Yusuke Hirayama

Person

Miyagi-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection method and plasma processing apparatus
- Patent number 11,705,313
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wastage determination method and plasma processing apparatus
- Patent number 11,183,374
- Issue date Nov 23, 2021
- Tokyo Electron Limited
- Shu Kusano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wastage determination method and plasma processing apparatus
- Patent number 10,763,089
- Issue date Sep 1, 2020
- Tokyo Electron Limited
- Shu Kusano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,290,476
- Issue date May 14, 2019
- Tokyo Electron Limited
- Yusuke Hirayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,068,778
- Issue date Sep 4, 2018
- Tokyo Electron Limited
- Yusuke Hirayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 8,975,188
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,975,191
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Kazuhito Tohnoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method, and program and storage...
- Patent number 8,821,683
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,716,144
- Issue date May 6, 2014
- Tokyo Electron Limited
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device using anisotropic etc...
- Patent number 8,664,117
- Issue date Mar 4, 2014
- Tokyo Electron Limited
- Katsuyuki Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,558,134
- Issue date Oct 15, 2013
- Tokyo Electron Limited
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching device
- Patent number 8,114,245
- Issue date Feb 14, 2012
- Tokyo Electron Limited
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and high-rate plasma etching apparatus
- Patent number 7,682,978
- Issue date Mar 23, 2010
- Tokyo Electron Limited
- Koji Maruyama
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Processing method for conservation of processing gases
- Patent number 7,628,931
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Masashi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and computer-readable storage medium
- Patent number 7,405,162
- Issue date Jul 29, 2008
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching device
- Patent number 6,585,851
- Issue date Jul 1, 2003
- Tokyo Electron Limited
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel plate sputtering device with RF powered auxiliary electrod...
- Patent number 6,153,068
- Issue date Nov 28, 2000
- Ohmi; Tadahiro
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
INSPECTION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210280401
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Yusuke HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200350148
- Publication date Nov 5, 2020
- TOKYO ELECTRON LIMITED
- Shu KUSANO
- B08 - CLEANING
Information Patent Application
WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190378698
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Shu KUSANO
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20170316919
- Publication date Nov 2, 2017
- TOKYO ELECTRON LIMITED
- Yusuke HIRAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20170076956
- Publication date Mar 16, 2017
- TOKYO ELECTRON LIMITED
- Yusuke HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20140134846
- Publication date May 15, 2014
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20140045338
- Publication date Feb 13, 2014
- TOKYO ELECTRON LIMITED
- Kazuhito Tohnoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130052821
- Publication date Feb 28, 2013
- TOKYO ELECTRON LIMITED
- Katsuyuki Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120238098
- Publication date Sep 20, 2012
- TOKYO ELECTRON LIMITED
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20090242520
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Yusuke HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READAB...
- Publication number 20090221148
- Publication date Sep 3, 2009
- TOKYO ELECTRON LIMITED
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and high-rate plasma etching apparatus
- Publication number 20060289296
- Publication date Dec 28, 2006
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Substrate processing apparatus and method, and program and storage...
- Publication number 20060243389
- Publication date Nov 2, 2006
- TOKYO ELECTRON LIMITED
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and computer-readable storage medium
- Publication number 20060063385
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing method for conservation of processing gases
- Publication number 20050279731
- Publication date Dec 22, 2005
- TOKYO ELECTRON LIMITED
- Masashi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching device
- Publication number 20030121609
- Publication date Jul 3, 2003
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS

Yusuke Hirayama

Person

Patents Grantslast 30 patents

Inspection method and plasma processing apparatus

Wastage determination method and plasma processing apparatus

Wastage determination method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma etching method

Plasma etching method

Substrate processing apparatus and method, and program and storage...

Method for manufacturing semiconductor device

Method for manufacturing semiconductor device using anisotropic etc...

Plasma processing apparatus and plasma processing method

Plasma etching device

Plasma processing method and high-rate plasma etching apparatus

Processing method for conservation of processing gases

Etching method and computer-readable storage medium

Plasma etching device

Parallel plate sputtering device with RF powered auxiliary electrod...

Patents Applicationslast 30 patents

INSPECTION METHOD AND PLASMA PROCESSING APPARATUS

WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS

WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD

PLASMA ETCHING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READAB...

Plasma processing method and high-rate plasma etching apparatus

Substrate processing apparatus and method, and program and storage...

Etching method and computer-readable storage medium

Processing method for conservation of processing gases

Plasma etching device