Zhiyuan Fang

Person

West Linn, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of depositing smooth and conformal ashable hard mask films
- Patent number 9,240,320
- Issue date Jan 19, 2016
- Novellus Systems, Inc.
- Pramod Subramonium
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffusion barrier and etch stop films
- Patent number 8,669,181
- Issue date Mar 11, 2014
- Novellus Systems, Inc.
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma clean method for deposition chamber
- Patent number 8,591,659
- Issue date Nov 26, 2013
- Novellus Systems, Inc.
- Zhiyuan Fang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of depositing smooth and conformal ashable hard mask films
- Patent number 8,435,608
- Issue date May 7, 2013
- Novellus Systems, Inc.
- Pramod Subramonium
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulsed PECVD method for modulating hydrogen content in hard mask
- Patent number 8,110,493
- Issue date Feb 7, 2012
- Novellus Systems, Inc.
- Pramod Subramonium
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of depositing highly selective transparent ashable hardmask...
- Patent number 7,981,810
- Issue date Jul 19, 2011
- Novellus Systems, Inc.
- Pramod Subramonium
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of depositing stable and hermetic ashable hardmask films
- Patent number 7,981,777
- Issue date Jul 19, 2011
- Novellus Systems, Inc.
- Pramod Subramonium
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diffusion barrier and etch stop films
- Patent number 7,915,166
- Issue date Mar 29, 2011
- Novellus Systems, Inc.
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed PECVD method for modulating hydrogen content in hard mask
- Patent number 7,381,644
- Issue date Jun 3, 2008
- Novellus Systems, Inc.
- Pramod Subramonium
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CHAMBER-ACCUMULATION EXTENSION VIA IN-SITU PASSIVATION
- Publication number 20220267900
- Publication date Aug 25, 2022
- ZhiYuan Fang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CLEAN METHOD FOR DEPOSITION CHAMBER
- Publication number 20140053867
- Publication date Feb 27, 2014
- Novellus Systems, Inc.
- Zhiyuan Fang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Nitrogen-free fluorine-doped silicate glass
- Publication number 20040091717
- Publication date May 13, 2004
- Novellus Systems, Inc.
- Ming Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Zhiyuan Fang

Person

Patents Grantslast 30 patents

Methods of depositing smooth and conformal ashable hard mask films

Diffusion barrier and etch stop films

Plasma clean method for deposition chamber

Methods of depositing smooth and conformal ashable hard mask films

Pulsed PECVD method for modulating hydrogen content in hard mask

Methods of depositing highly selective transparent ashable hardmask...

Methods of depositing stable and hermetic ashable hardmask films

Diffusion barrier and etch stop films

Pulsed PECVD method for modulating hydrogen content in hard mask

Patents Applicationslast 30 patents

CHAMBER-ACCUMULATION EXTENSION VIA IN-SITU PASSIVATION

PLASMA CLEAN METHOD FOR DEPOSITION CHAMBER

Nitrogen-free fluorine-doped silicate glass