Zhong Qiang Hua

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for depositing dielectric material
- Patent number 11,631,591
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition (PVD) chamber with in situ chamber cleani...
- Patent number 11,289,312
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Adolph M. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing dielectric material
- Patent number 11,114,306
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Bhargav Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Biased cover ring for a substrate processing system
- Patent number 11,049,701
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Adolph Miller Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density, low stress amorphous carbon film, and process and equ...
- Patent number 10,858,727
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- Jingjing Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment systems employing actuators providing relative displaceme...
- Patent number 10,858,735
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- Danny D. Wang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Techniques for forming low stress etch-resistant mask using implant...
- Patent number 10,811,257
- Issue date Oct 20, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve film quality for PVD carbon with reactive gas and...
- Patent number 10,570,506
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Bhargav Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulse shape controller for sputter sources
- Patent number 10,566,177
- Issue date Feb 18, 2020
- Applied Materials, Inc.
- Michael Stowell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment systems employing actuators providing relative displaceme...
- Patent number 10,435,786
- Issue date Oct 8, 2019
- Applied Materials, Inc.
- Danny D. Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming fin structures with desired profile for 3D stru...
- Patent number 10,128,337
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Jie Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for multizone plasma generation
- Patent number 9,809,881
- Issue date Nov 7, 2017
- Applied Materials, Inc.
- Matthew Scott Rogers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformality of oxide layers along sidewalls of deep vias
- Patent number 8,404,583
- Issue date Mar 26, 2013
- Applied Materials, Inc.
- Zhong Qiang Hua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for doping non-planar transistors
- Patent number 8,114,761
- Issue date Feb 14, 2012
- Applied Materials, Inc.
- Tushar V. Mandrekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma clean process with cycled high and low pressure clean...
- Patent number 7,967,913
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internal balanced coil for inductively coupled high density plasma...
- Patent number 7,789,993
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Robert Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
HDP-CVD SiON films for gap-fill
- Patent number 7,704,897
- Issue date Apr 27, 2010
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internal balanced coil for inductively coupled high density plasma...
- Patent number 7,572,647
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Robert Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas delivery system for semiconductor processing
- Patent number 7,498,268
- Issue date Mar 3, 2009
- Applied Materials, Inc.
- Sudhir Gondhalekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multistep remote plasma clean process
- Patent number 7,159,597
- Issue date Jan 9, 2007
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas delivery system for semiconductor processing
- Patent number 7,141,138
- Issue date Nov 28, 2006
- Applied Materials, Inc.
- Sudhir Gondhalekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for high aspect ratio HDP CVD gapfill
- Patent number 7,064,077
- Issue date Jun 20, 2006
- Applied Materials
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature controlled dome-coil system for high power inductively...
- Patent number 6,822,185
- Issue date Nov 23, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for high aspect ratio HDP CVD gapfill
- Patent number 6,812,153
- Issue date Nov 2, 2004
- Applied Materials Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In situ deposition and integration of silicon nitride in a high den...
- Patent number 6,372,291
- Issue date Apr 16, 2002
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR DEPOSITING DIELECTRIC MATERIAL
- Publication number 20210384040
- Publication date Dec 9, 2021
- Bhargav S. CITLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...
- Publication number 20200395198
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- ADOLPH M. ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING DIELECTRIC MATERIAL
- Publication number 20200090946
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Bhargav S. CITLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT SYSTEMS EMPLOYING ACTUATORS PROVIDING RELATIVE DISPLACEME...
- Publication number 20190390334
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Danny D. WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES FOR FORMING LOW STRESS ETCH-RESISTANT MASK USING IMPLANT...
- Publication number 20190304783
- Publication date Oct 3, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED DC SOURCE FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSIC...
- Publication number 20190127842
- Publication date May 2, 2019
- Viachslav BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING
- Publication number 20190088457
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Viachslav BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND...
- Publication number 20180209037
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Bhargav CITLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIASED COVER RING FOR A SUBSTRATE PROCESSING SYSTEM
- Publication number 20180151325
- Publication date May 31, 2018
- ADOLPH MILLER ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STRESS BALANCED ELECTROSTATIC SUBSTRATE CARRIER WITH CONTACTS
- Publication number 20180122679
- Publication date May 3, 2018
- Applied Materials, Inc.
- Shambhu N. Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)
- Publication number 20180108519
- Publication date Apr 19, 2018
- Applied Materials, Inc.
- VIACHSLAV BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DENSITY, LOW STRESS AMORPHOUS CARBON FILM, AND PROCESS AND EQU...
- Publication number 20180051368
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Jingjing Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSE SHAPE CONTROLLER FOR SPUTTER SOURCES
- Publication number 20180044781
- Publication date Feb 15, 2018
- Applied Materials, Inc.
- Michael STOWELL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSED WAFER AS TOP PLATE OF A WORKPIECE CARRIER IN SEMICONDUCTO...
- Publication number 20180025931
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Srinivas D. Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING FIN STRUCTURES WITH DESIRED PROFILE FOR 3D STRU...
- Publication number 20170352726
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Jie ZHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT SYSTEMS EMPLOYING ACTUATORS PROVIDING RELATIVE DISPLACEME...
- Publication number 20160068951
- Publication date Mar 10, 2016
- Applied Materials, Inc.
- Danny D. WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL PROCESSING USING HIGH DENSITY PLASMA
- Publication number 20140186544
- Publication date Jul 3, 2014
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON NITRIDE GAPFILL IMPLEMENTING HIGH DENSITY PLASMA
- Publication number 20140187045
- Publication date Jul 3, 2014
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRETREATMENT AND IMPROVED DIELECTRIC COVERAGE
- Publication number 20130252440
- Publication date Sep 26, 2013
- Applied Materials, Inc.
- Lei Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MULTIZONE PLASMA GENERATION
- Publication number 20120208371
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- MATTHEW SCOTT ROGERS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING LOW MOISTURE DIELECTRIC FILMS
- Publication number 20120058281
- Publication date Mar 8, 2012
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING LOW STRESS DIELECTRIC FILMS
- Publication number 20120015113
- Publication date Jan 19, 2012
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMALITY OF OXIDE LAYERS ALONG SIDEWALLS OF DEEP VIAS
- Publication number 20110223760
- Publication date Sep 15, 2011
- Applied Materials, Inc.
- Zhong Qiang Hua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DOPING NON-PLANAR TRANSISTORS
- Publication number 20110129990
- Publication date Jun 2, 2011
- Applied Materials, Inc.
- Tushar V. Mandrekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA CLEAN PROCESS WITH CYCLED HIGH AND LOW PRESSURE CLEAN...
- Publication number 20100095979
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Zhong Qiang Hua
- B08 - CLEANING
Information Patent Application
HDP-CVD SION FILMS FOR GAP-FILL
- Publication number 20090215281
- Publication date Aug 27, 2009
- Applied Materials, Inc.
- HEMANT P. MUNGEKAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080185284
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- Robert Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080188090
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- ROBERT CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...
- Publication number 20080188087
- Publication date Aug 7, 2008
- Applied Materials, Inc.
- ROBERT CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-STEP DEP-ETCH-DEP HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITI...
- Publication number 20080142483
- Publication date Jun 19, 2008
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Zhong Qiang Hua

Person

Patents Grantslast 30 patents

Methods for depositing dielectric material

Physical vapor deposition (PVD) chamber with in situ chamber cleani...

Methods for depositing dielectric material

Biased cover ring for a substrate processing system

High density, low stress amorphous carbon film, and process and equ...

Alignment systems employing actuators providing relative displaceme...

Techniques for forming low stress etch-resistant mask using implant...

Method to improve film quality for PVD carbon with reactive gas and...

Pulse shape controller for sputter sources

Alignment systems employing actuators providing relative displaceme...

Methods for forming fin structures with desired profile for 3D stru...

Method and apparatus for multizone plasma generation

Conformality of oxide layers along sidewalls of deep vias

Method for doping non-planar transistors

Remote plasma clean process with cycled high and low pressure clean...

Internal balanced coil for inductively coupled high density plasma...

HDP-CVD SiON films for gap-fill

Internal balanced coil for inductively coupled high density plasma...

Gas delivery system for semiconductor processing

Multistep remote plasma clean process

Gas delivery system for semiconductor processing

Method for high aspect ratio HDP CVD gapfill

Temperature controlled dome-coil system for high power inductively...

Method for high aspect ratio HDP CVD gapfill

In situ deposition and integration of silicon nitride in a high den...

Patents Applicationslast 30 patents

METHODS FOR DEPOSITING DIELECTRIC MATERIAL

PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...

METHODS FOR DEPOSITING DIELECTRIC MATERIAL

ALIGNMENT SYSTEMS EMPLOYING ACTUATORS PROVIDING RELATIVE DISPLACEME...

TECHNIQUES FOR FORMING LOW STRESS ETCH-RESISTANT MASK USING IMPLANT...

PULSED DC SOURCE FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSIC...

SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING

METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND...

BIASED COVER RING FOR A SUBSTRATE PROCESSING SYSTEM

STRESS BALANCED ELECTROSTATIC SUBSTRATE CARRIER WITH CONTACTS

POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)

HIGH DENSITY, LOW STRESS AMORPHOUS CARBON FILM, AND PROCESS AND EQU...

PULSE SHAPE CONTROLLER FOR SPUTTER SOURCES

PROCESSED WAFER AS TOP PLATE OF A WORKPIECE CARRIER IN SEMICONDUCTO...

METHODS FOR FORMING FIN STRUCTURES WITH DESIRED PROFILE FOR 3D STRU...

ALIGNMENT SYSTEMS EMPLOYING ACTUATORS PROVIDING RELATIVE DISPLACEME...

METAL PROCESSING USING HIGH DENSITY PLASMA

SILICON NITRIDE GAPFILL IMPLEMENTING HIGH DENSITY PLASMA

PRETREATMENT AND IMPROVED DIELECTRIC COVERAGE

METHOD AND APPARATUS FOR MULTIZONE PLASMA GENERATION

METHODS FOR FORMING LOW MOISTURE DIELECTRIC FILMS

METHODS FOR FORMING LOW STRESS DIELECTRIC FILMS

CONFORMALITY OF OXIDE LAYERS ALONG SIDEWALLS OF DEEP VIAS

METHOD FOR DOPING NON-PLANAR TRANSISTORS

REMOTE PLASMA CLEAN PROCESS WITH CYCLED HIGH AND LOW PRESSURE CLEAN...

HDP-CVD SION FILMS FOR GAP-FILL

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

INTERNAL BALANCED COIL FOR INDUCTIVELY COUPLED HIGH DENSITY PLASMA...

MULTI-STEP DEP-ETCH-DEP HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITI...