Zhiguo Sun

Person

Halfmoon, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gate capping layers of semiconductor devices
- Patent number 11,164,954
- Issue date Nov 2, 2021
- GLOBALFOUNDRIES U.S. INC.
- Sipeng Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamferless interconnect vias of semiconductor devices
- Patent number 10,770,344
- Issue date Sep 8, 2020
- GLOBALFOUNDRIES Inc.
- Yuping Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming smooth sidewall structures using spacer materials
- Patent number 10,714,380
- Issue date Jul 14, 2020
- GLOBALFOUNDRIES Inc.
- Ravi P. Srivastava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned multiple patterning processes with layered mandrels
- Patent number 10,446,395
- Issue date Oct 15, 2019
- GLOBALFOUNDRIES Inc.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt plated via integration scheme
- Patent number 10,340,183
- Issue date Jul 2, 2019
- GLOBALFOUNDRIES Inc.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to prevent cobalt recess
- Patent number 10,109,521
- Issue date Oct 23, 2018
- GLOBALFOUNDRIES Inc.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Airgaps to isolate metallization features
- Patent number 10,043,753
- Issue date Aug 7, 2018
- GLOBALFOUNDRIES Inc.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming MIS contact structures on transistor devices
- Patent number 9,831,123
- Issue date Nov 28, 2017
- GLOBALFOUNDRIES Inc.
- Suraj K. Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming air gaps in metallization layers on integrated c...
- Patent number 9,768,058
- Issue date Sep 19, 2017
- GLOBALFOUNDRIES Inc.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial amorphous silicon hard mask for BEOL
- Patent number 9,741,610
- Issue date Aug 22, 2017
- GLOBALFOUNDRIES Inc.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned lithographic patterning with variable spacings
- Patent number 9,711,447
- Issue date Jul 18, 2017
- GLOBALFOUNDRIES Inc.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming MIS contact structures on transistor devices in...
- Patent number 9,613,855
- Issue date Apr 4, 2017
- GLOBALFOUNDRIES Inc.
- Suraj K. Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing liner corrosion during metallization of semiconductor devices
- Patent number 9,595,493
- Issue date Mar 14, 2017
- GLOBALFOUNDRIES Inc.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inhibiting diffusion of elements between material layers of a layer...
- Patent number 9,502,232
- Issue date Nov 22, 2016
- GLOBALFOUNDRIES Inc.
- Sipeng Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a dielectric film
- Patent number 9,418,832
- Issue date Aug 16, 2016
- Hung-Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of protecting a dielectric mask layer and related semicondu...
- Patent number 9,349,608
- Issue date May 24, 2016
- GLOBALFOUNDRIES Inc.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve selectivity cobalt cap process
- Patent number 9,275,898
- Issue date Mar 1, 2016
- GLOBALFOUNDRIES Inc.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures with bridging films and methods of fabrica...
- Patent number 9,184,288
- Issue date Nov 10, 2015
- GLOBALFOUNDRIES Inc.
- Sipeng Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating defect-free semiconductor structures
- Patent number 9,142,422
- Issue date Sep 22, 2015
- GLOBALFOUNDRIES Inc.
- Hung-Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an interlayer structure of increased elastici...
- Patent number 9,076,645
- Issue date Jul 7, 2015
- GLOBALFOUNDRIES Inc.
- Shishir Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a dielectric film
- Patent number 8,993,446
- Issue date Mar 31, 2015
- GlobalFoundries Inc.
- Hung-Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a low-K dielectric film
- Patent number 8,716,150
- Issue date May 6, 2014
- GLOBALFOUNDRIES Inc.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GATE CAPPING LAYERS OF SEMICONDUCTOR DEVICES
- Publication number 20200388693
- Publication date Dec 10, 2020
- GLOBALFOUNDRIES INC.
- SIPENG GU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMFERLESS INTERCONNECT VIAS OF SEMICONDUCTOR DEVICES
- Publication number 20200219763
- Publication date Jul 9, 2020
- GLOBALFOUNDRIES INC.
- YUPING REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMOOTH SIDEWALL STRUCTURES
- Publication number 20200135545
- Publication date Apr 30, 2020
- GLOBALFOUNDRIES INC.
- Ravi P. SRIVASTAVA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED MULTIPLE PATTERNING PROCESSES WITH LAYERED MANDRELS
- Publication number 20190318931
- Publication date Oct 17, 2019
- GLOBALFOUNDRIES INC.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COBALT PLATED VIA INTEGRATION SCHEME
- Publication number 20190206729
- Publication date Jul 4, 2019
- GLOBALFOUNDRIES INC.
- Qiang FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIRGAPS TO ISOLATE METALLIZATION FEATURES
- Publication number 20180166383
- Publication date Jun 14, 2018
- GLOBALFOUNDRIES INC.
- Huy CAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECTS WITH INNER SACRIFICIAL SPACERS
- Publication number 20180012791
- Publication date Jan 11, 2018
- GLOBALFOUNDRIES Inc.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING MIS CONTACT STRUCTURES ON TRANSISTOR DEVICES
- Publication number 20170287777
- Publication date Oct 5, 2017
- GLOBALFOUNDRIES INC.
- Suraj K. Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING AIR GAPS IN METALLIZATION LAYERS ON INTEGRATED C...
- Publication number 20170047242
- Publication date Feb 16, 2017
- GLOBALFOUNDRIES INC.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING LINER CORROSION DURING METALLIZATION OF SEMICONDUCTOR DEVICES
- Publication number 20170047282
- Publication date Feb 16, 2017
- GLOBALFOUNDRIES INC.
- Zhiguo SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SACRIFICIAL AMORPHOUS SILICON HARD MASK FOR BEOL
- Publication number 20160365277
- Publication date Dec 15, 2016
- GLOBALFOUNDRIES INC.
- Qiang FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INHIBITING DIFFUSION OF ELEMENTS BETWEEN MATERIAL LAYERS OF A LAYER...
- Publication number 20160005598
- Publication date Jan 7, 2016
- GLOBALFOUNDRIES INC.
- Sipeng GU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FABRICATING DEFECT-FREE SEMICONDUCTOR STRUCTURES
- Publication number 20150357292
- Publication date Dec 10, 2015
- GLOBALFOUNDRIES INC.
- Hung-Wei LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURES WITH BRIDGING FILMS AND METHODS OF FABRICA...
- Publication number 20150263169
- Publication date Sep 17, 2015
- GLOBALFOUNDRIES INC.
- Sipeng GU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROTECTING A DIELECTRIC MASK LAYER AND RELATED SEMICONDU...
- Publication number 20150171001
- Publication date Jun 18, 2015
- GLOBALFOUNDRIES INC.
- Zhiguo SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming A Dielectric Film
- Publication number 20150162188
- Publication date Jun 11, 2015
- GLOBALFOUNDRIES INC.
- Hung-Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FABRICATING DEFECT-FREE SEMICONDUCTOR STRUCTURES
- Publication number 20150123250
- Publication date May 7, 2015
- GLOBALFOUNDRIES INC.
- Hung-Wei LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A DIELECTRIC FILM
- Publication number 20140315385
- Publication date Oct 23, 2014
- GLOBAL FOUNDRIES Inc.
- Hung-Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING A BI-LAYER CAP LAYER ON COPPER-BASED CONDUCTIVE...
- Publication number 20140167265
- Publication date Jun 19, 2014
- GLOBALFOUNDRIES INC.
- Dimitri R. Kioussis
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Gate capping layers of semiconductor devices

Chamferless interconnect vias of semiconductor devices

Method of forming smooth sidewall structures using spacer materials

Self-aligned multiple patterning processes with layered mandrels

Cobalt plated via integration scheme

Method to prevent cobalt recess

Airgaps to isolate metallization features

Methods of forming MIS contact structures on transistor devices

Methods of forming air gaps in metallization layers on integrated c...

Sacrificial amorphous silicon hard mask for BEOL

Self-aligned lithographic patterning with variable spacings

Methods of forming MIS contact structures on transistor devices in...

Reducing liner corrosion during metallization of semiconductor devices

Inhibiting diffusion of elements between material layers of a layer...

Method of forming a dielectric film

Methods of protecting a dielectric mask layer and related semicondu...

Method to improve selectivity cobalt cap process

Semiconductor structures with bridging films and methods of fabrica...

Methods of fabricating defect-free semiconductor structures

Method of fabricating an interlayer structure of increased elastici...

Method of forming a dielectric film

Method of forming a low-K dielectric film

Patents Applicationslast 30 patents

GATE CAPPING LAYERS OF SEMICONDUCTOR DEVICES

CHAMFERLESS INTERCONNECT VIAS OF SEMICONDUCTOR DEVICES

SMOOTH SIDEWALL STRUCTURES

SELF-ALIGNED MULTIPLE PATTERNING PROCESSES WITH LAYERED MANDRELS

COBALT PLATED VIA INTEGRATION SCHEME

AIRGAPS TO ISOLATE METALLIZATION FEATURES

INTERCONNECTS WITH INNER SACRIFICIAL SPACERS

METHODS OF FORMING MIS CONTACT STRUCTURES ON TRANSISTOR DEVICES

METHODS OF FORMING AIR GAPS IN METALLIZATION LAYERS ON INTEGRATED C...

REDUCING LINER CORROSION DURING METALLIZATION OF SEMICONDUCTOR DEVICES

SACRIFICIAL AMORPHOUS SILICON HARD MASK FOR BEOL

INHIBITING DIFFUSION OF ELEMENTS BETWEEN MATERIAL LAYERS OF A LAYER...

METHODS OF FABRICATING DEFECT-FREE SEMICONDUCTOR STRUCTURES

SEMICONDUCTOR STRUCTURES WITH BRIDGING FILMS AND METHODS OF FABRICA...

METHODS OF PROTECTING A DIELECTRIC MASK LAYER AND RELATED SEMICONDU...

Method of Forming A Dielectric Film

METHODS OF FABRICATING DEFECT-FREE SEMICONDUCTOR STRUCTURES

METHOD OF FORMING A DIELECTRIC FILM

METHODS OF FORMING A BI-LAYER CAP LAYER ON COPPER-BASED CONDUCTIVE...