Zsolt Nenyei

Person

Blaustein-Herrlingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Monitoring witness structures for temperature control in RTP systems
- Patent number 8,575,521
- Issue date Nov 5, 2013
- Mattson Technology, Inc.
- Zsolt Nenyei
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and apparatus for growing thin oxide films on silicon while...
- Patent number 8,236,706
- Issue date Aug 7, 2012
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for thermally processing a plurality of wafer-sha...
- Patent number 7,977,258
- Issue date Jul 12, 2011
- Mattson Technology, Inc.
- Zsolt Nenyei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the thermal treatment of disk-shaped substrates
- Patent number 7,704,898
- Issue date Apr 27, 2010
- Mattson Technology, Inc.
- Zsolt Nenyei
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method of forming and/or modifying a dielectric film on a semicondu...
- Patent number 7,101,812
- Issue date Sep 5, 2006
- Mattson Technology, Inc.
- Ignaz Eisele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the removing of adsorbed molecules from a chamber
- Patent number 6,830,631
- Issue date Dec 14, 2004
- Steag RTP Systems GmbH
- Zsolt Nenyei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for rapid thermal processing (RTP) of silicon substrates
- Patent number 6,100,149
- Issue date Aug 8, 2000
- Steag-RTP Systems
- Zsolt Nenyei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for rapid thermal processing
- Patent number 5,872,889
- Issue date Feb 16, 1999
- Steag-Ast
- Guenter Kaltenbrunner
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for rapid thermal processing
- Patent number 5,861,609
- Issue date Jan 19, 1999
- Guenter Kaltenbrunner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved temperature control in rapid ther...
- Patent number 5,841,110
- Issue date Nov 24, 1998
- Steag-Ast GmbH
- Zsolt Nenyei
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for rapid thermal processing
- Patent number 5,837,555
- Issue date Nov 17, 1998
- AST Electronik
- Guenter Kaltenbrunner
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for wavevector selective pyrometry in rapid th...
- Patent number 5,628,564
- Issue date May 13, 1997
- AST Elekronik GmbH
- Zsolt Nenyei
- G01 - MEASURING TESTING
Information Patent Grant
Modified reaction chamber and improved gas flushing method in rapid...
- Patent number 5,580,830
- Issue date Dec 3, 1996
- AST Elekronik
- Zsolt Nenyei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for a rapid thermal processing of delicate com...
- Patent number 5,359,693
- Issue date Oct 25, 1994
- AST elektronik GmbH
- Zsolt Nenyei
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...
- Publication number 20120298039
- Publication date Nov 29, 2012
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...
- Publication number 20100151694
- Publication date Jun 17, 2010
- Mattson Technology, Inc.
- Bruce W. Peuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Monitoring Witness Structures for Temperature Control in RTP Systems
- Publication number 20090242543
- Publication date Oct 1, 2009
- Zsolt Nenyei
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for the Thermal Treatment of Disk-Shaped Substrates
- Publication number 20080311761
- Publication date Dec 18, 2008
- Zsolt Nenyei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for thermally processing a plurality of wafer-sha...
- Publication number 20080248657
- Publication date Oct 9, 2008
- Zsolt Nenyei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for the production of a nitrogenous layer a semiconductor o...
- Publication number 20070117413
- Publication date May 24, 2007
- Zsolt Nenyei
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method of forming and/or modifying a dielectric film on a semicondu...
- Publication number 20040058557
- Publication date Mar 25, 2004
- Mattson Technology, Inc.
- Ignaz Eisele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for the removing of adsorbed molecules from a chamber
- Publication number 20030155000
- Publication date Aug 21, 2003
- Zsolt Nenyei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Zsolt Nenyei

Person

Patents Grantslast 30 patents

Monitoring witness structures for temperature control in RTP systems

Method and apparatus for growing thin oxide films on silicon while...

Method and system for thermally processing a plurality of wafer-sha...

Method for the thermal treatment of disk-shaped substrates

Method of forming and/or modifying a dielectric film on a semicondu...

Method for the removing of adsorbed molecules from a chamber

Method for rapid thermal processing (RTP) of silicon substrates

Apparatus and method for rapid thermal processing

Method and apparatus for rapid thermal processing

Method and apparatus for improved temperature control in rapid ther...

Apparatus and method for rapid thermal processing

Method and apparatus for wavevector selective pyrometry in rapid th...

Modified reaction chamber and improved gas flushing method in rapid...

Method and apparatus for a rapid thermal processing of delicate com...

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...

METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE...

Monitoring Witness Structures for Temperature Control in RTP Systems

Method for the Thermal Treatment of Disk-Shaped Substrates

Method and system for thermally processing a plurality of wafer-sha...

Process for the production of a nitrogenous layer a semiconductor o...

Method of forming and/or modifying a dielectric film on a semicondu...

Method for the removing of adsorbed molecules from a chamber