Yutaka Ohmoto

Person

Hikari, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and sample stage thereof
- Patent number 10,796,890
- Issue date Oct 6, 2020
- HITACHI HIGH-TECH CORPORATION
- Hironori Kusumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and sample stage thereof
- Patent number 10,141,165
- Issue date Nov 27, 2018
- Hitachi High-Technologies Corporation
- Hironori Kusumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,384,946
- Issue date Jul 5, 2016
- Hitachi High-Technologies Corporation
- Kohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and sample stage
- Patent number 9,150,967
- Issue date Oct 6, 2015
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,282,848
- Issue date Oct 9, 2012
- Hitachi High-Technologies Corporation
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method in plasma processing apparatus
- Patent number 8,092,637
- Issue date Jan 10, 2012
- Hitachi High-Technologies Corporation
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,608,162
- Issue date Oct 27, 2009
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method of organic insulating film
- Patent number 7,396,481
- Issue date Jul 8, 2008
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,288,166
- Issue date Oct 30, 2007
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processing method
- Patent number 7,122,479
- Issue date Oct 17, 2006
- Hitachi High-Technologies Corporation
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching aftertreatment method
- Patent number 7,026,252
- Issue date Apr 11, 2006
- Hitachi High-Technologies Corporation
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method of organic insulating film
- Patent number 7,014,787
- Issue date Mar 21, 2006
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of dry etching a sample and dry etching system
- Patent number 7,009,714
- Issue date Mar 7, 2006
- Hitachi High-Technologies Corporation
- Yutaka Ohmoto
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for plasma processing high-speed semiconductor...
- Patent number 6,867,144
- Issue date Mar 15, 2005
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method of organic insulating film
- Patent number 6,793,833
- Issue date Sep 21, 2004
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,759,338
- Issue date Jul 6, 2004
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma processing high-speed semiconductor...
- Patent number 6,649,021
- Issue date Nov 18, 2003
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma processing high-speed semiconductor circuits with...
- Patent number 6,413,876
- Issue date Jul 2, 2002
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-processing method and an apparatus for carrying out the same
- Patent number 6,328,845
- Issue date Dec 11, 2001
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND SAMPLE STAGE THEREOF
- Publication number 20190057846
- Publication date Feb 21, 2019
- Hitachi High-Technologies Corporation
- Hironori KUSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170025254
- Publication date Jan 26, 2017
- Hitachi High-Technologies Corporation
- Takumi TANDOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND SAMPLE STAGE THEREOF
- Publication number 20160155617
- Publication date Jun 2, 2016
- Hitachi High-Technologies Corporation
- Hironori KUSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SAMPLE STAGE THEREOF
- Publication number 20140216657
- Publication date Aug 7, 2014
- Hitachi High-Technologies Corporation
- Hironori KUSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130180662
- Publication date Jul 18, 2013
- Hitachi High-Technologies Corporation
- Kohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SAMPLE STAGE
- Publication number 20110297082
- Publication date Dec 8, 2011
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD IN PLASMA PROCESSING APPARATUS
- Publication number 20090218316
- Publication date Sep 3, 2009
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20080280451
- Publication date Nov 13, 2008
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20080236614
- Publication date Oct 2, 2008
- Hitachi High-Technologies Corporation
- Mamoru YAKUSHIJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA PROCESSING
- Publication number 20080237184
- Publication date Oct 2, 2008
- MAMORU YAKUSHIJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20080023145
- Publication date Jan 31, 2008
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method of organic insulating film
- Publication number 20060065624
- Publication date Mar 30, 2006
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20050011612
- Publication date Jan 20, 2005
- Mamoru Yakushiji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method of organic insulating film
- Publication number 20040182514
- Publication date Sep 23, 2004
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of dry etching a sample and dry etching system
- Publication number 20040165193
- Publication date Aug 26, 2004
- Yutaka Ohmoto
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing apparatus
- Publication number 20040149385
- Publication date Aug 5, 2004
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching aftertreatment method
- Publication number 20040147130
- Publication date Jul 29, 2004
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching processing method
- Publication number 20030234238
- Publication date Dec 25, 2003
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method of organic insulating film
- Publication number 20030052086
- Publication date Mar 20, 2003
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for plasma processing high-speed semiconductor...
- Publication number 20020127858
- Publication date Sep 12, 2002
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for plasma processing high-speed semiconductor...
- Publication number 20020025686
- Publication date Feb 28, 2002
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for plasma processing high-speed semiconductor...
- Publication number 20020023716
- Publication date Feb 28, 2002
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20010019881
- Publication date Sep 6, 2001
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS

Yutaka Ohmoto

Person

Patents Grantslast 30 patents

Plasma processing apparatus and sample stage thereof

Plasma processing apparatus and sample stage thereof

Plasma processing apparatus

Plasma processing apparatus and sample stage

Plasma processing method and plasma processing apparatus

Manufacturing method in plasma processing apparatus

Plasma processing apparatus and method

Etching method of organic insulating film

Plasma processing apparatus

Etching processing method

Etching aftertreatment method

Etching method of organic insulating film

Method of dry etching a sample and dry etching system

Apparatus and method for plasma processing high-speed semiconductor...

Etching method of organic insulating film

Plasma processing apparatus and method

Apparatus and method for plasma processing high-speed semiconductor...

Method for plasma processing high-speed semiconductor circuits with...

Plasma-processing method and an apparatus for carrying out the same

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND SAMPLE STAGE THEREOF

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND SAMPLE STAGE THEREOF

PLASMA PROCESSING APPARATUS AND SAMPLE STAGE THEREOF

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND SAMPLE STAGE

MANUFACTURING METHOD IN PLASMA PROCESSING APPARATUS

Plasma processing method and plasma processing apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD AND APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND METHOD

Etching method of organic insulating film

Plasma etching apparatus and plasma etching method

Etching method of organic insulating film

Method of dry etching a sample and dry etching system

Plasma processing apparatus

Etching aftertreatment method

Etching processing method

Etching method of organic insulating film

Apparatus and method for plasma processing high-speed semiconductor...

Apparatus and method for plasma processing high-speed semiconductor...

Apparatus and method for plasma processing high-speed semiconductor...

Plasma processing apparatus and method