Yunsang Kim

Person

Monte Sereno, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Atomic layer etch and deposition processing systems including a len...
- Patent number 11,984,330
- Issue date May 14, 2024
- Lam Research Corporation
- Dong Woo Paeng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lower plasma-exclusion-zone rings for a bevel etcher
- Patent number 10,832,923
- Issue date Nov 10, 2020
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper plasma-exclusion-zone rings for a bevel etcher
- Patent number 10,811,282
- Issue date Oct 20, 2020
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to form ultrashallow junctions using atomic layer deposition...
- Patent number 10,770,297
- Issue date Sep 8, 2020
- Lam Research Corporation
- Yunsang S. Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge exclusion control with adjustable plasma exclusion zone ring
- Patent number 10,748,747
- Issue date Aug 18, 2020
- Lam Research Corporation
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma assisted doping on germanium
- Patent number 10,714,345
- Issue date Jul 14, 2020
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of bevel etch film profile using plasma exclusion zone ring...
- Patent number 10,629,458
- Issue date Apr 21, 2020
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antimony co-doping with phosphorus to form ultrashallow junctions u...
- Patent number 10,522,354
- Issue date Dec 31, 2019
- Lam Research Corporation
- Yunsang S. Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma assisted doping on germanium
- Patent number 10,431,462
- Issue date Oct 1, 2019
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isotropic etching of film with atomic layer control
- Patent number 10,224,212
- Issue date Mar 5, 2019
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangements for manipulating plasma confinement within a plasma pr...
- Patent number 10,217,610
- Issue date Feb 26, 2019
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rare earth metal surface-activated plasma doping on semiconductor s...
- Patent number 10,068,981
- Issue date Sep 4, 2018
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Back side deposition apparatus and applications
- Patent number 9,881,788
- Issue date Jan 30, 2018
- Lam Research Corporation
- Yunsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for processing bevel edge etching
- Patent number 9,564,308
- Issue date Feb 7, 2017
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for forming ultra-shallow junctions
- Patent number 9,543,150
- Issue date Jan 10, 2017
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chamber for bevel edge processing
- Patent number 9,281,166
- Issue date Mar 8, 2016
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangements for manipulating plasma confinement within a plasma pr...
- Patent number 9,275,838
- Issue date Mar 1, 2016
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge electrodes with dielectric covers
- Patent number 9,184,043
- Issue date Nov 10, 2015
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable bevel etcher
- Patent number 9,053,925
- Issue date Jun 9, 2015
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for detecting plasma unconfinement
- Patent number 8,852,384
- Issue date Oct 7, 2014
- Lam Research Corporation
- KeeChan Kim
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing chamber for bevel edge processing
- Patent number 8,673,111
- Issue date Mar 18, 2014
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing bevel edge
- Patent number 8,562,750
- Issue date Oct 22, 2013
- Lam Research Corporation
- Jack Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing bevel protective film
- Patent number 8,501,283
- Issue date Aug 6, 2013
- Lam Research Corporation
- Neungho Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-K damage avoidance during bevel etch processing
- Patent number 8,500,951
- Issue date Aug 6, 2013
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chamber for bevel edge processing
- Patent number 8,440,051
- Issue date May 14, 2013
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for preventing corrosion of plasma-exposed yttria-coated co...
- Patent number 8,430,970
- Issue date Apr 30, 2013
- Lam Research Corporation
- Ganapathy Swami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bevel plasma treatment to enhance wet edge clean
- Patent number 8,414,790
- Issue date Apr 9, 2013
- Lam Research Corporation
- Andrew D. Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of bevel etch film profile using plasma exclusion zone ring...
- Patent number 8,398,778
- Issue date Mar 19, 2013
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for controlling bevel edge etching in a plasma chamber
- Patent number 8,349,202
- Issue date Jan 8, 2013
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure bevel etch process
- Patent number 8,323,523
- Issue date Dec 4, 2012
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METAL ATOMIC LAYER ETCH AND DEPOSITION APPARATUSES AND PROCESSES WI...
- Publication number 20220084838
- Publication date Mar 17, 2022
- He ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCH SYSTEMS FOR SELECTIVELY ETCHING WITH HALOGEN-BASE...
- Publication number 20220005740
- Publication date Jan 6, 2022
- LAM RESEARCH CORPORATION
- Dong Woo PAENG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ATOMIC LAYER ETCH AND DEPOSITION PROCESSING SYSTEMS INCLUDING A LEN...
- Publication number 20210143032
- Publication date May 13, 2021
- LAM RESEARCH CORPORATION
- Dong Woo PAENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTIMONY CO-DOPING WITH PHOSPHORUS TO FORM ULTRASHALLOW JUNCTIONS U...
- Publication number 20200126795
- Publication date Apr 23, 2020
- LAM RESEARCH CORPORATION
- Yunsang S. KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ASSISTED DOPING ON GERMANIUM
- Publication number 20200020537
- Publication date Jan 16, 2020
- LAM RESEARCH CORPORATION
- Yunsang KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTIMONY CO-DOPING WITH PHOSPHORUS TO FORM ULTRASHALLOW JUNCTIONS U...
- Publication number 20180358228
- Publication date Dec 13, 2018
- LAM RESEARCH CORPORATION
- Yunsang S. KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ASSISTED DOPING ON GERMANIUM
- Publication number 20180233365
- Publication date Aug 16, 2018
- LAM RESEARCH CORPORATION
- Yunsang KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOTROPIC ETCHING OF FILM WITH ATOMIC LAYER CONTROL
- Publication number 20180218915
- Publication date Aug 2, 2018
- LAM RESEARCH CORPORATION
- Yunsang KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER PLASMA-EXCLUSION-ZONE RINGS FOR A BEVEL ETCHER
- Publication number 20170301566
- Publication date Oct 19, 2017
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER PLASMA-EXCLUSION-ZONE RINGS FOR A BEVEL ETCHER
- Publication number 20170301565
- Publication date Oct 19, 2017
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RARE EARTH METAL SURFACE-ACTIVATED PLASMA DOPING ON SEMICONDUCTOR S...
- Publication number 20170256622
- Publication date Sep 7, 2017
- LAM RESEARCH CORPORATION
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...
- Publication number 20170256393
- Publication date Sep 7, 2017
- LAM RESEARCH CORPORATION
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL DOPING USING DOPANT GAS ON HYDROGEN PLASMA TREATED SURFACE
- Publication number 20170170018
- Publication date Jun 15, 2017
- LAM RESEARCH CORPORATION
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR FORMING ULTRA-SHALLOW JUNCTIONS
- Publication number 20160365251
- Publication date Dec 15, 2016
- LAM RESEARCH CORPORATION
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Arrangements for Manipulating Plasma Confinement Within a Plasma Pr...
- Publication number 20160126070
- Publication date May 5, 2016
- LAM RESEARCH CORPORATION
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Processing Bevel Edge Etching
- Publication number 20160064215
- Publication date Mar 3, 2016
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACK SIDE DEPOSITION APPARATUS AND APPLICATIONS
- Publication number 20150340225
- Publication date Nov 26, 2015
- LAM RESEARCH CORPORATION
- Yunsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR FORMING PATTERNED COPPER LINES THROUGH ELECTR...
- Publication number 20150034589
- Publication date Feb 5, 2015
- LAM RESEARCH CORPORATION
- Alan Lee
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...
- Publication number 20150020848
- Publication date Jan 22, 2015
- LAM RESEARCH CORPORATION
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING CHAMBER FOR BEVEL EDGE PROCESSING
- Publication number 20140174661
- Publication date Jun 26, 2014
- LAM RESEARCH CORPORATION
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COPPER DISCOLORATION PREVENTION FOLLOWING BEVEL ETCH PROCESS
- Publication number 20140051255
- Publication date Feb 20, 2014
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR BEVEL EDGE CLEANING IN A PLASMA PROCESSIN...
- Publication number 20140007901
- Publication date Jan 9, 2014
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENT FOR DEPOSITING BEVEL PROTECTIVE FILM
- Publication number 20130312913
- Publication date Nov 28, 2013
- Neungho Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-K DAMAGE AVOIDANCE DURING BEVEL ETCH PROCESSING
- Publication number 20130299089
- Publication date Nov 14, 2013
- Yunsang KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF BEVEL ETCH FILM PROFILE USING PLASMA EXCLUSION ZONE RING...
- Publication number 20130264015
- Publication date Oct 10, 2013
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING CHAMBER FOR BEVEL EDGE PROCESSING
- Publication number 20130233490
- Publication date Sep 12, 2013
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Detecting Plasma Unconfinement
- Publication number 20120305189
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- KeeChan Kim
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR DEPOSITING BEVEL PROTECTIVE FILM
- Publication number 20120094502
- Publication date Apr 19, 2012
- Neungho Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Controlling Bevel Edge Etching in a Plasma Chamber
- Publication number 20120074099
- Publication date Mar 29, 2012
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Preventing Corrosion of Plasma-Exposed Yttria-Coated Co...
- Publication number 20120031426
- Publication date Feb 9, 2012
- LAM RESEARCH CORPORATION
- Ganapathy Swami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yunsang Kim

Person

Patents Grantslast 30 patents

Atomic layer etch and deposition processing systems including a len...

Lower plasma-exclusion-zone rings for a bevel etcher

Upper plasma-exclusion-zone rings for a bevel etcher

Method to form ultrashallow junctions using atomic layer deposition...

Edge exclusion control with adjustable plasma exclusion zone ring

Plasma assisted doping on germanium

Control of bevel etch film profile using plasma exclusion zone ring...

Antimony co-doping with phosphorus to form ultrashallow junctions u...

Plasma assisted doping on germanium

Isotropic etching of film with atomic layer control

Arrangements for manipulating plasma confinement within a plasma pr...

Rare earth metal surface-activated plasma doping on semiconductor s...

Back side deposition apparatus and applications

Methods for processing bevel edge etching

Systems and methods for forming ultra-shallow junctions

Plasma processing chamber for bevel edge processing

Arrangements for manipulating plasma confinement within a plasma pr...

Edge electrodes with dielectric covers

Configurable bevel etcher

Method and apparatus for detecting plasma unconfinement

Plasma processing chamber for bevel edge processing

Method and apparatus for processing bevel edge

Methods for depositing bevel protective film

Low-K damage avoidance during bevel etch processing

Plasma processing chamber for bevel edge processing

Methods for preventing corrosion of plasma-exposed yttria-coated co...

Bevel plasma treatment to enhance wet edge clean

Control of bevel etch film profile using plasma exclusion zone ring...

Methods for controlling bevel edge etching in a plasma chamber

High pressure bevel etch process

Patents Applicationslast 30 patents

METAL ATOMIC LAYER ETCH AND DEPOSITION APPARATUSES AND PROCESSES WI...

ATOMIC LAYER ETCH SYSTEMS FOR SELECTIVELY ETCHING WITH HALOGEN-BASE...

ATOMIC LAYER ETCH AND DEPOSITION PROCESSING SYSTEMS INCLUDING A LEN...

ANTIMONY CO-DOPING WITH PHOSPHORUS TO FORM ULTRASHALLOW JUNCTIONS U...

PLASMA ASSISTED DOPING ON GERMANIUM

ANTIMONY CO-DOPING WITH PHOSPHORUS TO FORM ULTRASHALLOW JUNCTIONS U...

PLASMA ASSISTED DOPING ON GERMANIUM

ISOTROPIC ETCHING OF FILM WITH ATOMIC LAYER CONTROL

LOWER PLASMA-EXCLUSION-ZONE RINGS FOR A BEVEL ETCHER

UPPER PLASMA-EXCLUSION-ZONE RINGS FOR A BEVEL ETCHER

RARE EARTH METAL SURFACE-ACTIVATED PLASMA DOPING ON SEMICONDUCTOR S...

Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...

CONFORMAL DOPING USING DOPANT GAS ON HYDROGEN PLASMA TREATED SURFACE

SYSTEMS AND METHODS FOR FORMING ULTRA-SHALLOW JUNCTIONS

Arrangements for Manipulating Plasma Confinement Within a Plasma Pr...

Methods for Processing Bevel Edge Etching

BACK SIDE DEPOSITION APPARATUS AND APPLICATIONS

SYSTEM AND METHOD FOR FORMING PATTERNED COPPER LINES THROUGH ELECTR...

Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...

PLASMA PROCESSING CHAMBER FOR BEVEL EDGE PROCESSING

COPPER DISCOLORATION PREVENTION FOLLOWING BEVEL ETCH PROCESS

METHODS AND APPARATUS FOR BEVEL EDGE CLEANING IN A PLASMA PROCESSIN...

ARRANGEMENT FOR DEPOSITING BEVEL PROTECTIVE FILM

LOW-K DAMAGE AVOIDANCE DURING BEVEL ETCH PROCESSING

CONTROL OF BEVEL ETCH FILM PROFILE USING PLASMA EXCLUSION ZONE RING...

PLASMA PROCESSING CHAMBER FOR BEVEL EDGE PROCESSING

Method and Apparatus for Detecting Plasma Unconfinement

METHODS FOR DEPOSITING BEVEL PROTECTIVE FILM

Methods for Controlling Bevel Edge Etching in a Plasma Chamber

Methods For Preventing Corrosion of Plasma-Exposed Yttria-Coated Co...