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNER, MICROWAVE PLASMA SOURCE AND IMPEDANCE MATCHING METHOD
- Publication number 20160276139
- Publication date Sep 22, 2016
- TOKYO ELECTRON LIMITED
- Yuki Osada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20160222516
- Publication date Aug 4, 2016
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPEDANCE MATCHING SLUG, IMPEDANCE MATCHING DEVICE, ELECTROMAGNETIC...
- Publication number 20150348758
- Publication date Dec 3, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki MIYASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACQUISITION METHOD FOR S-PARAMETERS IN MICROWAVE INTRODUCTION MODUL...
- Publication number 20150212127
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- G01 - MEASURING TESTING
Information Patent Application
MICROWAVE EMISSION MECHANISM, MICROWAVE PLASMA SOURCE AND SURFACE W...
- Publication number 20140361684
- Publication date Dec 11, 2014
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PRO...
- Publication number 20140158302
- Publication date Jun 12, 2014
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE IRRADIATION APPARATUS
- Publication number 20140034636
- Publication date Feb 6, 2014
- TOKYO ELECTRON LIMITED
- Nobuhiko YAMAMOTO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE EMITTING DEVICE AND SURFACE WAVE PLASMA PROCESSING APPARATUS
- Publication number 20130192760
- Publication date Aug 1, 2013
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE INTRODUCING MECHANISM, MICROWAVE PLASMA SOURCE AND MICROW...
- Publication number 20130180661
- Publication date Jul 18, 2013
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROMAGNETIC-RADIATION POWER-SUPPLY MECHANISM AND MICROWAVE INTR...
- Publication number 20120299671
- Publication date Nov 29, 2012
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE WAVE PLASMA GENERATING ANTENNA AND SURFACE WAVE PLASMA PROC...
- Publication number 20120222816
- Publication date Sep 6, 2012
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20120090782
- Publication date Apr 19, 2012
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TUNER AND MICROWAVE PLASMA SOURCE
- Publication number 20120067523
- Publication date Mar 22, 2012
- TOKYO ELECTRON LIMITED
- Shigeru KASAI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090041640
- Publication date Feb 12, 2009
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MAGNETRON CONTROL METHOD, MAGNETRON SERVICE LIFE JUDGMENT METHOD, M...
- Publication number 20080309239
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Coaxial type impedance matching device and impedance detecting meth...
- Publication number 20060144519
- Publication date Jul 6, 2006
- TOKYO ELECTRON LIMITED
- Toshiaki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050160987
- Publication date Jul 28, 2005
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Coaxial type impedance matching device and impedance detecting meth...
- Publication number 20050057164
- Publication date Mar 17, 2005
- Toshiaki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processor
- Publication number 20050034815
- Publication date Feb 17, 2005
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Coaxial type impedance matching device
- Publication number 20040023561
- Publication date Feb 5, 2004
- Fumio Yamada
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma processing apparatus and control method

Directional coupler for use in a substrate processing apparatus, wh...

Electric field sensor, surface wave plasma source, and surface wave...

Plasma probe device and plasma processing apparatus

Plasma processing apparatus and control method

Plasma processing apparatus and control method

Plasma processing device with shower plate having protrusion for su...

Acquisition method for S-parameters in microwave introduction modul...

Microwave radiation antenna, microwave plasma source and plasma pro...

Tuner, microwave plasma source and impedance matching method

Microwave emission mechanism, microwave plasma source and surface w...

Microwave introducing mechanism, microwave plasma source and microw...

Electromagnetic-radiation power-supply mechanism for exciting a coa...

Surface wave plasma generating antenna and surface wave plasma proc...

Tuner and microwave plasma source

Plasma processing apparatus

Magnetron control method, magnetron service life judgment method, m...

Plasma processing apparatus

Coaxial type impedance matching device and impedance detecting meth...

Plasma processing apparatus

Coaxial type impedance matching device and impedance detecting meth...

Coaxial type impedance matching device

Coaxial type impedance matching device and impedance detecting meth...

Patents Applicationslast 30 patents

Plasma Processing Apparatus and Plasma Control Method

PLASMA PROCESSING APPARATUS

DISTRIBUTOR AND PLASMA PROCESSING APPARATUS

PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

DIRECTIONAL COUPLER, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE...

ELECTRIC FIELD SENSOR, SURFACE WAVE PLASMA SOURCE, AND SURFACE WAVE...

PLASMA PROBE DEVICE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

TUNER, MICROWAVE PLASMA SOURCE AND IMPEDANCE MATCHING METHOD

PLASMA PROCESSING DEVICE

IMPEDANCE MATCHING SLUG, IMPEDANCE MATCHING DEVICE, ELECTROMAGNETIC...

ACQUISITION METHOD FOR S-PARAMETERS IN MICROWAVE INTRODUCTION MODUL...

MICROWAVE EMISSION MECHANISM, MICROWAVE PLASMA SOURCE AND SURFACE W...

MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PRO...

MICROWAVE IRRADIATION APPARATUS

MICROWAVE EMITTING DEVICE AND SURFACE WAVE PLASMA PROCESSING APPARATUS

MICROWAVE INTRODUCING MECHANISM, MICROWAVE PLASMA SOURCE AND MICROW...

ELECTROMAGNETIC-RADIATION POWER-SUPPLY MECHANISM AND MICROWAVE INTR...

SURFACE WAVE PLASMA GENERATING ANTENNA AND SURFACE WAVE PLASMA PROC...

MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

TUNER AND MICROWAVE PLASMA SOURCE

PLASMA PROCESSING APPARATUS

MAGNETRON CONTROL METHOD, MAGNETRON SERVICE LIFE JUDGMENT METHOD, M...

Coaxial type impedance matching device and impedance detecting meth...

Plasma processing apparatus

Coaxial type impedance matching device and impedance detecting meth...

Plasma processor

Coaxial type impedance matching device