Yuko Kaimoto

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 7,465,529
- Issue date Dec 16, 2008
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 7,179,580
- Issue date Feb 20, 2007
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,790,589
- Issue date Sep 14, 2004
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,344,304
- Issue date Feb 5, 2002
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist with bleaching effect
- Patent number 6,120,977
- Issue date Sep 19, 2000
- Fujitsu Limited
- Yuko Kaimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,004,720
- Issue date Dec 21, 1999
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical amplification resist and a fabrication process of a semico...
- Patent number 5,660,969
- Issue date Aug 26, 1997
- Fujitsu Limited
- Yuko Kaimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and process for forming resist pattern
- Patent number 5,585,219
- Issue date Dec 17, 1996
- Fujitsu Limited
- Yuko Kaimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and process for forming resist pattern
- Patent number 5,585,222
- Issue date Dec 17, 1996
- Fujitsu Limited
- Yuko Kaimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition and process for forming res...
- Patent number 5,506,088
- Issue date Apr 9, 1996
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation material and pattern formation method
- Patent number 5,443,690
- Issue date Aug 22, 1995
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20070037090
- Publication date Feb 15, 2007
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20040202961
- Publication date Oct 14, 2004
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20020076645
- Publication date Jun 20, 2002
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yuko Kaimoto

Person

Patents Grantslast 30 patents

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern

Photoresist with bleaching effect

Radiation sensitive material and method for forming pattern

Chemical amplification resist and a fabrication process of a semico...

Resist composition and process for forming resist pattern

Resist composition and process for forming resist pattern

Chemically amplified resist composition and process for forming res...

Pattern formation material and pattern formation method

Patents Applicationslast 30 patents

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern