Zecheng Liu

Person

Helsinki, FI

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for filling a recess formed within a substrate...
- Patent number 12,176,243
- Issue date Dec 24, 2024
- ASM IP Holding B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclical deposition method and apparatus for filling a recess forme...
- Patent number 11,798,834
- Issue date Oct 24, 2023
- ASM IP Holding B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a photoresist underlayer and structure including...
- Patent number 11,735,422
- Issue date Aug 22, 2023
- ASM IP Holding B.V.
- Ivan Zyulkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a recess formed within a substrate...
- Patent number 11,615,980
- Issue date Mar 28, 2023
- ASM IP Holding B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclical deposition method and apparatus for filling a recess forme...
- Patent number 11,342,216
- Issue date May 24, 2022
- ASM IP Holding B.V.
- Zecheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a recess formed within a substrate...
- Patent number 11,227,789
- Issue date Jan 18, 2022
- ASM IP Holding B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CYCLICAL DEPOSITION METHOD AND APPARATUS FOR FILLING A RECESS FORME...
- Publication number 20240047264
- Publication date Feb 8, 2024
- ASM IP HOLDING B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING...
- Publication number 20230420256
- Publication date Dec 28, 2023
- ASM IP HOLDING B.V.
- Ivan Zyulkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FILLING A RECESS FORMED WITHIN A SUBSTRATE...
- Publication number 20230126231
- Publication date Apr 27, 2023
- ASM IP HOLDING B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLICAL DEPOSITION METHOD AND APPARATUS FOR FILLING A RECESS FORME...
- Publication number 20220270917
- Publication date Aug 25, 2022
- ASM IP HOLDING B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FILLING A RECESS FORMED WITHIN A SUBSTRATE...
- Publication number 20220102195
- Publication date Mar 31, 2022
- ASM IP HOLDING B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING...
- Publication number 20210111025
- Publication date Apr 15, 2021
- ASM IP HOLDING B.V.
- Ivan Zyulkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLICAL DEPOSITION METHOD AND APPARATUS FOR FILLING A RECESS FORME...
- Publication number 20200266097
- Publication date Aug 20, 2020
- ASM IP HOLDING B.V.
- Zecheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FILLING A RECESS FORMED WITHIN A SUBSTRATE...
- Publication number 20200266098
- Publication date Aug 20, 2020
- ASM IP HOLDING B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS

Zecheng Liu

Person

Patents Grantslast 30 patents

Method and apparatus for filling a recess formed within a substrate...

Cyclical deposition method and apparatus for filling a recess forme...

Method of forming a photoresist underlayer and structure including...

Method and apparatus for filling a recess formed within a substrate...

Cyclical deposition method and apparatus for filling a recess forme...

Method and apparatus for filling a recess formed within a substrate...

Patents Applicationslast 30 patents

CYCLICAL DEPOSITION METHOD AND APPARATUS FOR FILLING A RECESS FORME...

METHOD OF FORMING A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING...

METHOD AND APPARATUS FOR FILLING A RECESS FORMED WITHIN A SUBSTRATE...

CYCLICAL DEPOSITION METHOD AND APPARATUS FOR FILLING A RECESS FORME...

METHOD AND APPARATUS FOR FILLING A RECESS FORMED WITHIN A SUBSTRATE...

METHOD OF FORMING A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING...

CYCLICAL DEPOSITION METHOD AND APPARATUS FOR FILLING A RECESS FORME...

METHOD AND APPARATUS FOR FILLING A RECESS FORMED WITHIN A SUBSTRATE...