Yuta Takeda

Person

Ube-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing tungsten hexafluoride
- Patent number 12,145,857
- Issue date Nov 19, 2024
- Central Glass Company, Limited
- Akiou Kikuchi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for purifying fluorine compound gas
- Patent number 10,926,211
- Issue date Feb 23, 2021
- Central Glass Company, Limited
- Akifumi Yao
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, subs...
- Patent number 10,156,012
- Issue date Dec 18, 2018
- Kokusai Electric Corporation
- Kenji Kameda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry cleaning method of substrate processing apparatus
- Patent number 8,562,751
- Issue date Oct 22, 2013
- Tokyo Electron Limited
- Isao Gunji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Method for Producing Tungsten Hexafluoride
- Publication number 20210253442
- Publication date Aug 19, 2021
- Central Glass Company, Limited
- Akiou KIKUCHI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Method for Purifying Fluorine Compound Gas
- Publication number 20190046917
- Publication date Feb 14, 2019
- Central Glass Company, Limited
- Akifumi YAO
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method for Purifying Fluorine Gas
- Publication number 20190047858
- Publication date Feb 14, 2019
- Central Glass Company, Limited
- Akifumi YAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBS...
- Publication number 20180057936
- Publication date Mar 1, 2018
- Hitachi Kokusai Electric Inc.
- Kenji KAMEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Dry-Cleaning Metal Film in Film-Formation Apparatus
- Publication number 20150047680
- Publication date Feb 19, 2015
- Central Glass Company, Limited
- Tomonori Umezaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCHING METHOD, DRY ETCHING APPARATUS, METAL FILM, AND DEVICE I...
- Publication number 20140352716
- Publication date Dec 4, 2014
- CENTRAL GLASS COMPANY, LIMITED
- Akiou KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dry Cleaning Method
- Publication number 20130333729
- Publication date Dec 19, 2013
- Central Glass Company, Limited
- Tomonori Umezaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALOGEN-CONTAINING GAS SUPPLY APPARATUS AND HALOGEN-CONTAINING GAS...
- Publication number 20130221024
- Publication date Aug 29, 2013
- Central Glass Company, Limited
- Akifumi Yao
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
DRY CLEANING METHOD OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20120180811
- Publication date Jul 19, 2012
- Central Glass Company, Limited
- Isao GUNJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yuta Takeda

Person

Patents Grantslast 30 patents

Method for producing tungsten hexafluoride

Method for purifying fluorine compound gas

Cleaning method, method of manufacturing semiconductor device, subs...

Dry cleaning method of substrate processing apparatus

Patents Applicationslast 30 patents

Method for Producing Tungsten Hexafluoride

Method for Purifying Fluorine Compound Gas

Method for Purifying Fluorine Gas

CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBS...

Method for Dry-Cleaning Metal Film in Film-Formation Apparatus

DRY ETCHING METHOD, DRY ETCHING APPARATUS, METAL FILM, AND DEVICE I...

Dry Cleaning Method

HALOGEN-CONTAINING GAS SUPPLY APPARATUS AND HALOGEN-CONTAINING GAS...

DRY CLEANING METHOD OF SUBSTRATE PROCESSING APPARATUS