Yutaka FUJINO

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning method and plasma treatment device
- Patent number 12,129,544
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yoshiyuki Kondo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,112,921
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Hiroyuki Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 12,077,865
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Hideki Yuasa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 12,060,641
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming hard mask film and method for manu...
- Patent number 10,879,069
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Yutaka Fujino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and gas introduction mechanism
- Patent number 10,804,078
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Yutaka Fujino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device with shower plate having protrusion for su...
- Patent number 10,557,200
- Issue date Feb 11, 2020
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source and plasma processing apparatus
- Patent number 10,211,032
- Issue date Feb 19, 2019
- Tokyo Electron Limited
- Tomohito Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system
- Patent number 10,170,347
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Yutaka Fujino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling threshold of transistor and method of manufac...
- Patent number 10,153,169
- Issue date Dec 11, 2018
- Tokyo Electron Limited
- Kentaro Shiraga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,991,097
- Issue date Jun 5, 2018
- Tokyo Electron Limited
- Tomohito Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing insulating film laminated structure
- Patent number 9,887,081
- Issue date Feb 6, 2018
- Tokyo Electron Limited
- Junya Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Acquisition method for S-parameters in microwave introduction modul...
- Patent number 9,702,913
- Issue date Jul 11, 2017
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and shower plate
- Patent number 9,663,856
- Issue date May 30, 2017
- Tokyo Electron Limited
- Shigeru Kasai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming insulating film and method for manufacturing sem...
- Patent number 9,640,388
- Issue date May 2, 2017
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave radiation antenna, microwave plasma source and plasma pro...
- Patent number 9,548,187
- Issue date Jan 17, 2017
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave emission mechanism, microwave plasma source and surface w...
- Patent number 9,520,272
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and microwave introduction device
- Patent number 8,961,735
- Issue date Feb 24, 2015
- Tokyo Electron Limited
- Yutaka Fujino
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming gate insulation film, semiconductor device, and c...
- Patent number 7,915,177
- Issue date Mar 29, 2011
- Toyko Electron Limited
- Tatsuo Nishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming gate insulating film, semiconductor device and co...
- Patent number 7,674,722
- Issue date Mar 9, 2010
- Tokyo Electron Limited
- Tatsuo Nishita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CLEANING METHOD AND PLASMA TREATMENT DEVICE
- Publication number 20230220545
- Publication date Jul 13, 2023
- TOKYO ELECTRON LIMITED
- Yoshiyuki KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230061151
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Hideki YUASA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230062105
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Makoto WADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20220235462
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220223378
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Hiroyuki IKUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING HARD MASK FILM AND METHOD FOR MANU...
- Publication number 20200035491
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Yutaka FUJINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180114677
- Publication date Apr 26, 2018
- TOKYO ELECTRON LIMITED
- Tomohito KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND GAS INTRODUCTION MECHANISM
- Publication number 20170309452
- Publication date Oct 26, 2017
- Yutaka FUJINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING THRESHOLD OF TRANSISTOR AND METHOD OF MANUFAC...
- Publication number 20170221716
- Publication date Aug 3, 2017
- Kentaro SHIRAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING INSULATING FILM LAMINATED STRUCTURE
- Publication number 20170170010
- Publication date Jun 15, 2017
- Junya MIYAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20170110349
- Publication date Apr 20, 2017
- TOKYO ELECTRON LIMITED
- Yutaka FUJINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...
- Publication number 20160240374
- Publication date Aug 18, 2016
- TOKYO ELECTRON LIMITED
- Shigeru KASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20160222516
- Publication date Aug 4, 2016
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ACQUISITION METHOD FOR S-PARAMETERS IN MICROWAVE INTRODUCTION MODUL...
- Publication number 20150212127
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- G01 - MEASURING TESTING
Information Patent Application
MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20150170881
- Publication date Jun 18, 2015
- TOKYO ELECTRON LIMITED
- Tomohito KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND MICROWAVE INTRODUCTION DEVICE
- Publication number 20150144265
- Publication date May 28, 2015
- TOKYO ELECTRON LIMITED
- Yutaka FUJINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE EMISSION MECHANISM, MICROWAVE PLASMA SOURCE AND SURFACE W...
- Publication number 20140361684
- Publication date Dec 11, 2014
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SHOWER PLATE
- Publication number 20140283747
- Publication date Sep 25, 2014
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PRO...
- Publication number 20140158302
- Publication date Jun 12, 2014
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MICROWAVE INTRODUCTION DEVICE
- Publication number 20120247676
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Yutaka FUJINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20110017706
- Publication date Jan 27, 2011
- TOKYO ELECTRON LIMITED
- Tetsuro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING GATE INSULATION FILM, SEMICONDUCTOR DEVICE, AND C...
- Publication number 20100130023
- Publication date May 27, 2010
- TOKYO ELECTRON LIMITED
- Tatsuo Nishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...
- Publication number 20090239364
- Publication date Sep 24, 2009
- TOKYO ELECTRON LIMITED
- Tatsuo Nishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming Gate Insulating Film, Semiconductor Device and Co...
- Publication number 20070290247
- Publication date Dec 20, 2007
- Tatsuo Nishita
- H01 - BASIC ELECTRIC ELEMENTS

Yutaka FUJINO

Person

Patents Grantslast 30 patents

Cleaning method and plasma treatment device

Plasma processing method and plasma processing apparatus

Film forming method and film forming apparatus

Film forming method and film forming apparatus

Method and apparatus for forming hard mask film and method for manu...

Plasma processing apparatus and gas introduction mechanism

Plasma processing device with shower plate having protrusion for su...

Microwave plasma source and plasma processing apparatus

Substrate processing system

Method of controlling threshold of transistor and method of manufac...

Plasma processing apparatus

Method for manufacturing insulating film laminated structure

Acquisition method for S-parameters in microwave introduction modul...

Plasma processing apparatus and shower plate

Method for forming insulating film and method for manufacturing sem...

Microwave radiation antenna, microwave plasma source and plasma pro...

Microwave emission mechanism, microwave plasma source and surface w...

Plasma processing apparatus and microwave introduction device

Method of forming gate insulation film, semiconductor device, and c...

Method of forming gate insulating film, semiconductor device and co...

Patents Applicationslast 30 patents

CLEANING METHOD AND PLASMA TREATMENT DEVICE

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR FORMING HARD MASK FILM AND METHOD FOR MANU...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND GAS INTRODUCTION MECHANISM

METHOD OF CONTROLLING THRESHOLD OF TRANSISTOR AND METHOD OF MANUFAC...

METHOD FOR MANUFACTURING INSULATING FILM LAMINATED STRUCTURE

SUBSTRATE PROCESSING SYSTEM

METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...

PLASMA PROCESSING DEVICE

ACQUISITION METHOD FOR S-PARAMETERS IN MICROWAVE INTRODUCTION MODUL...

MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND MICROWAVE INTRODUCTION DEVICE

MICROWAVE EMISSION MECHANISM, MICROWAVE PLASMA SOURCE AND SURFACE W...

PLASMA PROCESSING APPARATUS AND SHOWER PLATE

MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PRO...

PLASMA PROCESSING APPARATUS AND MICROWAVE INTRODUCTION DEVICE

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF FORMING GATE INSULATION FILM, SEMICONDUCTOR DEVICE, AND C...

METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...

Method of Forming Gate Insulating Film, Semiconductor Device and Co...