Aligning or positioning in direction perpendicular to substrate surface

Industry

CPC
G03F9/7023

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7023Aligning or positioning in direction perpendicular to substrate surface

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Measurement apparatus, lithography apparatus, and article manufactu...
- Patent number 12,339,595
- Issue date Jun 24, 2025
- Canon Kabushiki Kaisha
- Satoru Jimbo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Combination of inline metrology and on tool metrology for advanced...
- Patent number 12,326,667
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of wafer alignment using at resolution metrology on product...
- Patent number 12,124,179
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for calibrating alignment of wafer and lithography system
- Patent number 11,854,854
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,531,279
- Issue date Dec 20, 2022
- Onto Innovation Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and method of manufacturing article
- Patent number 11,526,090
- Issue date Dec 13, 2022
- Canon Kabushiki Kaisha
- Ryosuke Tsutsumi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Exposure method and exposure apparatus
- Patent number 11,500,299
- Issue date Nov 15, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position measurement apparatus, overlay inspection apparatus, posit...
- Patent number 11,372,342
- Issue date Jun 28, 2022
- Canon Kabushiki Kaisha
- Toshiki Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a height profile, a measurement system and a...
- Patent number 11,137,695
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Arend Johannes Donkerbroek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,126,096
- Issue date Sep 21, 2021
- Onto Innovation, Inc.
- Elvino Da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method in which alignment control of a member and a substrate is ef...
- Patent number 10,990,005
- Issue date Apr 27, 2021
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-spot distribution structure, surface shape measurement method...
- Patent number 10,915,030
- Issue date Feb 9, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Zhenhui Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imager for lithographic reproduction
- Patent number 10,908,504
- Issue date Feb 2, 2021
- Optical Associates, Inc.
- David Kessler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and exposure apparatus
- Patent number 10,747,128
- Issue date Aug 18, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint method
- Patent number 10,705,422
- Issue date Jul 7, 2020
- Canon Kabushiki Kaisha
- Yoshihiro Shiode
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Imprinting apparatus for producing a member in which a mold contact...
- Patent number 10,670,961
- Issue date Jun 2, 2020
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment system and method
- Patent number 10,663,874
- Issue date May 26, 2020
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Hamed Sadeghian Marnani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus, method of measuring a structure, device manufa...
- Patent number 10,599,048
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Sergey Tarabrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 10,481,508
- Issue date Nov 19, 2019
- Canon Kabushiki Kaisha
- Takanori Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,241,426
- Issue date Mar 26, 2019
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 10,209,631
- Issue date Feb 19, 2019
- Canon Kabushiki Kaisha
- Takanori Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Condensing point position detecting method
- Patent number 10,183,359
- Issue date Jan 22, 2019
- Disco Corporation
- Joel Koerwer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Device and method for aligning substrates
- Patent number 9,851,645
- Issue date Dec 26, 2017
- EV Group E. Thallner GmbH
- Thomas Wagenleitner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and method of manufacturing article
- Patent number 9,798,231
- Issue date Oct 24, 2017
- Canon Kabushiki Kaisha
- Yoshihiro Shiode
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithography apparatus, and article manufacturing method
- Patent number 9,639,008
- Issue date May 2, 2017
- Canon Kabushiki Kaisha
- Yuichiro Morikuni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, exposure apparatus and device manufacturing method
- Patent number 9,563,116
- Issue date Feb 7, 2017
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of aligning substrate-scale mask with substrate
- Patent number 9,490,154
- Issue date Nov 8, 2016
- Applied Materials, Inc.
- Abraham Ravid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement apparatus and exposure apparatus which measure...
- Patent number 9,400,437
- Issue date Jul 26, 2016
- Canon Kabushiki Kaisha
- Noritoshi Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED...
- Publication number 20240201605
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Ulrich MUELLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTU...
- Publication number 20230185208
- Publication date Jun 15, 2023
- Canon Kabushiki Kaisha
- SATORU JIMBO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF WAFER ALIGNMENT USING AT RESOLUTION METROLOGY ON PRODUCT...
- Publication number 20230168594
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR DETERMINING AN ALIGNMENT OF A PHOTOMASK ON A...
- Publication number 20230152089
- Publication date May 18, 2023
- Carl Zeiss SMT GMBH
- Christof Baur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD AND EXPOSURE APPARATUS
- Publication number 20230076566
- Publication date Mar 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20230049521
- Publication date Feb 16, 2023
- Canon Kabushiki Kaisha
- Ryosuke Tsutsumi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR CALIBRATING ALIGNMENT OF WAFER AND LITHOGRAPHY SYSTEM
- Publication number 20230024673
- Publication date Jan 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Jen CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TAG COORDINATE DETERMINATION METHOD AND APPARATUS, COMPUTER-READABL...
- Publication number 20220146927
- Publication date May 12, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Jing LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
- Publication number 20220075282
- Publication date Mar 10, 2022
- Onto Innovation, Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT APPARATUS, OVERLAY INSPECTION APPARATUS, POSIT...
- Publication number 20210263432
- Publication date Aug 26, 2021
- Canon Kabushiki Kaisha
- Toshiki Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD AND EXPOSURE APPARATUS
- Publication number 20200379361
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yung-Yao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20200285159
- Publication date Sep 10, 2020
- Canon Kabushiki Kaisha
- Ryosuke Tsutsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD IN WHICH ALIGNMENT CONTROL OF A MEMBER AND A SUBSTRATE IS EF...
- Publication number 20200241411
- Publication date Jul 30, 2020
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
- Publication number 20200233320
- Publication date Jul 23, 2020
- Onto Innovation, Inc.
- Elvino DA SILVEIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS CONTROL FOR LITHOGRAPHY TOOLS
- Publication number 20190384183
- Publication date Dec 19, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yueh Lin YANG
- G02 - OPTICS
Information Patent Application
POSITION DETECTION DEVICE, POSITION DETECTION METHOD, IMPRINT APPAR...
- Publication number 20190279889
- Publication date Sep 12, 2019
- Canon Kabushiki Kaisha
- Satoshi Iino
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20190146359
- Publication date May 16, 2019
- Canon Kabushiki Kaisha
- Takanori Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus, Method of Measuring a Structure, Device Manufa...
- Publication number 20190129315
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Sergey Tarabrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR REDUCING DEFECTS IN AN ORDERED FILM OF BLOCK COPOLYMERS
- Publication number 20190002657
- Publication date Jan 3, 2019
- Arkema France
- Christophe NAVARRO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Imager for Lithographic Reproduction
- Publication number 20180356733
- Publication date Dec 13, 2018
- Optical Associates, Inc.
- David Kessler
- G02 - OPTICS
Information Patent Application
CONDENSING POINT POSITION DETECTING METHOD
- Publication number 20180299786
- Publication date Oct 18, 2018
- Disco Corporation
- Joel Koerwer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180231900
- Publication date Aug 16, 2018
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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ENCODER HEAD WITH BIREFRINGENT ELEMENTS FOR FORMING IMPERFECT RETRO...
- Publication number 20180061627
- Publication date Mar 1, 2018
- Nikon Corporation
- Eric Peter Goodwin
- G02 - OPTICS
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IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20180011400
- Publication date Jan 11, 2018
- Canon Kabushiki Kaisha
- Yoshihiro SHIODE
- B82 - NANO-TECHNOLOGY
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IMPRINTING APPARATUS FOR PRODUCING A MEMBER IN WHICH A MOLD CONTACT...
- Publication number 20170115560
- Publication date Apr 27, 2017
- Canon Kabushiki Kaisha
- Shingo Okushima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
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LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20150042969
- Publication date Feb 12, 2015
- Canon Kabushiki Kaisha
- Yuichiro MORIKUNI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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MEASUREMENT APPARATUS AND MEASUREMENT METHOD
- Publication number 20130268225
- Publication date Oct 10, 2013
- Canon Kabushiki Kaisha
- Hiroshi OKUDA
- G01 - MEASURING TESTING
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POSITION MEASUREMENT APPARATUS AND EXPOSURE APPARATUS WHICH MEASURE...
- Publication number 20130120733
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- Canon Kabushiki Kaisha
- Noritoshi Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, A METH...
- Publication number 20120268724
- Publication date Oct 25, 2012
- Guido De Boer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Aligning or positioning in direction perpendicular to substrate surface

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Measurement apparatus, lithography apparatus, and article manufactu...

Combination of inline metrology and on tool metrology for advanced...

Method of wafer alignment using at resolution metrology on product...

Method for calibrating alignment of wafer and lithography system

System and method for optimizing a lithography exposure process

Imprint apparatus and method of manufacturing article

Exposure method and exposure apparatus

Position measurement apparatus, overlay inspection apparatus, posit...

Method of determining a height profile, a measurement system and a...

System and method for optimizing a lithography exposure process

Lithographic method

Method in which alignment control of a member and a substrate is ef...

Lithographic method

Light-spot distribution structure, surface shape measurement method...

Imager for lithographic reproduction

Exposure method and exposure apparatus

Imprint method

Imprinting apparatus for producing a member in which a mold contact...

Alignment system and method

Metrology apparatus, method of measuring a structure, device manufa...

Exposure apparatus and method of manufacturing article

Lithographic apparatus and device manufacturing method

Exposure apparatus and method of manufacturing article

Condensing point position detecting method

Device and method for aligning substrates

Imprint apparatus and method of manufacturing article

Lithography apparatus, and article manufacturing method

Mask, exposure apparatus and device manufacturing method

Method of aligning substrate-scale mask with substrate

Position measurement apparatus and exposure apparatus which measure...

Patents Applicationslast 30 patents

COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED...

MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTU...

METHOD OF WAFER ALIGNMENT USING AT RESOLUTION METROLOGY ON PRODUCT...

METHOD AND DEVICE FOR DETERMINING AN ALIGNMENT OF A PHOTOMASK ON A...

EXPOSURE METHOD AND EXPOSURE APPARATUS

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

METHOD FOR CALIBRATING ALIGNMENT OF WAFER AND LITHOGRAPHY SYSTEM

TAG COORDINATE DETERMINATION METHOD AND APPARATUS, COMPUTER-READABL...

SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS

POSITION MEASUREMENT APPARATUS, OVERLAY INSPECTION APPARATUS, POSIT...

EXPOSURE METHOD AND EXPOSURE APPARATUS

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

METHOD IN WHICH ALIGNMENT CONTROL OF A MEMBER AND A SUBSTRATE IS EF...

SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS

LITHOGRAPHIC METHOD

LENS CONTROL FOR LITHOGRAPHY TOOLS

POSITION DETECTION DEVICE, POSITION DETECTION METHOD, IMPRINT APPAR...

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE

Metrology Apparatus, Method of Measuring a Structure, Device Manufa...

PROCESS FOR REDUCING DEFECTS IN AN ORDERED FILM OF BLOCK COPOLYMERS

Imager for Lithographic Reproduction

CONDENSING POINT POSITION DETECTING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

ENCODER HEAD WITH BIREFRINGENT ELEMENTS FOR FORMING IMPERFECT RETRO...

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

IMPRINTING APPARATUS FOR PRODUCING A MEMBER IN WHICH A MOLD CONTACT...

LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

MEASUREMENT APPARATUS AND MEASUREMENT METHOD

POSITION MEASUREMENT APPARATUS AND EXPOSURE APPARATUS WHICH MEASURE...

LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, A METH...