Yutaka Motoyama

Person

Iwate, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor device and substrate process...
- Patent number 12,131,947
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treatment apparatus and dummy substrate processing method
- Patent number 12,027,384
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Yutaka Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming silicon film and processing apparatus
- Patent number 11,851,752
- Issue date Dec 26, 2023
- Tokyo Electron Limited
- Akari Matsunaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhaust device, processing system, and processing method
- Patent number 11,807,938
- Issue date Nov 7, 2023
- Tokyo Electron Limited
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,587,787
- Issue date Feb 21, 2023
- Tokyo Electron Limited
- Yoshihiro Takezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and heat treatment apparatus
- Patent number 11,239,076
- Issue date Feb 1, 2022
- Tokyo Electron Limited
- Yutaka Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming polysilicon film and film forming apparatus
- Patent number 11,062,904
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Yutaka Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor film forming method and film forming apparatus
- Patent number 10,957,535
- Issue date Mar 23, 2021
- Tokyo Electron Limited
- Yutaka Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and film forming method
- Patent number 10,676,820
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus having ground electrode
- Patent number 9,970,111
- Issue date May 15, 2018
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Driving method of vertical heat treatment apparatus, storage medium...
- Patent number 9,776,202
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dummy wafer
- Patent number D786810
- Issue date May 16, 2017
- Tokyo Electron Limited
- Yutaka Motoyama
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Dummy wafer
- Patent number D785576
- Issue date May 2, 2017
- Tokyo Electron Limited
- Yutaka Motoyama
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Dummy wafer
- Patent number D784937
- Issue date Apr 25, 2017
- Tokyo Electron Limited
- Yutaka Motoyama
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Operating method of vertical heat treatment apparatus, storage medi...
- Patent number 9,487,859
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of operating vertical heat treatment apparatus, vertical hea...
- Patent number 9,373,498
- Issue date Jun 21, 2016
- Tokyo Electron Limited
- Keisuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,608,902
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...
- Publication number 20220384184
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON FILM AND PROCESSING APPARATUS
- Publication number 20220307128
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Akari MATSUNAGA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...
- Publication number 20220238374
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Yutaka Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...
- Publication number 20220189785
- Publication date Jun 16, 2022
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT TREATMENT APPARATUS AND DUMMY SUBSTRATE PROCESSING METHOD
- Publication number 20220148893
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20210202248
- Publication date Jul 1, 2021
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND HEAT TREATMENT APPARATUS
- Publication number 20200294800
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST DEVICE, PROCESSING SYSTEM, AND PROCESSING METHOD
- Publication number 20200248305
- Publication date Aug 6, 2020
- TOKYO ELECTRON LIMITED
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING POLYSILICON FILM AND FILM FORMING APPARATUS
- Publication number 20200161130
- Publication date May 21, 2020
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Film Forming Method and Film Forming Apparatus
- Publication number 20190348278
- Publication date Nov 14, 2019
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND FILM FORMING METHOD
- Publication number 20190144994
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Mitsuhiro OKADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Apparatus
- Publication number 20160024654
- Publication date Jan 28, 2016
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL...
- Publication number 20150376789
- Publication date Dec 31, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Apparatus Using Gas Nozzles
- Publication number 20150275368
- Publication date Oct 1, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPERATING METHOD OF VERTICAL HEAT TREATMENT APPARATUS, STORAGE MEDI...
- Publication number 20150267293
- Publication date Sep 24, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS, METHOD OF OPERATING VERTICAL HEA...
- Publication number 20150259799
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150007772
- Publication date Jan 8, 2015
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF OPERATING VERTICAL HEAT TREATMENT APPARATUS, VERTICAL HEA...
- Publication number 20140295676
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Keisuke SUZUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRIVING METHOD OF VERTICAL HEAT TREATMENT APPARATUS, STORAGE MEDIUM...
- Publication number 20140295082
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100186898
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yutaka Motoyama

Person

Patents Grantslast 30 patents

Method for manufacturing semiconductor device and substrate process...

Heat treatment apparatus and dummy substrate processing method

Method for forming silicon film and processing apparatus

Exhaust device, processing system, and processing method

Film forming method and film forming apparatus

Film forming method and heat treatment apparatus

Method of forming polysilicon film and film forming apparatus

Semiconductor film forming method and film forming apparatus

Cleaning method and film forming method

Substrate processing apparatus having ground electrode

Driving method of vertical heat treatment apparatus, storage medium...

Dummy wafer

Dummy wafer

Dummy wafer

Operating method of vertical heat treatment apparatus, storage medi...

Method of operating vertical heat treatment apparatus, vertical hea...

Plasma processing apparatus

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...

METHOD FOR FORMING SILICON FILM AND PROCESSING APPARATUS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...

HEAT TREATMENT APPARATUS AND DUMMY SUBSTRATE PROCESSING METHOD

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND HEAT TREATMENT APPARATUS

EXHAUST DEVICE, PROCESSING SYSTEM, AND PROCESSING METHOD

METHOD OF FORMING POLYSILICON FILM AND FILM FORMING APPARATUS

Semiconductor Film Forming Method and Film Forming Apparatus

CLEANING METHOD AND FILM FORMING METHOD

Film Forming Apparatus

VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL...

Film Forming Apparatus Using Gas Nozzles

OPERATING METHOD OF VERTICAL HEAT TREATMENT APPARATUS, STORAGE MEDI...

VERTICAL HEAT TREATMENT APPARATUS, METHOD OF OPERATING VERTICAL HEA...

SUBSTRATE PROCESSING APPARATUS

METHOD OF OPERATING VERTICAL HEAT TREATMENT APPARATUS, VERTICAL HEA...

DRIVING METHOD OF VERTICAL HEAT TREATMENT APPARATUS, STORAGE MEDIUM...

PLASMA PROCESSING APPARATUS