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Ibaraki, JP
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last 30 patents
Information
Patent Grant
Exposure method and pattern data preparation system therefor, patte...
Patent number
5,757,409
Issue date
May 26, 1998
Hitachi, Ltd.
Yoshihiko Okamoto
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Exposure method and pattern data preparation system therefor, patte...
Patent number
5,557,314
Issue date
Sep 17, 1996
Hitachi, Ltd.
Yoshihiko Okamoto
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Charged particle beam exposure apparatus
Patent number
5,424,550
Issue date
Jun 13, 1995
Hitachi, Ltd.
Masamichi Kawano
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Electron beam lithography method and apparatus separating repetitiv...
Patent number
5,371,373
Issue date
Dec 6, 1994
Hitachi, Ltd.
Yukinobu Shibata
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Charged particle beam exposure apparatus
Patent number
5,281,827
Issue date
Jan 25, 1994
Hitachi, Ltd.
Masamichi Kawano
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Electron beam lithography using an aperture having an array of repe...
Patent number
5,250,812
Issue date
Oct 5, 1993
Hitachi, Ltd.
Fumio Murai
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Electron beam lithographic method
Patent number
5,206,517
Issue date
Apr 27, 1993
Hitachi, Ltd.
Yukinobu Shibata
B82 - NANO-TECHNOLOGY