Yuxiang May Wang

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication of a high fill ratio silicon spatial light modulator
- Patent number 8,908,255
- Issue date Dec 9, 2014
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Grant
Method and apparatus for MEMS oscillator
- Patent number 8,530,258
- Issue date Sep 10, 2013
- Miradia Inc.
- Xiao Yang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method and system for optical MEMS with flexible landing structures
- Patent number 8,314,984
- Issue date Nov 20, 2012
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Grant
Fabrication of a high fill ratio silicon spatial light modulator
- Patent number 8,159,740
- Issue date Apr 17, 2012
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Grant
Method and apparatus for MEMS oscillator
- Patent number 8,119,432
- Issue date Feb 21, 2012
- Miradia Inc.
- Xiao Yang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method and system for overlay correction during photolithography
- Patent number 8,105,736
- Issue date Jan 31, 2012
- Miradia Inc.
- Xiao Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for MEMS oscillator
- Patent number 7,863,697
- Issue date Jan 4, 2011
- Miradia Inc.
- Xiao Yang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method and structure for manufacturing bonded substrates using mult...
- Patent number 7,678,288
- Issue date Mar 16, 2010
- Miradia Inc.
- Xiao Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a high fill ratio silicon spatial light modulator
- Patent number 7,675,670
- Issue date Mar 9, 2010
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Grant
Method of depositing an amorphous carbon film for etch hardmask app...
- Patent number 7,638,440
- Issue date Dec 29, 2009
- Applied Materials, Inc.
- Yuxiang May Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High fill ratio silicon spatial light modulator
- Patent number 7,522,330
- Issue date Apr 21, 2009
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Grant
Projection display system including a high fill ratio silicon spati...
- Patent number 7,453,624
- Issue date Nov 18, 2008
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Grant
Liquid precursors for the CVD deposition of amorphous carbon films
- Patent number 7,407,893
- Issue date Aug 5, 2008
- Applied Materials, Inc.
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing an amorphous carbon layer
- Patent number 7,335,462
- Issue date Feb 26, 2008
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photolithography scheme using a silicon containing resist
- Patent number 7,332,262
- Issue date Feb 19, 2008
- Applied Materials, Inc.
- Ian Latchford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing an amorphous carbon layer
- Patent number 7,223,526
- Issue date May 29, 2007
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitrogen-free dielectric anti-reflective coating and hardmask
- Patent number 7,105,460
- Issue date Sep 12, 2006
- Applied Materials
- Bok Hoen Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photolithography scheme using a silicon containing resist
- Patent number 6,967,072
- Issue date Nov 22, 2005
- Applied Materials, Inc.
- Ian Latchford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen-free dielectric anti-reflective coating and hardmask
- Patent number 6,927,178
- Issue date Aug 9, 2005
- Applied Materials, Inc.
- Bok Hoen Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing an amorphous carbon layer
- Patent number 6,841,341
- Issue date Jan 11, 2005
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing an amorphous carbon layer
- Patent number 6,573,030
- Issue date Jun 3, 2003
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FABRICATION OF A HIGH FILL RATIO SILICON SPATIAL LIGHT MODULATOR
- Publication number 20120171623
- Publication date Jul 5, 2012
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR MEMS OSCILLATOR
- Publication number 20120034724
- Publication date Feb 9, 2012
- Miradia Inc.
- Xiao Yang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHOD AND APPARATUS FOR MEMS OSCILLATOR
- Publication number 20110059565
- Publication date Mar 10, 2011
- Miradia Inc.
- Xiao Yang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
FABRICATION OF A HIGH FILL RATIO SILICON SPATIAL LIGHT MODULATOR
- Publication number 20100112492
- Publication date May 6, 2010
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Application
METHOD AND SYSTEM FOR OVERLAY CORRECTION DURING PHOTOLITHOGRAPHY
- Publication number 20090233244
- Publication date Sep 17, 2009
- Miradia Inc.
- Xiao Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR OPTICAL MEMS WITH FLEXIBLE LANDING STRUCTURES
- Publication number 20090231671
- Publication date Sep 17, 2009
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Application
PROJECTION DISPLAY SYSTEM INCLUDING A HIGH FILL RATIO SILICON SPATI...
- Publication number 20090002805
- Publication date Jan 1, 2009
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Application
Etch pattern definition using a CVD organic layer as an anti-reflec...
- Publication number 20080197109
- Publication date Aug 21, 2008
- Applied Materials, Inc.
- David S. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR WAFER LEVEL PACKAGING OF MEMS STRUCTURES
- Publication number 20080164542
- Publication date Jul 10, 2008
- Miradia Inc.
- Xiao Yang
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR MEMS OSCILLATOR
- Publication number 20080150647
- Publication date Jun 26, 2008
- Miradia Inc.
- Xiao Yang
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHOD OF DEPOSITING AN AMORPHOUS CARBON LAYER
- Publication number 20070128538
- Publication date Jun 7, 2007
- APPLIED MATERIALS, INC.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Projection display system including a high fill ratio silicon spati...
- Publication number 20070097486
- Publication date May 3, 2007
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Application
Fabrication of a high fill ratio silicon spatial light modulator
- Publication number 20070097485
- Publication date May 3, 2007
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Application
High fill ratio silicon spatial light modulator
- Publication number 20070097487
- Publication date May 3, 2007
- Miradia Inc.
- Xiao Yang
- G02 - OPTICS
Information Patent Application
Method and structure for manufacturing bonded substrates using mult...
- Publication number 20060121373
- Publication date Jun 8, 2006
- Miradia Inc.
- Xiao Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid precursors for the CVD deposition of amorphous carbon films
- Publication number 20050287771
- Publication date Dec 29, 2005
- APPLIED MATERIALS, INC.
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photolithography scheme using a silicon containing resist
- Publication number 20050233257
- Publication date Oct 20, 2005
- APPLIED MATERIALS, INC.
- Ian Latchford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of depositing an amorphous carbon film for metal etch hardma...
- Publication number 20050199585
- Publication date Sep 15, 2005
- APPLIED MATERIALS, INC.
- Yuxiang May Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of depositing an amorphous carbon film for etch hardmask app...
- Publication number 20050202683
- Publication date Sep 15, 2005
- APPLIED MATERIALS, INC.
- Yuxiang May Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of depositing an amrphous carbon layer
- Publication number 20050112509
- Publication date May 26, 2005
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Nitrogen-free dielectric anti-reflective coating and hardmask
- Publication number 20040214446
- Publication date Oct 28, 2004
- APPLIED MATERIALS, INC.
- Bok Hoen Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Nitrogen-free dielectric anti-reflective coating and hardmask
- Publication number 20040009676
- Publication date Jan 15, 2004
- APPLIED MATERIALS, INC.
- Bok Hoen Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of depositing an amorphous carbon layer
- Publication number 20030091938
- Publication date May 15, 2003
- APPLIED MATERIALS, INC.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etch pattern definition using a CVD organic layer as an anti-reflec...
- Publication number 20020086547
- Publication date Jul 4, 2002
- APPLIED MATERIALS, INC.
- David S. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photolithography scheme using a silicon containing resist
- Publication number 20020001778
- Publication date Jan 3, 2002
- APPLIED MATERIALS, INC.
- Ian Latchford
- H01 - BASIC ELECTRIC ELEMENTS

Yuxiang May Wang

Person

Patents Grantslast 30 patents

Fabrication of a high fill ratio silicon spatial light modulator

Method and apparatus for MEMS oscillator

Method and system for optical MEMS with flexible landing structures

Fabrication of a high fill ratio silicon spatial light modulator

Method and apparatus for MEMS oscillator

Method and system for overlay correction during photolithography

Method and apparatus for MEMS oscillator

Method and structure for manufacturing bonded substrates using mult...

Fabrication of a high fill ratio silicon spatial light modulator

Method of depositing an amorphous carbon film for etch hardmask app...

High fill ratio silicon spatial light modulator

Projection display system including a high fill ratio silicon spati...

Liquid precursors for the CVD deposition of amorphous carbon films

Method of depositing an amorphous carbon layer

Photolithography scheme using a silicon containing resist

Method of depositing an amorphous carbon layer

Nitrogen-free dielectric anti-reflective coating and hardmask

Photolithography scheme using a silicon containing resist

Nitrogen-free dielectric anti-reflective coating and hardmask

Method of depositing an amorphous carbon layer

Method for depositing an amorphous carbon layer

Patents Applicationslast 30 patents

FABRICATION OF A HIGH FILL RATIO SILICON SPATIAL LIGHT MODULATOR

METHOD AND APPARATUS FOR MEMS OSCILLATOR

METHOD AND APPARATUS FOR MEMS OSCILLATOR

FABRICATION OF A HIGH FILL RATIO SILICON SPATIAL LIGHT MODULATOR

METHOD AND SYSTEM FOR OVERLAY CORRECTION DURING PHOTOLITHOGRAPHY

METHOD AND SYSTEM FOR OPTICAL MEMS WITH FLEXIBLE LANDING STRUCTURES

PROJECTION DISPLAY SYSTEM INCLUDING A HIGH FILL RATIO SILICON SPATI...

Etch pattern definition using a CVD organic layer as an anti-reflec...

METHODS AND SYSTEMS FOR WAFER LEVEL PACKAGING OF MEMS STRUCTURES

METHOD AND APPARATUS FOR MEMS OSCILLATOR

METHOD OF DEPOSITING AN AMORPHOUS CARBON LAYER

Projection display system including a high fill ratio silicon spati...

Fabrication of a high fill ratio silicon spatial light modulator

High fill ratio silicon spatial light modulator

Method and structure for manufacturing bonded substrates using mult...

Liquid precursors for the CVD deposition of amorphous carbon films

Photolithography scheme using a silicon containing resist

Method of depositing an amorphous carbon film for metal etch hardma...

Method of depositing an amorphous carbon film for etch hardmask app...

Method of depositing an amrphous carbon layer

Nitrogen-free dielectric anti-reflective coating and hardmask

Nitrogen-free dielectric anti-reflective coating and hardmask

Method of depositing an amorphous carbon layer

Etch pattern definition using a CVD organic layer as an anti-reflec...

Photolithography scheme using a silicon containing resist