Yukio Nishiyama

Person

Yokkaichi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming insulating film, method of manufacturing semicond...
- Patent number 7,446,061
- Issue date Nov 4, 2008
- Kabushiki Kaihsa Toshiba
- Hiroshi Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device with filling insulatin...
- Patent number 7,371,654
- Issue date May 13, 2008
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming ring and method of manufacturing semiconductor device
- Patent number 7,247,888
- Issue date Jul 24, 2007
- Kabushiki Kaisha Toshiba
- Hirotaka Ogihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,052,971
- Issue date May 30, 2006
- Kabushiki Kaisha Toshiba
- Yukio Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 6,951,807
- Issue date Oct 4, 2005
- Kabushiki Kaisha Toshiba
- Kei Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device with filling insulatin...
- Patent number 6,798,038
- Issue date Sep 28, 2004
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 6,646,351
- Issue date Nov 11, 2003
- Kabushiki Kaisha Toshiba
- Kei Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 6,153,509
- Issue date Nov 28, 2000
- Kabushiki Kaisha Toshiba
- Kei Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 5,641,581
- Issue date Jun 24, 1997
- Kabushiki Kaisha Toshiba
- Yukio Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming silicon oxide on a semiconductor
- Patent number 5,571,578
- Issue date Nov 5, 1996
- Kabushiki Kaisha Tohsiba
- Naruhiko Kaji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing silicon oxide film containing fluorine
- Patent number 5,429,995
- Issue date Jul 4, 1995
- Kabushiki Kaisha Toshiba
- Yukio Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for purifying crude olefin oxides
- Patent number 4,243,492
- Issue date Jan 6, 1981
- Showa Denko K.K.
- Toshio Yamamura
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Method of forming silicon oxide layer
- Publication number 20080009143
- Publication date Jan 10, 2008
- Nobuhide Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming insulating film, method of manufacturing semicond...
- Publication number 20070128865
- Publication date Jun 7, 2007
- Kabushiki Kaisha Toshiba
- Hiroshi Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device with filling insulatin...
- Publication number 20060189092
- Publication date Aug 24, 2006
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film forming ring and method of manufacturing semiconductor device
- Publication number 20050191811
- Publication date Sep 1, 2005
- Hirotaka Ogihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Manufacturing method of semiconductor device with filling insulatin...
- Publication number 20040173870
- Publication date Sep 9, 2004
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method thereof
- Publication number 20040072418
- Publication date Apr 15, 2004
- Kabushiki Kaisha Toshiba
- Kei Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device with filling insulatin...
- Publication number 20030052384
- Publication date Mar 20, 2003
- Kabushiki Kaisha Toshiba
- Atsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method thereof
- Publication number 20030020168
- Publication date Jan 30, 2003
- Kabushiki Kaisha Toshiba
- Kei Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20030022522
- Publication date Jan 30, 2003
- Yukio Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS

Yukio Nishiyama

Person

Patents Grantslast 30 patents

Method of forming insulating film, method of manufacturing semicond...

Manufacturing method of semiconductor device with filling insulatin...

Film forming ring and method of manufacturing semiconductor device

Method for manufacturing semiconductor device

Semiconductor device and manufacturing method thereof

Manufacturing method of semiconductor device with filling insulatin...

Semiconductor device and manufacturing method thereof

Method of manufacturing a semiconductor device

Semiconductor device

Method for forming silicon oxide on a semiconductor

Method of manufacturing silicon oxide film containing fluorine

Process for purifying crude olefin oxides

Patents Applicationslast 30 patents

Method of forming silicon oxide layer

Method of forming insulating film, method of manufacturing semicond...

Manufacturing method of semiconductor device with filling insulatin...

Film forming ring and method of manufacturing semiconductor device

Manufacturing method of semiconductor device with filling insulatin...

Semiconductor device and manufacturing method thereof

Manufacturing method of semiconductor device with filling insulatin...

Semiconductor device and manufacturing method thereof

Method for manufacturing semiconductor device